KR100516828B1 - 광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템 - Google Patents
광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템 Download PDFInfo
- Publication number
- KR100516828B1 KR100516828B1 KR10-2002-0044716A KR20020044716A KR100516828B1 KR 100516828 B1 KR100516828 B1 KR 100516828B1 KR 20020044716 A KR20020044716 A KR 20020044716A KR 100516828 B1 KR100516828 B1 KR 100516828B1
- Authority
- KR
- South Korea
- Prior art keywords
- image
- inspection
- substrate
- pattern
- acquisition step
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/08—Monitoring manufacture of assemblages
- H05K13/081—Integration of optical monitoring devices in assembly lines; Processes using optical monitoring devices specially adapted for controlling devices or machines in assembly lines
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Operations Research (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Wire Bonding (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0044716A KR100516828B1 (ko) | 2002-07-29 | 2002-07-29 | 광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템 |
JP2003090441A JP4133509B2 (ja) | 2002-07-29 | 2003-03-28 | 光学的検査の誤った検出防止方法及びシステム |
CNB031225802A CN100456024C (zh) | 2002-07-29 | 2003-04-21 | 用于防止光学检查中错误检测的系统和方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0044716A KR100516828B1 (ko) | 2002-07-29 | 2002-07-29 | 광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040011676A KR20040011676A (ko) | 2004-02-11 |
KR100516828B1 true KR100516828B1 (ko) | 2005-09-26 |
Family
ID=30439406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2002-0044716A KR100516828B1 (ko) | 2002-07-29 | 2002-07-29 | 광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4133509B2 (de) |
KR (1) | KR100516828B1 (de) |
CN (1) | CN100456024C (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102353697B (zh) * | 2011-08-31 | 2015-04-29 | 上海华虹宏力半导体制造有限公司 | 在线测评缺陷的方法 |
CN105865979B (zh) * | 2016-03-30 | 2019-03-12 | 南京邮电大学 | 一种测量微液滴电湿效应的装置与方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0876359A (ja) * | 1994-07-13 | 1996-03-22 | Kla Instr Corp | 自動フォトマスク検査装置及び方法 |
KR19980042720A (ko) * | 1996-11-27 | 1998-08-17 | 모리시타 요이찌 | 전자부품관찰장치 및 전자부품관찰방법 |
KR20000011616A (ko) * | 1998-07-10 | 2000-02-25 | 모리시타 요이찌 | 전자부품실장장치,인식장치및인식방법 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03160450A (ja) * | 1989-11-17 | 1991-07-10 | Fujitsu Ltd | マスクの欠陥検査方法 |
JPH04198742A (ja) * | 1990-11-28 | 1992-07-20 | Matsushita Electric Ind Co Ltd | 配線パターン検査装置 |
JP3189500B2 (ja) * | 1993-06-25 | 2001-07-16 | 松下電器産業株式会社 | 電子部品の外観検査装置および外観検査方法 |
JPH10221041A (ja) * | 1997-02-10 | 1998-08-21 | Toppan Printing Co Ltd | 欠陥検査方法 |
AU8033398A (en) * | 1997-06-17 | 1999-01-04 | Yuki Engineering System, Ltd | Device for checking sheet packaging |
US6282309B1 (en) * | 1998-05-29 | 2001-08-28 | Kla-Tencor Corporation | Enhanced sensitivity automated photomask inspection system |
JP2001208693A (ja) * | 2000-01-26 | 2001-08-03 | Dainippon Printing Co Ltd | 板状ワークの検査方法及び装置 |
-
2002
- 2002-07-29 KR KR10-2002-0044716A patent/KR100516828B1/ko not_active IP Right Cessation
-
2003
- 2003-03-28 JP JP2003090441A patent/JP4133509B2/ja not_active Expired - Fee Related
- 2003-04-21 CN CNB031225802A patent/CN100456024C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0876359A (ja) * | 1994-07-13 | 1996-03-22 | Kla Instr Corp | 自動フォトマスク検査装置及び方法 |
KR19980042720A (ko) * | 1996-11-27 | 1998-08-17 | 모리시타 요이찌 | 전자부품관찰장치 및 전자부품관찰방법 |
KR20000011616A (ko) * | 1998-07-10 | 2000-02-25 | 모리시타 요이찌 | 전자부품실장장치,인식장치및인식방법 |
Also Published As
Publication number | Publication date |
---|---|
KR20040011676A (ko) | 2004-02-11 |
JP4133509B2 (ja) | 2008-08-13 |
CN100456024C (zh) | 2009-01-28 |
CN1472528A (zh) | 2004-02-04 |
JP2004061491A (ja) | 2004-02-26 |
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