KR100510696B1 - 전자기력 구동 미소 밸브 - Google Patents
전자기력 구동 미소 밸브 Download PDFInfo
- Publication number
- KR100510696B1 KR100510696B1 KR10-2003-0052707A KR20030052707A KR100510696B1 KR 100510696 B1 KR100510696 B1 KR 100510696B1 KR 20030052707 A KR20030052707 A KR 20030052707A KR 100510696 B1 KR100510696 B1 KR 100510696B1
- Authority
- KR
- South Korea
- Prior art keywords
- flap
- valve
- opening
- fluid
- flow
- Prior art date
Links
- 239000012530 fluid Substances 0.000 claims abstract description 39
- 238000000034 method Methods 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 24
- 238000006073 displacement reaction Methods 0.000 claims description 11
- 239000000696 magnetic material Substances 0.000 claims description 3
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 2
- 150000002910 rare earth metals Chemical group 0.000 claims description 2
- 239000007788 liquid Substances 0.000 abstract description 6
- 230000001105 regulatory effect Effects 0.000 abstract description 6
- 230000001276 controlling effect Effects 0.000 abstract description 3
- 239000003507 refrigerant Substances 0.000 abstract description 2
- 238000005530 etching Methods 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- 230000008569 process Effects 0.000 description 10
- 239000010409 thin film Substances 0.000 description 9
- 239000010408 film Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000003993 interaction Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000005459 micromachining Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
- F16K31/06—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid
- F16K31/0644—One-way valve
- F16K31/0655—Lift valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/02—Construction of housing; Use of materials therefor of lift valves
- F16K27/0209—Check valves or pivoted valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/02—Construction of housing; Use of materials therefor of lift valves
- F16K27/029—Electromagnetically actuated valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
- F16K31/06—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid
- F16K31/08—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid using a permanent magnet
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F7/00—Magnets
- H01F7/06—Electromagnets; Actuators including electromagnets
- H01F7/08—Electromagnets; Actuators including electromagnets with armatures
- H01F7/16—Rectilinearly-movable armatures
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Magnetically Actuated Valves (AREA)
Abstract
Description
Claims (10)
- 유체의 입력단과 출력단으로 이루어진 하우징;상기 하우징 내의 입력단부와 출력단부에 각각 장착되는 영구 자석;기판과 개구와 상기 개구를 개폐하거나 유체가 흐르는 개구의 개방 면적을 임으로 조절하기 위해 상기 기판으로부터 이격되어 형성된 플랩과 상기 플랩 상에 형성되어 플랩의 구동에 사용되는 코일과 상기 플랩을 상기 기판의 고정부에 연결시키며 플랩의 변위에 비례하는 복원력을 제공하는 스프링으로 이루어지고, 상기 영구자석 사이에 장착되어 유체의 흐름을 단속하거나 그 유량을 임으로 조절하는 미소 밸브 소자를 포함하여 이루어지는 것을 특징으로 하는 전자기력 구동 미소 밸브
- 삭제
- 제 1 항에 있어서,상기 스프링은 탄성 구조물 형태로 상기 기판으로부터 이격되어 형성되는 것을 특징으로 하는 전자기력 구동 미소 밸브
- 삭제
- 삭제
- 삭제
- 제 1 항에 있어서,상기 입력단은 상기 출력단부보다 압력이 높아 유체의 흐름이 입력단에서 출력단으로 흐르는 정방향의 유량 제어가 가능한 것을 특징으로 하는 전자기력 구동 미소 밸브.
- 제1항에 있어서,상기 출력단은 상기 입력단보다 압력이 높아 유체의 흐름이 출력단에서 입력단으로 흐르는 역방향의 유량 제어가 가능한 것을 특징으로 하는 전자기력 구동 미소 밸브.
- 제 1 항에 있어서,상기 영구자석은 희토류(rare earth) 자성체 물질을 용융한 후 형상 틀(mold)에서 성형하고, 표면을 연마하여 형상을 가공한 부품을 포함하여 이루어진 것을 특징으로 하는 전자기력 구동 미소 밸브.
- 제1항에 있어서,상기 영구자석은 자성체를 회전 선반 가공에 의해 형상 및 외곽 치수를 가공하여, 구조물의 외부에서 소정의 자계를 인가하는 자력 발생 장치 내에서 자화하는 밸브 마개 부품을 포함하여 이루어진 것을 특징으로 하는 전자기력 구동 미소 밸브.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2003-0052707A KR100510696B1 (ko) | 2003-07-30 | 2003-07-30 | 전자기력 구동 미소 밸브 |
JP2004167077A JP2005003200A (ja) | 2003-06-11 | 2004-06-04 | マイクロアクチュエータ及びその製造方法並びにマイクロ作動バルブ |
EP04013250A EP1486682A3 (en) | 2003-06-11 | 2004-06-04 | Micro-actuator, fabrication method thereof and micro-actuating valve |
US10/863,460 US7055797B2 (en) | 2003-06-11 | 2004-06-09 | Micro-actuator, fabrication method thereof, and micro-actuating valve |
CN200410046586.1A CN1572717A (zh) | 2003-06-11 | 2004-06-11 | 微致动器及其制造方法,以及微驱动阀 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2003-0052707A KR100510696B1 (ko) | 2003-07-30 | 2003-07-30 | 전자기력 구동 미소 밸브 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050014199A KR20050014199A (ko) | 2005-02-07 |
KR100510696B1 true KR100510696B1 (ko) | 2005-08-31 |
Family
ID=37225365
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2003-0052707A KR100510696B1 (ko) | 2003-06-11 | 2003-07-30 | 전자기력 구동 미소 밸브 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100510696B1 (ko) |
-
2003
- 2003-07-30 KR KR10-2003-0052707A patent/KR100510696B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20050014199A (ko) | 2005-02-07 |
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