KR100466963B1 - 액티브 매트릭스형 유기발광다이오드 소자용 박막트랜지스터 - Google Patents
액티브 매트릭스형 유기발광다이오드 소자용 박막트랜지스터 Download PDFInfo
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- KR100466963B1 KR100466963B1 KR10-2001-0086425A KR20010086425A KR100466963B1 KR 100466963 B1 KR100466963 B1 KR 100466963B1 KR 20010086425 A KR20010086425 A KR 20010086425A KR 100466963 B1 KR100466963 B1 KR 100466963B1
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- thin film
- film transistor
- region
- light emitting
- organic light
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- 239000010409 thin film Substances 0.000 title claims abstract description 61
- 239000011159 matrix material Substances 0.000 title claims abstract description 15
- 239000004065 semiconductor Substances 0.000 claims abstract description 25
- 229920001621 AMOLED Polymers 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims description 12
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 12
- 229920005591 polysilicon Polymers 0.000 claims description 12
- 239000010408 film Substances 0.000 claims description 3
- 239000012535 impurity Substances 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 33
- 239000003990 capacitor Substances 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000872 buffer Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42384—Gate electrodes for field effect devices for field-effect transistors with insulated gate for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78651—Silicon transistors
- H01L29/7866—Non-monocrystalline silicon transistors
- H01L29/78672—Polycrystalline or microcrystalline silicon transistor
- H01L29/78675—Polycrystalline or microcrystalline silicon transistor with normal-type structure, e.g. with top gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (8)
- 화면을 구현하는 최소 단위영역인 화소 영역별로 형성된 박막트랜지스터와, 상기 박막트랜지스터와 연결되는 유기전계발광 다이오드를 가지는 액티브 매트릭스형 유기전계발광 소자용 박막트랜지스터에 있어서,양측부를 소스 영역 및 드레인 영역으로 각각 가지는 반도체층과;상기 반도체층의 중앙부와 중첩되게 위치하는 게이트 전극과;상기 반도체층의 소스 영역 및 드레인 영역과 연결되는 소스 전극 및 드레인 전극을 포함하며, 상기 게이트 전극과 중첩되는 반도체층 영역은 채널부를 이루고, 상기 채널부는 문턱전압을 낮추는 역할을 하며 상대적으로 짧은 채널 길이를 갖는 제 1 영역과, 상기 제 1 영역에서 점진적으로 채널의 길이가 증가되며 게이트 전압변화에 따른 소스 드레인 전류 트랜스퍼 곡선상의 선형영역 구간을 넓히는 역할을 하는 제 2 영역을 가지는 것을 특징으로 하는 액티브 매트릭스형 유기전계발광 소자용 박막트랜지스터.
- 제 1 항에 있어서,상기 제 1 영역에서 문턱 전압(Vth)을 낮출 수 있는 쇼트 채널(short length channel)특성과, 상기 제 2 영역에서 게이트 전압 크기에 따른 전류의 크기를 세분화할 수 있는 롱 채널(long length channel) 특성을 모두 가지는 것을 특징으로 하는 액티브 매트릭스형 유기전계발광 소자용 박막트랜지스터.
- 제 1 항에 있어서,상기 액티브 매트릭스형 유기전계발광 소자는, 상기 게이트 전극을 이온 스타퍼(ion-stopper)로 이용하는 탑게이트형 폴리실리콘 박막트랜지스터를 포함하는 것을 특징으로 하는 액티브 매트릭스형 유기전계발광 소자용 박막트랜지스터.
- 제 1 항에 있어서,상기 채널부와 대응된 위치에서, 상기 게이트 전극은 사다리꼴 형상을 가지는 것을 특징으로 하는 액티브 매트릭스형 유기전계발광 소자용 박막트랜지스터.
- 제 1 항에 있어서,상기 채널부와 대응된 위치에서, 상기 게이트 전극의 채널 길이방향 중앙부 폭은 상부 및 하부보다 작은 값을 가지는 액티브 매트릭스형 유기전계발광 소자용 박막트랜지스터.
- 제 1 항에 있어서,상기 반도체층과 게이트 전극 사이에는 게이트 절연막이 개재되는 액티브 매트릭스형 유기전계발광 소자용 박막트랜지스터.
- 제 2 항에 있어서,상기 반도체층의 소스 및 드레인 영역은 불순물처리된 폴리실리콘층으로 이루어지는 액티브 매트릭스형 유기전계발광 소자용 박막트랜지스터.
- 상기 제 1 항에 따른 박막트랜지스터와, 상기 박막트랜지스터와 연결되는 유기전계발광 다이오드를 포함하는 액티브 매트릭스형 유기전계발광 소자.
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KR10-2001-0086425A KR100466963B1 (ko) | 2001-12-27 | 2001-12-27 | 액티브 매트릭스형 유기발광다이오드 소자용 박막트랜지스터 |
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KR10-2001-0086425A KR100466963B1 (ko) | 2001-12-27 | 2001-12-27 | 액티브 매트릭스형 유기발광다이오드 소자용 박막트랜지스터 |
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KR100466963B1 true KR100466963B1 (ko) | 2005-01-24 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8324018B2 (en) | 2005-01-28 | 2012-12-04 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, electronic device, and method of manufacturing semiconductor device |
US8487436B2 (en) | 2005-01-28 | 2013-07-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, electronic device, and method of manufacturing semiconductor device |
US10529786B2 (en) | 2016-07-07 | 2020-01-07 | Lg Display Co., Ltd. | Thin-film transistor and organic light-emitting display device including the same |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR102371366B1 (ko) * | 2020-08-10 | 2022-03-04 | 재단법인대구경북과학기술원 | 반도체 트랜지스터 |
KR20240112442A (ko) * | 2023-01-12 | 2024-07-19 | 한양대학교 산학협력단 | 사다리꼴 전극을 구비하는 터널링 전계 효과 트랜지스터 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH02109369A (ja) * | 1988-10-18 | 1990-04-23 | Mitsubishi Electric Corp | 半導体装置 |
JPH0488641A (ja) * | 1990-07-31 | 1992-03-23 | Toshiba Corp | 薄膜トランジスタの製造方法 |
JPH06260643A (ja) * | 1993-03-05 | 1994-09-16 | Semiconductor Energy Lab Co Ltd | 薄膜トランジスタ |
US6184559B1 (en) * | 1996-11-21 | 2001-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Active matrix display device having multiple gate electrode portions |
KR100361395B1 (ko) * | 1994-08-20 | 2003-03-06 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 박막회로를포함하는전자장치및그의제조방법 |
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- 2001-12-27 KR KR10-2001-0086425A patent/KR100466963B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH02109369A (ja) * | 1988-10-18 | 1990-04-23 | Mitsubishi Electric Corp | 半導体装置 |
JPH0488641A (ja) * | 1990-07-31 | 1992-03-23 | Toshiba Corp | 薄膜トランジスタの製造方法 |
JPH06260643A (ja) * | 1993-03-05 | 1994-09-16 | Semiconductor Energy Lab Co Ltd | 薄膜トランジスタ |
KR100361395B1 (ko) * | 1994-08-20 | 2003-03-06 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 박막회로를포함하는전자장치및그의제조방법 |
US6184559B1 (en) * | 1996-11-21 | 2001-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Active matrix display device having multiple gate electrode portions |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8324018B2 (en) | 2005-01-28 | 2012-12-04 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, electronic device, and method of manufacturing semiconductor device |
US8487436B2 (en) | 2005-01-28 | 2013-07-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, electronic device, and method of manufacturing semiconductor device |
US8648346B2 (en) | 2005-01-28 | 2014-02-11 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, electronic device, and method of manufacturing semiconductor device |
US9356152B2 (en) | 2005-01-28 | 2016-05-31 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, electronic device, and method of manufacturing semiconductor device |
US10529786B2 (en) | 2016-07-07 | 2020-01-07 | Lg Display Co., Ltd. | Thin-film transistor and organic light-emitting display device including the same |
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