KR100487611B1 - 박막형 자계센서 제조방법 - Google Patents
박막형 자계센서 제조방법 Download PDFInfo
- Publication number
- KR100487611B1 KR100487611B1 KR10-2002-0043487A KR20020043487A KR100487611B1 KR 100487611 B1 KR100487611 B1 KR 100487611B1 KR 20020043487 A KR20020043487 A KR 20020043487A KR 100487611 B1 KR100487611 B1 KR 100487611B1
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- magnetic
- magnetic field
- film pattern
- field sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000010409 thin film Substances 0.000 claims abstract description 87
- 238000010438 heat treatment Methods 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims description 16
- 229910008423 Si—B Inorganic materials 0.000 claims description 6
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 2
- 229910020018 Nb Zr Inorganic materials 0.000 claims description 2
- 229910007991 Si-N Inorganic materials 0.000 claims description 2
- 229910002796 Si–Al Inorganic materials 0.000 claims description 2
- 229910006294 Si—N Inorganic materials 0.000 claims description 2
- 239000002356 single layer Substances 0.000 abstract description 2
- 238000004891 communication Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- -1 and for example Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005381 magnetic domain Effects 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 210000003491 skin Anatomy 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 210000002615 epidermis Anatomy 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000013080 microcrystalline material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/40—Devices controlled by magnetic fields
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
- H10N50/85—Materials of the active region
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Measuring Magnetic Variables (AREA)
- Hall/Mr Elements (AREA)
Abstract
Description
Claims (2)
- 동일한 비전도성 기판상에 서로 수직한 방향으로 제 1 자성박막패턴과 제 2 자성박막패턴을 형성하는 제 1 단계;상기 제 1 및 제 2 자성박막패턴에 전류를 인가하여. 인가된 전류의 흐름에 의해 발생되는 열로 상기 제 1 및 제 2 자성박막패턴에 대한 열처리를 수행하고 동시에 상기 제 1 및 제 2 자성박막패턴에 각각 폭방향으로 자기 이방성을 부여하는 제 2 단계를 포함하는 박막형 자계센서 제조방법.
- 제 1항에 있어서, 상기 제 1 및 제 2 자성박막패턴은Fe-Ni, Fe-Si-Al, Co-Nb-Zr, Fe-Hf-C, Fe-Cu-Nb-Si-B, Co-Fe-Si-B, Co-Fe-Ni-Si-B, Fe-Si-N 중의 적어도 어느 하나로 구성되는 것을 특징으로 하는 박막형 자계센서 제조방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0043487A KR100487611B1 (ko) | 2002-07-24 | 2002-07-24 | 박막형 자계센서 제조방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0043487A KR100487611B1 (ko) | 2002-07-24 | 2002-07-24 | 박막형 자계센서 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040009513A KR20040009513A (ko) | 2004-01-31 |
KR100487611B1 true KR100487611B1 (ko) | 2005-05-24 |
Family
ID=37318420
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2002-0043487A Expired - Fee Related KR100487611B1 (ko) | 2002-07-24 | 2002-07-24 | 박막형 자계센서 제조방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100487611B1 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101720996B1 (ko) | 2016-11-18 | 2017-03-30 | (주) 호창엠에프 | 냉간단조를 이용한 디프렌셜 어셈블리의 디프렌셜 컵 제조방법 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0640840A2 (en) * | 1993-08-25 | 1995-03-01 | Nippon Telegraph And Telephone Corporation | Magnetic field sensing method and apparatus |
US5764055A (en) * | 1995-11-02 | 1998-06-09 | Canon Denshi Kabushiki Kaisha | Magnetism sensor using a magnetism detecting device of a magnetic impedance effect type and control apparatus using the same |
US5838154A (en) * | 1995-03-17 | 1998-11-17 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Multilayered magnetic sensor having conductive layer within megnetic layer |
JPH10320717A (ja) * | 1997-05-15 | 1998-12-04 | Hitachi Ltd | 磁気センサ |
JP2000058321A (ja) * | 1998-08-12 | 2000-02-25 | Fujitsu Ltd | 磁化方向制御膜の製造方法及び磁気センサの製造方法 |
KR20010068574A (ko) * | 2000-01-07 | 2001-07-23 | 윤문수 | 철-지르코늄-붕소-은 계 연자성 재료 및 박막의 제조방법 |
KR20020007433A (ko) * | 2000-07-13 | 2002-01-29 | 김창경 | 비선형성 자기 센서의 구조 |
-
2002
- 2002-07-24 KR KR10-2002-0043487A patent/KR100487611B1/ko not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0640840A2 (en) * | 1993-08-25 | 1995-03-01 | Nippon Telegraph And Telephone Corporation | Magnetic field sensing method and apparatus |
US5838154A (en) * | 1995-03-17 | 1998-11-17 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Multilayered magnetic sensor having conductive layer within megnetic layer |
US5764055A (en) * | 1995-11-02 | 1998-06-09 | Canon Denshi Kabushiki Kaisha | Magnetism sensor using a magnetism detecting device of a magnetic impedance effect type and control apparatus using the same |
JPH10320717A (ja) * | 1997-05-15 | 1998-12-04 | Hitachi Ltd | 磁気センサ |
JP2000058321A (ja) * | 1998-08-12 | 2000-02-25 | Fujitsu Ltd | 磁化方向制御膜の製造方法及び磁気センサの製造方法 |
KR20010068574A (ko) * | 2000-01-07 | 2001-07-23 | 윤문수 | 철-지르코늄-붕소-은 계 연자성 재료 및 박막의 제조방법 |
KR20020007433A (ko) * | 2000-07-13 | 2002-01-29 | 김창경 | 비선형성 자기 센서의 구조 |
Also Published As
Publication number | Publication date |
---|---|
KR20040009513A (ko) | 2004-01-31 |
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Termination category: Default of registration fee Termination date: 20100410 |