KR100470750B1 - Electro polishing combined electric plating apparatus and electroless plating apparatus using the same - Google Patents
Electro polishing combined electric plating apparatus and electroless plating apparatus using the same Download PDFInfo
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- KR100470750B1 KR100470750B1 KR1020040074045A KR20040074045A KR100470750B1 KR 100470750 B1 KR100470750 B1 KR 100470750B1 KR 1020040074045 A KR1020040074045 A KR 1020040074045A KR 20040074045 A KR20040074045 A KR 20040074045A KR 100470750 B1 KR100470750 B1 KR 100470750B1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1619—Apparatus for electroless plating
- C23C18/1632—Features specific for the apparatus, e.g. layout of cells and of its equipment, multiple cells
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1675—Process conditions
- C23C18/168—Control of temperature, e.g. temperature of bath, substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1848—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by electrochemical pretreatment
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/04—Tubes; Rings; Hollow bodies
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
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- Chemical Kinetics & Catalysis (AREA)
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- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Chemically Coating (AREA)
Abstract
Description
본 발명은 도금에 관한 것으로서, 보다 상세하게는 전해연마 겸용 전기도금장치에 관한 것이다. 또한, 본 발명은 전해연마 겸용 전기도금와 무전해 도금장치를 갖는 무전해 도금 시스템에 관한 것이다.The present invention relates to plating, and more particularly, to an electroplating apparatus for electrolytic polishing. The present invention also relates to an electroless plating system having both electroplating and electroplating and an electroless plating apparatus.
불소 수지는 화학 약품에 대한 내구성이 매우 강하고, 전기적 성질도 우수하며, 고온에도 안정적이라는 특성을 구비하여, 기계 부품, 전기, 전자 부품 등의 표면 상에 불소 수지막의 코팅이 일반적으로 행해지고 있다.Fluorine resins have characteristics that are extremely resistant to chemicals, have excellent electrical properties, and are stable even at high temperatures, and coating of the fluororesin film on the surfaces of mechanical parts, electrical parts, and electronic parts is generally performed.
이러한 불소 수지막의 코팅에 앞서, 불소수지막의 피처리물에 대한 밀착성을 향상시키기 위해, 미리 피처리물의 표면을 거칠게 하는 처리가 수행된다.Prior to the coating of the fluorine resin film, a treatment is performed in advance to roughen the surface of the object to improve the adhesion of the fluorine resin film to the object.
파이프와 같은 피도금물의 내/외표면 상에 불소수지막을 코팅하기 위해서, 종래에는 전기 도금이나 무전해도금장치를 사용하였다.In order to coat the fluororesin film on the inner and outer surfaces of a plated object such as a pipe, electroplating or electroless plating apparatus has conventionally been used.
그러나, 상기한 종래의 도금장치들은 파이프의 길이가 1m 이상이 되면, 파이프의 전표면에 걸쳐서 도금막이 균일하게 코팅되지 않는 단점을 갖는다.However, the above-described conventional plating apparatus has a disadvantage that the plating film is not uniformly coated over the entire surface of the pipe when the length of the pipe is 1 m or more.
또한, 피도금물에 무전해 도금막만을 형성하는 종래의 무전해 도금장치는, 피도금물이 귀금속, 스테인레스강, 알루미늄 합금으로 이루어지는 경우, 피도금막 표면에서 핀홀의 발생가능성이 높아서 도금막이 쉽게 박리되는 단점을 갖는다.In addition, the conventional electroless plating apparatus which forms only the electroless plating film on the plated object has a high possibility of generating pinholes on the surface of the plated film when the plated material is made of a noble metal, stainless steel, or an aluminum alloy. It has the disadvantage of peeling off.
따라서, 본 발명은 상기한 문제점들을 해결하기 위하여 안출된 것으로서, 본 발명의 일 목적은 귀금속, 스테인레스 강 또는 몰리브덴강으로 이루어진 파이프 형태의 피처리물에 적용될 수 있는 전해연마 겸용 전기도금장치 및 이를 이용한 무전해 도금장치를 제공하는데 있다.Accordingly, the present invention has been made to solve the above problems, an object of the present invention is an electroplating combined electroplating apparatus that can be applied to the workpiece in the form of pipes made of precious metals, stainless steel or molybdenum steel and using the same An electroless plating apparatus is provided.
본 발명의 다른 목적은 도금층과 피도금물 사이에서 핀홀 발생을 억제하여 피도금물에 대한 도금층의 응착력을 높일 수 있는 전해연마 겸용 도금장치 및 이를 이용한 무전해 도금장치를 제공하는데 있다.Another object of the present invention is to provide an electropolishing combined plating apparatus and an electroless plating apparatus using the same, which can increase the adhesion of the plating layer to the plated material by suppressing pinhole generation between the plated layer and the plated material.
도 1은 본 발명의 일실시예에 따르는 전해연마 겸용 전기 도금장치의 개략적인 구성도이다.1 is a schematic configuration diagram of an electropolishing combined electroplating apparatus according to an embodiment of the present invention.
도 2는 본 발명의 다른 실시예에 따르는 무전해 도금장치의 개략적인 구성도이다.2 is a schematic configuration diagram of an electroless plating apparatus according to another embodiment of the present invention.
도 3은 본 발명의 또 다른 실시예에 따르는 무전해 도금장치의 개략적인 구성도이다.3 is a schematic configuration diagram of an electroless plating apparatus according to another embodiment of the present invention.
상기한 목적을 달성하기 위하여, 본 발명의 일측면에 따르는 전해연마 겸용 도금장치는, 전해액 내에 침지되는 파이프 형태의 피도금물의 내부 경로를 따라서 도금재를 이송하는 이송수단; 및 상기 이송수단에 연결된 도금재에 양의 전압을 인가하고 상기 피도금물에 음의 전압을 인가하거나, 상기 도금재에 음의 전압을 인가하고 상기 피도금물에 양의 전압을 인가하며, 상기 피도금물을 이송할 수 있는 피도금물 이송장치를 포함한다.In order to achieve the above object, the electropolishing combined plating apparatus according to an aspect of the present invention, the transfer means for transferring the plating material along the inner path of the plated object to be immersed in the electrolyte; And applying a positive voltage to the plated material connected to the transfer means and applying a negative voltage to the plated material, or applying a negative voltage to the plated material and applying a positive voltage to the plated material. And a plated material transfer device capable of transferring the plated object.
상기 피도금물은 귀금속, 스테인레스강, 몰리브덴강으로 구성되는 그룹으로부터 선택된 물질로 이루어지는 것이 바람직하고, 또한, 상기 피도금물은 적어도 1m 이상의 길이를 갖는 것이 바람직하다.It is preferable that the to-be-plated material consists of a substance selected from the group which consists of a noble metal, stainless steel, and molybdenum steel, and it is preferable that the to-be-plated material has a length of at least 1 m or more.
본 발명의 다른 측면에 따르면, 도금장치는, 전해액 내에 침지되는 파이프 형태의 피도금물의 내부 경로를 따라서 도금재를 이송하는 이송수단, 및 상기 이송수단에 연결된 도금재에 양의 전압을 인가하고 상기 피도금물에 음의 전압을 인가하거나, 상기 도금재에 음의 전압을 인가하고 상기 피도금물에 양의 전압을 인가하며, 상기 피도금물을 이송할 수 있는 피도금물 이송장치를 포함하는 전해연마 겸용 도금장치; 및 상기 전해연마 겸용 도금장치에 의하여 전해연마 및/또는 전기도금된 피처리물의 표면에 적어도 1층의 무전해 도금막을 형성하기 위한 무전해 도금장치를 포함한다.According to another aspect of the present invention, the plating apparatus, the transfer means for transferring the plating material along the inner path of the plated object to be immersed in the electrolyte, and applying a positive voltage to the plating material connected to the transfer means and And a plated material transfer device capable of applying a negative voltage to the plated material, or applying a negative voltage to the plated material, applying a positive voltage to the plated material, and transferring the plated material. Electrolytic polishing combined plating apparatus; And an electroless plating apparatus for forming at least one layer of electroless plating film on the surface of the workpiece to be electropolished and / or electroplated by the electropolishing combined plating apparatus.
바람직하게는, 상기 무전해 도금장치는 피도금물을 상기 전해액의 수평면에 대하여 수직하거나 소정의 각도로 경사지게 유지하는 한편 상기 피도금물을 이송하기 위한 피도금물 이송수단을 포함한다.Preferably, the electroless plating apparatus includes a plated material transferring means for transferring the plated object while maintaining the plated object perpendicular to the horizontal plane of the electrolyte or inclined at a predetermined angle.
바람직하게는, 상기 피도금물 이송수단은 상기 피도금물을 회전시키는 기능을 갖는다.Preferably, the plated object transfer means has a function of rotating the plated object.
선택적으로, 상기 도금장치는, 상기 전해액을 일정 온도로 유지하기 위한 온도 유지수단을 추가로 포함한다.Optionally, the plating apparatus further comprises temperature holding means for maintaining the electrolyte at a constant temperature.
바람직하게는, 상기 온도 유지 수단은, 상기 전해액이 담겨진 내조를 둘러싸고, 그 내부에 열매체유를 담고있는 외조와, 상기 내조의 하부에 배치되어, 상기 내조를 소정 온도로 가열 또는 냉각하기 위한 냉각 및 가열장치를 포함한다.Preferably, the temperature maintaining means includes an outer bath surrounding the inner bath in which the electrolyte solution is contained, containing heat medium oil therein, and a lower part of the inner bath, for cooling or heating the inner bath to a predetermined temperature; A heating device.
이하, 본원 발명에 따른 전해연마 겸용 전기도금장치 및 이를 이용한 무전해 도금장치의 바람직한 형태에 대해서 상세히 설명한다.Hereinafter, a preferred embodiment of the electropolishing combined electroplating apparatus and the electroless plating apparatus using the same according to the present invention will be described in detail.
도 1은 본 발명의 일실시예에 따르는 전해연마 겸용 전기도금장치의 개략도이다.1 is a schematic diagram of an electropolishing combined electroplating apparatus according to an embodiment of the present invention.
도 1을 참조하면, 전해연마 겸용 전기도금장치(10)는, 전해조(11)에 담겨진 전해액(12) 내에 침지되는 파이프 형태의 피도금물(16)의 내부 경로를 따라서 도금재(14)를 이송하는 이송장치(13); 및 상기 이송장치(13)에 연결된 도금재(14)에 양의 전압을 인가하고 상기 피도금물(16)에 음의 전압을 인가하거나, 상기 도금재(14)에 음의 전압을 인가하고 피도금물(16)에 양의 전압을 인가하며, 상기 피도금물을 이송할 수 있는 피도금물 이송장치(18)를 포함한다.Referring to FIG. 1, the electroplating combined electroplating apparatus 10 includes a plating material 14 along an inner path of a pipe-shaped plated object 16 immersed in the electrolyte solution 12 contained in the electrolytic cell 11. A conveying apparatus 13 for conveying; And applying a positive voltage to the plating material 14 connected to the transfer device 13 and applying a negative voltage to the plated material 16, or applying a negative voltage to the plating material 14 and Applying a positive voltage to the plated material 16, and includes a plated material transfer device 18 that can transfer the plated object.
전해연마 겸용 도금장치(10)를 전기도금장치로 사용하기 위해서, 도 1에 도시된 것처럼, 피도금물(16)에는 음(negative)의 전압이 인가되고 도금물(14, 15)에는 양(positive)의 전압이 인가된다.In order to use the electrolytic polishing plating apparatus 10 as an electroplating apparatus, as shown in FIG. 1, a negative voltage is applied to the plated object 16 and a positive ( Positive voltage is applied.
상기와 같이 피도금물(16)과 도금물(14, 15)에 전압이 인가되면, 도금물로부터 금속이온들이 이온화되어 피도금물(16)의 표면상에 석출되어 도금층을 형성한다. 이 도금층은 피도금물(16)의 내표면 상에 균일한 두께로 형성되는데, 이는 전기도금동안 도금물(14)을 피도금물(16)의 내부 경로를 따라 이동시키는 동작에 기인한다. 즉, 도금물(14)을 피도금물(16)의 내부 경로를 따라 이동시키므로써 도금물(14)로부터 이온화된 금속이온들의 피도금물(16)의 내표면까지의 석출경로들 사이의 차이를 감소시키기 때문이다.When voltage is applied to the plated object 16 and the plated material 14 and 15 as described above, metal ions are ionized from the plated material to precipitate on the surface of the plated material 16 to form a plated layer. This plating layer is formed to have a uniform thickness on the inner surface of the plated object 16 due to the operation of moving the plated material 14 along the inner path of the plated object 16 during electroplating. That is, the difference between the deposition paths from the plating 14 to the inner surface of the plating 16 of the ionized metal ions by moving the plating 14 along the inner path of the plating 16. Because it reduces.
도 1에 도시되지는 않았지만, 전해연마 겸용 도금장치(10)를 전해연마장치로 사용하기 위해서, 피도금물(16)에는 양의 전압이 인가되고 도금물(14, 15)에는 음의 전압이 인가된다.Although not shown in FIG. 1, in order to use the electrolytic polishing plating apparatus 10 as the electropolishing apparatus, a positive voltage is applied to the plated object 16 and a negative voltage is applied to the plated objects 14 and 15. Is approved.
상기와 같이 피도금물(16)과 도금물(14, 15)에 전압이 인가되면, 피도금물(16)의 표면으로부터 금속이온들이 이온화되어 도금물(14, 15)의 표면상에 석출된다. 결과적으로, 피도금물(16)의 표면은 전해연마된다.When voltage is applied to the plated object 16 and the plated material 14, 15 as described above, metal ions are ionized from the surface of the plated material 16 and are deposited on the surface of the plated material 14, 15. . As a result, the surface of the plated object 16 is electropolished.
전기도금이나 전해연마시, 피도금물(16)은 귀금속, 스테인레스강, 몰리브덴강으로 구성되는 그룹으로부터 선택된 물질로 이루어지는 것이 바람직하다.When electroplating or electropolishing, the plated object 16 is preferably made of a material selected from the group consisting of precious metals, stainless steels, and molybdenum steels.
또한, 상기한 전해연마 겸용 전기도금장치는 피도금물(16)의 길이에 관계없이 적용가능한데, 특히 피도금물(16)은 적어도 1m 이상의 길이를 갖는 경우에 더욱효과적이다.In addition, the electrolytic polishing combined electroplating apparatus described above can be applied irrespective of the length of the plated object 16, and is particularly effective when the plated object 16 has a length of at least 1 m or more.
도 1에서 미설명부호 24는 펌프로서 전해액(12)을 전해조(11)로 공급하기 위하여 사용되고, 22는 여과장치로서 전해조(11)로부터 흘러넘치는 전해액(12)이 재사용될 수 있도록 흘러넘치는 전해액(11)을 여과한다.In FIG. 1, reference numeral 24 is used to supply the electrolyte solution 12 to the electrolytic cell 11 as a pump, and 22 is an electrolyte that overflows so that the electrolyte solution 12 flowing from the electrolytic cell 11 can be reused as a filtration device. 11) filter.
도 2와 도 3은 도 1에 도시한 전해연마 겸용 전기도금장치와 조합하여 사용되는 무전해도금장치를 예시적으로 보여주는 도면들이다.2 and 3 are views showing an electroless plating apparatus used in combination with the electropolishing combined electroplating apparatus shown in FIG.
도 2를 참조하면, 무전해 도금장치(40)는, 제1내조(41)에 담겨진 전해액(43) 내에 침지되는 파이프 형태의 피도금물(16)을 수직하게 유지하는 한편 상기 피도금물(16)을 이송하는 피도금물 이송장치(45)와, 전해액(43, 53)을 일정 온도로 유지하기 위한 온도 유지장치, 전해액(43, 53)을 제1내조(41)에서 제2내조(51)로, 제2내조(51)에서 제1내조(41)로 공급하기 위한 펌프(46, 56), 및 제1내조(41) 또는 제2내조(51)로 공급되는 전해액을 여과하기 위한 여과장치(47, 57)를 포함한다. 여기서, 제2내조(51)는 제1내조(41)로 공급할 전해액을 담고있는 보조탱크이다.Referring to FIG. 2, the electroless plating apparatus 40 maintains the pipe-shaped plated object 16 immersed in the electrolyte 43 contained in the first inner tank 41 vertically while the plated object ( 16, the plated material transfer device 45 for transferring the temperature, the temperature holding device for maintaining the electrolyte solution 43, 53 at a constant temperature, and the electrolyte solution 43, 53 from the first inner tank 41 to the second inner tank ( 51, for filtering the pumps 46 and 56 for supplying from the second inner tank 51 to the first inner tank 41, and for filtering the electrolyte solution supplied to the first inner tank 41 or the second inner tank 51. Filtration devices 47, 57. Here, the second inner tank 51 is an auxiliary tank containing the electrolyte to be supplied to the first inner tank (41).
상기 온도 유지장치는, 전해액(43, 53)이 담겨진 제1, 제2내조(41, 51)를 둘러싸고, 그 내부에 열매체유(48)를 담고있는 제1, 제2외조(42, 52)와, 제1, 제2내조(41, 51)의 하부에 배치되어, 제1, 제2내조(41, 51)를 소정 온도로 가열 또는 냉각하기 위한 냉각 및 가열장치(49, 59)를 포함한다.The temperature maintaining device includes first and second outer tanks 42 and 52 that surround the first and second inner tanks 41 and 51 in which the electrolyte solutions 43 and 53 are contained and contain the heat medium oil 48 therein. And a cooling and heating device (49, 59) disposed below the first and second inner tanks (41, 51) for heating or cooling the first and second inner tanks (41, 51) to a predetermined temperature. do.
한편, 도 3에 도시된 무전해 도금장치(60)는, 제1무전해 도금조(61)에 담겨진 전해액(63) 내에 침지되는 파이프 형태의 피도금물(16)을 수평면에 대하여 소정각도로 경사지게 유지하는 한편 상기 피도금물(16)을 이송 및 회전하는 피도금물 이송 및 회전장치(65)와, 전해액(63, 73)을 일정 온도로 유지하기 위한 온도 유지장치와, 전해액(63, 73)을 제1내조(61)에서 제2내조(71)로, 제2내조(71)에서 제1내조(61)로 공급하기 위한 펌프(66, 76), 및 제1내조(61) 또는 제2내조(71)로 공급되는 전해액(63, 73)을 여과하기 위한 여과장치(67, 77)를 포함한다.On the other hand, the electroless plating apparatus 60 shown in Figure 3, the pipe-like to-be-coated object 16 immersed in the electrolyte (63) contained in the first electroless plating bath 61 at a predetermined angle with respect to the horizontal plane. A plated material conveying and rotating device 65 for conveying and rotating the plated material 16 while maintaining it inclined; a temperature holding device for maintaining the electrolytes 63 and 73 at a constant temperature; Pumps 66 and 76 for supplying 73 from the first inner tank 61 to the second inner tank 71, and from the second inner tank 71 to the first inner tank 61, and the first inner tank 61, or And filtration devices 67 and 77 for filtering the electrolyte solutions 63 and 73 supplied to the second inner tank 71.
상기 온도 유지장치는, 전해액(63, 73)이 담겨진 제1, 제2내조(61, 71)를 둘러싸고, 그 내부에 열매체유(68)를 담고있는 제1, 제2외조(62, 72)와, 제1, 제2내조(61, 71)의 하부에 배치되어, 제1, 제2내조(61, 71)를 소정 온도로 가열 또는 냉각하기 위한 냉각 및 가열장치(69, 79)를 포함한다.The temperature maintaining device includes first and second outer tanks 62 and 72 surrounding the first and second inner tanks 61 and 71 in which the electrolyte solutions 63 and 73 are contained, and containing the heat medium oil 68 therein. And a cooling and heating device (69, 79) disposed below the first and second inner tanks (61, 71) to heat or cool the first and second inner tanks (61, 71) to a predetermined temperature. do.
앞서 언급한 것처럼, 도 2의 무전해 도금장치(40)와는 달리, 도 3의 무전해 도금장치(60)는 피도금물(16)이 전해액(63)의 수평면에 대하여 소정 각도로 경사지게 위치하며, 무전해 도금이 수행되는 동안 피도금물 이송 및 회전장치(65)가 피도금물을 회전시킨다는 점에 특징이 있다. 이러한 피도금물(16)의 경사 배치 및 회전은 무전해 도금막이 피도금물의 표면에 균일한 두께로 형성되도록 한다.As mentioned above, unlike the electroless plating apparatus 40 of FIG. 2, the electroless plating apparatus 60 of FIG. 3 has the plated object 16 inclined at a predetermined angle with respect to the horizontal plane of the electrolyte 63. , Characterized in that the plated material transfer and rotation device 65 rotates the plated object while the electroless plating is performed. The inclined arrangement and rotation of the plated object 16 allows the electroless plated film to be formed in a uniform thickness on the surface of the plated object.
도 1의 전해연마 겸용 전기도금장치와 도 2 또는 도 3의 무전해 도금장치를 조합하여 피도금물에 대한 도금막의 응착성이 우수한 무전해 도금막을 형성하는 것이 가능하다. 이하, 도 1의 전해연마 겸용 전기도금장치와 도 2 또는 도 3의 무전해 도금장치를 이용하여 무전해 도금막을 형성하는 방법이 설명된다.It is possible to form an electroless plated film which is excellent in adhesion of the plated film to the plated object by combining the electropolishing combined electroplating apparatus of FIG. 1 and the electroless plating apparatus of FIG. 2 or 3. Hereinafter, a method of forming an electroless plating film using the electropolishing combined electroplating apparatus of FIG. 1 and the electroless plating apparatus of FIG. 2 or 3 will be described.
먼저, 도 1의 전해연마 겸용 전기도금장치를 이용하여 피도금물(16)의 표면을 전해연마한다.First, the surface of the plated object 16 is electropolished using the electropolishing combined electroplating apparatus of FIG.
구체적으로, 제1전극인 피도금물(16)에는 양의 전압을 인가하여 피도금물(16)이 양극으로 작용하도록 하고, 제2전극(14)에는 음의 전압을 걸어서 제2전극(14)이 음극으로 작용하도록 한다.Specifically, a positive voltage is applied to the plated object 16 that is the first electrode so that the plated object 16 acts as an anode, and a second voltage is applied to the second electrode 14 by applying a negative voltage. ) Acts as the cathode.
전압이 인가됨에 따라 양극으로 기능하는 피도금물(16)의 표면은 전기적으로 연마된다. 구체적으로, 전해연마전 피도금물(16)의 표면은 돌출부와 오목부가 교번적으로 나타나는 구조를 가지며, 오목부의 깊이는 매우 깊다. 전해연마공정동안 피도금물(16)의 표면의 돌출부가 집중적으로 연마되어 돌출부의 상부 표면과 오목부의 바닥표면 사이의 높이차이가 감소된다. 그 결과, 오목부에서 핀홀 발생가능성이 감소하고, 피도금물의 표면과 도금층 사이의 응착력은 증가한다. 이로 인하여 도금층의 박리 가능성은 현저하게 낮아진다. 즉, 전해연마공정이 완료된 피도금물의 표면 거칠기는 감소하고 광택은 현저하게 증가한다.As the voltage is applied, the surface of the plated object 16 serving as the anode is electrically polished. Specifically, the surface of the electroplated workpiece 16 has a structure in which protrusions and recesses alternately appear, and the depth of the recess is very deep. During the electropolishing process, the protrusions on the surface of the plated object 16 are intensively polished to reduce the height difference between the top surface of the protrusion and the bottom surface of the recess. As a result, the likelihood of pinhole generation in the recess decreases, and the adhesion between the surface of the plated material and the plating layer increases. For this reason, the possibility of peeling of a plating layer becomes remarkably low. That is, the surface roughness of the plated material after the electropolishing process is completed is reduced and the gloss is significantly increased.
전해연마공정이 완료된 후, 바람직하게는, 피도금물은 3차에 걸쳐서 도금처리된다. 즉, 도1의 전해연마겸용 전기도금장치를 이용한 1회의 전기도금과 도 2 또는 도 3의 무전해 도금장치를 이용한 2회의 무전해도금이 수행된다.After the electropolishing process is completed, the plated material is preferably plated over three times. That is, one electroplating using the electropolishing combined electroplating apparatus of FIG. 1 and two electroplating using the electroless plating apparatus of FIG. 2 or 3 are performed.
선택적으로, 전해연마공정의 완료후, 불소수지를 함유한 무전해도금공정이 1회만 수행될 수도 있다.Optionally, after completion of the electrolytic polishing process, the electroless plating process containing fluorine resin may be performed only once.
또한, 전해연마공정의 완료후, 불소수지를 함유하지 않은 무전해도금공정과 불소수지를 함유한 무전해 도금공정이 각각 1회씩 수행될 수도 있다.In addition, after completion of the electrolytic polishing process, the electroless plating process containing no fluorine resin and the electroless plating process containing fluorine resin may be performed once each.
다시, 도 1을 참조하면, 전해연마 공정이 완료된 피도금물의 표면 상에 전기도금막을 형성하기 위하여, 피도금물(16)에는 음의 전압이 인가되고, 도금물(14)에는 양의 전압이 인가된다. 이때, 피도금물(16)의 내부에 위치한 도금물(14)은 피도금물(16)의 내부경로를 따라서 소정 속도로 이동한다. 상기한 전기도금의 결과, 피도금물(16)의 표면에는 제1 도금막이 형성된다.Referring back to FIG. 1, in order to form an electroplated film on the surface of the plated object on which the electropolishing process is completed, a negative voltage is applied to the plated object 16 and a positive voltage to the plated object 14. Is applied. At this time, the plating material 14 located inside the plated object 16 moves at a predetermined speed along the inner path of the plated object 16. As a result of the above electroplating, a first plated film is formed on the surface of the plated object 16.
다음으로, 도 2를 참조하면, 무전해 도금장치(40)를 이용하여 제1 도금막의 표면에 제1 무전해 도금막이 형성된다.Next, referring to FIG. 2, the first electroless plating film is formed on the surface of the first plating film by using the electroless plating apparatus 40.
구체적으로, 피도금물 이송장치(45)를 이용하여 제1내조(41)에 담겨진 제1무전해 도금액(43) 내에 피도금물(16)이 수직으로 위치시켜 소정 시간동안 침지시킨다.Specifically, the plated object 16 is vertically positioned in the first electroless plating solution 43 contained in the first inner tank 41 by using the plated object transfer device 45 to be immersed for a predetermined time.
그후, 피도금물(16)을 제1무전해 도금액(43)으로부터 추출하고, 물로 씻은 후 상온 환경하에 방치하여 건조시킨다.Thereafter, the plated object 16 is extracted from the first electroless plating solution 43, washed with water, and left to dry in an ambient temperature environment.
상기 제1 무전해 도금액(43)은 금속염으로서 유산 니켈, 환원제로서 차린산소다, 착화제로서 능금산, 숙신산 또는 젖산과, 조정제, pH 조정제 등을 함유한다.The first electroless plating solution 43 contains nickel lactate as the metal salt, sodium charine as the reducing agent, succinic acid, succinic acid or lactic acid as the complexing agent, a regulator, a pH adjuster and the like.
이어서, 상기 제1전기도금막과 제1무전해 도금막을 갖는 피도금물(16)을 도 3의 무전해 도금장치의 제2무전해 도금액(63) 내에 소정 각도로 경사지게 침지시켜 제2 무전해 도금층을 형성한다. 그후, 이 피도금물(16)을 제2무전해 도금액(63)으로부터 추출하고, 물로 씻은 후 상온 환경하에 방치하여 건조시켰다. 그후 상기 피도금물을 300℃로 상승 유지시킨 퍼니스(furnace) 내에 배치하고, 60분간 방치하여 베이킹 처리를 하고, 무전해 도금에 의한 박막이 표면에 형성된 최종 제품인 피도금 피처리물을 얻는다.Subsequently, the plated object 16 having the first electroplating film and the first electroless plating film is immersed at a predetermined angle in the second electroless plating solution 63 of the electroless plating apparatus of FIG. A plating layer is formed. Then, this to-be-plated object 16 was extracted from the 2nd electroless plating liquid 63, washed with water, and left to stand in room temperature environment, and it dried. Thereafter, the plated object is placed in a furnace kept at 300 ° C. and left to stand for 60 minutes to bake to obtain a plated object, which is a final product on which a thin film by electroless plating is formed on the surface.
상기 제2무전해 도금액(63)은 금속염으로서 유산 니켈, 환원제로서 차아린산소다, 불소 수지로서 폴리테트라 플루오르 에틸렌(PTEF)를 함유한다.The second electroless plating solution 63 contains nickel lactate as the metal salt, sodium hypochlorite as the reducing agent, and polytetrafluoroethylene (PTEF) as the fluorine resin.
상기 최종 피도금 피처리물은 선행기술의 그것에 비하여 매우 높은 평탄도와도금 밀착 밀도를 가지고 있었다.The final plated workpiece had a very high flatness and plating adhesion density compared to that of the prior art.
선택적으로, 도 2의 무전해 도금장치나 도 3의 무전해 도금장치만을 이용하여 제1, 제2 무전해 도금막을 형성할 수도 있다. 이를 위해서는, 내조에 담겨진 무전해 도금액을 앞서 언급한 조성으로 바꾸어준다.Alternatively, the first and second electroless plating films may be formed using only the electroless plating apparatus of FIG. 2 or the electroless plating apparatus of FIG. To this end, the electroless plating solution contained in the inner tank is converted into the aforementioned composition.
이상에서 설명한 것처럼, 본 발명의 전해연마 겸용 전기도금 장치 및 이를 이용한 무전해 도금장치에 따르면, 귀금속, 스테인레스 강 또는 몰리브덴강으로 이루어진 파이프 형태의 피도금물과 도금층 사이에서 핀홀 발생을 억제하여 피도금물에 대하여 높은 응착력을 갖는 전기 도금막이나 무전해 도금막을 형성할 수 있다.As described above, according to the electroplating apparatus for electropolishing and electroplating of the present invention and the electroless plating apparatus using the same, the pinhole is prevented by preventing the occurrence of pinholes between the plating layer and the plated layer formed of a precious metal, stainless steel or molybdenum steel An electroplating film or an electroless plating film having high adhesion to gold can be formed.
본 발명은 도면에 도시된 실시예를 참고로 설명되었으나 이는 예시적인 것에 불과하며, 본 기술 분야의 통상의 지식을 가진 자라면 이로부터 다양한 변형 및 균등한 다른 실시예가 가능하다는 점을 이해할 것이다. 따라서, 본 발명의 진정한 기술적 보호 범위는 첨부된 특허청구범위의 기술적 사상에 의하여 정해져야 할 것이다.Although the present invention has been described with reference to the embodiments shown in the drawings, this is merely exemplary, and it will be understood by those skilled in the art that various modifications and equivalent other embodiments are possible. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.
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KR1020040074045A KR100470750B1 (en) | 2004-09-16 | 2004-09-16 | Electro polishing combined electric plating apparatus and electroless plating apparatus using the same |
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WO (1) | WO2006030998A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101172813B1 (en) | 2009-12-07 | 2012-08-09 | 한국전기연구원 | apparatus for tubular type high-field fabrication of anodic nanostructures |
WO2013151381A1 (en) * | 2012-04-05 | 2013-10-10 | 포항공과대학교 산학협력단 | Apparatus and method for anodizing inner surface of tube |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6024396A (en) * | 1983-07-19 | 1985-02-07 | Mitsubishi Heavy Ind Ltd | Method for electroplating on inside surface of pipe |
DE4325631C2 (en) * | 1993-07-30 | 1996-03-28 | Joergens Klaus | Device for the electrophoretic coating of the inner surface of hollow bodies |
JPH1112791A (en) * | 1997-06-26 | 1999-01-19 | Hashimoto Kinzoku Kogyo Kk | Device for plating inner face of metallic pipe |
-
2004
- 2004-09-16 KR KR1020040074045A patent/KR100470750B1/en not_active IP Right Cessation
- 2004-10-16 WO PCT/KR2004/002658 patent/WO2006030998A1/en active Application Filing
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101172813B1 (en) | 2009-12-07 | 2012-08-09 | 한국전기연구원 | apparatus for tubular type high-field fabrication of anodic nanostructures |
WO2013151381A1 (en) * | 2012-04-05 | 2013-10-10 | 포항공과대학교 산학협력단 | Apparatus and method for anodizing inner surface of tube |
Also Published As
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WO2006030998A1 (en) | 2006-03-23 |
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