KR100413376B1 - 용융 아연 도금을 위한 플럭스 첨가제 조성물 - Google Patents
용융 아연 도금을 위한 플럭스 첨가제 조성물 Download PDFInfo
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- KR100413376B1 KR100413376B1 KR10-2001-0063367A KR20010063367A KR100413376B1 KR 100413376 B1 KR100413376 B1 KR 100413376B1 KR 20010063367 A KR20010063367 A KR 20010063367A KR 100413376 B1 KR100413376 B1 KR 100413376B1
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- South Korea
- Prior art keywords
- flux
- group
- weight
- additive
- salts
- Prior art date
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- 230000004907 flux Effects 0.000 title claims abstract description 50
- 238000005246 galvanizing Methods 0.000 title claims description 11
- 239000000203 mixture Substances 0.000 title claims description 11
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims abstract description 18
- 239000011592 zinc chloride Substances 0.000 claims abstract description 9
- 235000005074 zinc chloride Nutrition 0.000 claims abstract description 9
- 150000008040 ionic compounds Chemical class 0.000 claims abstract description 8
- 239000003463 adsorbent Substances 0.000 claims abstract description 7
- 239000002280 amphoteric surfactant Substances 0.000 claims abstract description 6
- 239000003093 cationic surfactant Substances 0.000 claims abstract description 6
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 claims abstract description 5
- 229960001763 zinc sulfate Drugs 0.000 claims abstract description 5
- 229910000368 zinc sulfate Inorganic materials 0.000 claims abstract description 5
- 125000002091 cationic group Chemical group 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 30
- 239000000654 additive Substances 0.000 claims description 17
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 16
- 230000000996 additive effect Effects 0.000 claims description 15
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 9
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 8
- 235000019270 ammonium chloride Nutrition 0.000 claims description 8
- 150000003839 salts Chemical class 0.000 claims description 7
- 229920001661 Chitosan Polymers 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims description 6
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000010457 zeolite Substances 0.000 claims description 6
- -1 amine salt Chemical class 0.000 claims description 5
- 239000002270 dispersing agent Substances 0.000 claims description 4
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical class CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 claims description 4
- 239000011780 sodium chloride Substances 0.000 claims description 4
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 claims description 3
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 229960003237 betaine Drugs 0.000 claims description 3
- 239000001110 calcium chloride Substances 0.000 claims description 3
- 229910001628 calcium chloride Inorganic materials 0.000 claims description 3
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical group OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 claims description 3
- 239000012153 distilled water Substances 0.000 claims description 3
- 235000019441 ethanol Nutrition 0.000 claims description 3
- 229940035429 isobutyl alcohol Drugs 0.000 claims description 3
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 claims description 3
- LUPNKHXLFSSUGS-UHFFFAOYSA-M sodium;2,2-dichloroacetate Chemical group [Na+].[O-]C(=O)C(Cl)Cl LUPNKHXLFSSUGS-UHFFFAOYSA-M 0.000 claims description 2
- 239000012190 activator Substances 0.000 claims 1
- 238000007747 plating Methods 0.000 abstract description 29
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract description 11
- 239000011701 zinc Substances 0.000 abstract description 11
- 229910052725 zinc Inorganic materials 0.000 abstract description 11
- 229910000831 Steel Inorganic materials 0.000 abstract description 8
- 239000010959 steel Substances 0.000 abstract description 8
- 239000007789 gas Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 229910021536 Zeolite Inorganic materials 0.000 description 4
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 208000020875 Idiopathic pulmonary arterial hypertension Diseases 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 239000002956 ash Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- ZOXHFYPCZQICQD-UHFFFAOYSA-N 2,2-dichloroacetic acid;sodium Chemical compound [Na].OC(=O)C(Cl)Cl ZOXHFYPCZQICQD-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 235000002918 Fraxinus excelsior Nutrition 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/30—Fluxes or coverings on molten baths
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/002—Pretreatement
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
- C23C2/06—Zinc or cadmium or alloys based thereon
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating With Molten Metal (AREA)
Abstract
Description
조성 | 중량% |
ZnCl2NH4ClLM*NaCl황산아연제올라이트키토산IPAH2O | 212041112050 |
조성 | 중량% |
ZnCl2NH4Cl베타인NaCl제올라이트키토산H2O | 212051170 |
조성 | 중량% |
ZnCl2LMNaCl제올라이트키토산IPAH2O | 20201113027 |
구분 | 플럭스첨가제 첨가량(부피%) | 계면장력(dyne/cm) | 비산현상 | 가스발생량 | 도금상태 |
비교예1 | - | 75 | 100 | 100 | 양호 |
실시예1 | 0.5 | 52 | 60 | 100 | 〃 |
1 | 32 | 40 | 100 | 〃 | |
1.5 | 28 | 30 | 100 | 〃 | |
2 | 26 | 20 | 100 | 〃 | |
실시예2 | 0.5 | 56 | 70 | 100 | 〃 |
1 | 36 | 50 | 100 | 〃 | |
1.5 | 31 | 30 | 100 | 〃 | |
2 | 28 | 30 | 100 | 〃 | |
실시예3 | 0.5 | 56 | 80 | 50 | 〃 |
1 | 36 | 50 | 50 | 〃 | |
1.5 | 31 | 30 | 50 | 〃 | |
2 | 28 | 30 | 50 | 〃 |
Claims (2)
- 용융 아연 도금 공정중에 플럭스공정 첨가제로서알킬기의 탄소수가 8 내지 12개이며, 말단기에 아민염으로된 것으로, 옥틸아민 및 이들의 유도체 염류, 데실아민 및 이들의 유도체 염류, 라우릴암모늄염으로 이루어진 군으로부터 적어도 하나를 선택하여서 된 양이온계면 활성제 또는 알킬기의 탄소수가 8내지 12개인 아민에 모노 또는 디 클로로아세틱 액시드 소듐염으로 치환된 베타인계의 양쪽성 계면 활성제;염화나트륨과 염화칼슘으로 이루어진 군으로부터 적어도 하나를 선택하는 플럭스액의 이온화합물;4급 키토산 아민염과 제올라이트로 이루어진 군으로부터 적어도 하나를 선택하여서 되는 흡착제;염화아연, 황산아연 및 염화암모늄으로 이루어진 군으로부터 적어도 하나를 선택하여서 되는 열팽창 계수 조절용 첨가제;이소프로필알콜, 이소부틸알콜과 에틸알콜로 이루어진 군으로부터 적어도 하나를 선택하여서 된 분산제; 및나머지 1차 증류수로 이루어지는 것을 특징으로 하는 용융 아연 도금을 위한 플럭스 첨가제 조성물.
- 제 1항에 있어서, 상기 양이온 계면활성제는 15 내지 25중량%, 상기 양쪽성계면 활성제는 15 내지 25중량%, 플럭스액의 이온 화합물은 4 내지 6중량%, 흡착제는 0.5 내지 2중량%, 열팽창 계수 조절용 첨가제는 2 내지 20중량%, 분산제는 25 내지 35중량% 그리고 나머지는 1차 증류수인 것을 특징으로 하는 용융 도금을 위한 플럭스 첨가제 조성물.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR10-2001-0063367A KR100413376B1 (ko) | 2001-10-15 | 2001-10-15 | 용융 아연 도금을 위한 플럭스 첨가제 조성물 |
Applications Claiming Priority (1)
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---|---|---|---|
KR10-2001-0063367A KR100413376B1 (ko) | 2001-10-15 | 2001-10-15 | 용융 아연 도금을 위한 플럭스 첨가제 조성물 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030031635A KR20030031635A (ko) | 2003-04-23 |
KR100413376B1 true KR100413376B1 (ko) | 2004-01-03 |
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KR10-2001-0063367A KR100413376B1 (ko) | 2001-10-15 | 2001-10-15 | 용융 아연 도금을 위한 플럭스 첨가제 조성물 |
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KR (1) | KR100413376B1 (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030091468A (ko) * | 2002-05-28 | 2003-12-03 | (주)에이스-켐 | 용융 아연 도금 플럭스 조성물 |
JP7252922B2 (ja) * | 2019-08-19 | 2023-04-05 | Jfeスチール株式会社 | 溶融亜鉛めっき用フラックス液および溶融亜鉛めっき鋼管の製造方法 |
CN113088856B (zh) * | 2021-03-31 | 2022-12-23 | 江西科技师范大学 | 深共熔溶剂类热镀锌添加剂及其制备方法和应用 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3936540A (en) * | 1973-07-12 | 1976-02-03 | Foseco International Limited | Hot dip galvanising |
US4042731A (en) * | 1975-11-06 | 1977-08-16 | E. I. Du Pont De Nemours And Company | Foaming agents for galvanizing fluxes |
JPH04202751A (ja) * | 1990-11-30 | 1992-07-23 | Tanaka Aen Mekki Kk | 乾式フラックス法による溶融金属めっき用フラックス及びこのフラックスを用いた溶融金属めっき鋼材の製造方法 |
JPH07173598A (ja) * | 1993-11-15 | 1995-07-11 | Tanaka Aen Mekki Kk | 鋼材の薄付け溶融亜鉛めっき方法 |
-
2001
- 2001-10-15 KR KR10-2001-0063367A patent/KR100413376B1/ko not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3936540A (en) * | 1973-07-12 | 1976-02-03 | Foseco International Limited | Hot dip galvanising |
US4042731A (en) * | 1975-11-06 | 1977-08-16 | E. I. Du Pont De Nemours And Company | Foaming agents for galvanizing fluxes |
JPH04202751A (ja) * | 1990-11-30 | 1992-07-23 | Tanaka Aen Mekki Kk | 乾式フラックス法による溶融金属めっき用フラックス及びこのフラックスを用いた溶融金属めっき鋼材の製造方法 |
JPH07173598A (ja) * | 1993-11-15 | 1995-07-11 | Tanaka Aen Mekki Kk | 鋼材の薄付け溶融亜鉛めっき方法 |
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Publication number | Publication date |
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KR20030031635A (ko) | 2003-04-23 |
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