KR100345223B1 - 액체재료기화장치 - Google Patents
액체재료기화장치 Download PDFInfo
- Publication number
- KR100345223B1 KR100345223B1 KR1019980003226A KR19980003226A KR100345223B1 KR 100345223 B1 KR100345223 B1 KR 100345223B1 KR 1019980003226 A KR1019980003226 A KR 1019980003226A KR 19980003226 A KR19980003226 A KR 19980003226A KR 100345223 B1 KR100345223 B1 KR 100345223B1
- Authority
- KR
- South Korea
- Prior art keywords
- liquid
- liquid material
- solvent
- plunger
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011344 liquid material Substances 0.000 title claims abstract description 179
- 230000008016 vaporization Effects 0.000 title claims abstract description 105
- 239000007788 liquid Substances 0.000 claims abstract description 105
- 239000002904 solvent Substances 0.000 claims abstract description 92
- 238000009834 vaporization Methods 0.000 claims abstract description 83
- 239000000463 material Substances 0.000 claims abstract description 40
- 238000002156 mixing Methods 0.000 claims abstract description 30
- 239000006200 vaporizer Substances 0.000 claims description 47
- 238000004140 cleaning Methods 0.000 claims description 21
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 12
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 12
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 5
- 239000004917 carbon fiber Substances 0.000 claims description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 33
- 239000010408 film Substances 0.000 description 32
- 238000010438 heat treatment Methods 0.000 description 29
- 239000012159 carrier gas Substances 0.000 description 27
- 239000007789 gas Substances 0.000 description 26
- 230000015572 biosynthetic process Effects 0.000 description 14
- 238000010586 diagram Methods 0.000 description 11
- 238000010926 purge Methods 0.000 description 11
- 239000003566 sealing material Substances 0.000 description 10
- 238000012546 transfer Methods 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 9
- 238000001816 cooling Methods 0.000 description 9
- 239000000498 cooling water Substances 0.000 description 9
- 230000004048 modification Effects 0.000 description 8
- 238000012986 modification Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000006835 compression Effects 0.000 description 6
- 238000007906 compression Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 5
- 230000035553 feeding performance Effects 0.000 description 5
- 230000001965 increasing effect Effects 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 238000010790 dilution Methods 0.000 description 4
- 239000012895 dilution Substances 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 238000005192 partition Methods 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000012265 solid product Substances 0.000 description 4
- 238000000889 atomisation Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 239000002826 coolant Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000012855 volatile organic compound Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (14)
- 복수의 액체재료를 혼합할 때에 이용되는 것으로, 각각의 액체재료를 수용하는 복수의 재료용기와, 상기 각 액체재료에 사용되고 있는 용제와 동일 또는 동종의 용제를 충전한 용제전용용기와, 각 재료용기 및 용제전용용기로부터 액체재료 및 용제를 송액하는 송액수단과, 해당 송액수단에 의해 송액된 액체재료 및 용제를 무화한 후 기화하는 기화수단을 구비한 액체재료 기화장치.
- 제 1 항에 있어서, 송액수단을 각 재료용기 및 용제전용용기마다 설비하고, 각각의 송액수단을 제어해 액체재료 및 용제의 혼합비를 조절하는 것을 특징으로 하는 액체재료 기화장치.
- 제 1 항에 있어서, 각 재료용기 및 용제전용용기로부터 액체재료 및 용제를 단일의 송액수단으로 송액하는 것을 특징으로 하는 액체재료 기화장치.
- 제 1 항 내지 제 3 항중 어느 한 항에 있어서, 기화수단이 초음파 무화기 및 기화기로 구성되는 것을 특징으로 하는 액체재료 기화장치.
- 제 1 항 내지 제 3 항중 어느 한 항에 있어서, 각 재료용기 및 용제전용용기를 송액수단보다 아래쪽으로 배치해 구성되는 것을 특징으로 하는 액체재료 기화장치.
- 제 4 항에 있어서, 각 재료용기 및 용제전용용기를 송액수단보다 아래쪽으로 배치해 구성되는 것을 특징으로 하는 액체재료 기화장치.
- 제 1 항 내지 제 3 항 중 어느 한 항에 있어서, 송액수단이 플런저피스톤으로 구성되고, 플런저의 접동부에 세정용 용제를 흘려 보내는 유로를 설치해 구성되는 것을 특징으로 하는 액체재료 기화장치.
- 제 4 항에 있어서, 송액수단이 플런저피스톤으로 구성되고, 플런저의 접동부에 세정용 용제를 흘려 보내는 유로를 설치해 구성되는 것을 특징으로 하는 액체재료 기화장치.
- 제 5 항에 있어서, 송액수단이 플런저피스톤으로 구성되고, 플런저의 접동부에 세정용 용제를 흘려 보내는 유로를 설치해 구성되는 것을 특징으로 하는 액체재료 기화장치.
- 제 6 항에 있어서, 송액수단이 플런저피스톤으로 구성되고, 플런저의 접동부에 세정용 용제를 흘려 보내는 유로를 설치해 구성되는 것을 특징으로 하는 액체재료 기화장치.
- 제 7 항에 있어서, 플런지의 시일이 카본파이버가 들어간 PTFE인 것을 특징으로 하는 액체재료 기화장치.
- 제 8 항에 있어서, 플런지의 시일이 카본파이버가 들어간 PTFE인 것을 특징으로 하는 액체재료 기화장치.
- 제 9 항에 있어서, 플런지의 시일이 카본파이버가 들어간 PTFE인 것을 특징으로 하는 액체재료 기화장치.
- 제 10 항에 있어서, 플런지의 시일이 카본파이버가 들어간 PTFE인 것을 특징으로 하는 액체재료 기화장치.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP09029447A JP3106991B2 (ja) | 1997-02-13 | 1997-02-13 | 液体材料気化装置 |
JP97-29446 | 1997-02-13 | ||
JP97-29447 | 1997-02-13 | ||
JP09029446A JP3106990B2 (ja) | 1997-02-13 | 1997-02-13 | 液体材料気化装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19980071100A KR19980071100A (ko) | 1998-10-26 |
KR100345223B1 true KR100345223B1 (ko) | 2002-09-18 |
Family
ID=65893481
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019980003226A Expired - Fee Related KR100345223B1 (ko) | 1997-02-13 | 1998-02-05 | 액체재료기화장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100345223B1 (ko) |
-
1998
- 1998-02-05 KR KR1019980003226A patent/KR100345223B1/ko not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR19980071100A (ko) | 1998-10-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6074487A (en) | Unit for vaporizing liquid materials | |
US6155540A (en) | Apparatus for vaporizing and supplying a material | |
CN1139672C (zh) | 液体输送系统 | |
WO2006075709A1 (ja) | 気化装置及び処理装置 | |
US20110197816A1 (en) | Method for vaporizing liquid material capable of vaporizing liquid material at low temperature and vaporizer using the same | |
US20070194470A1 (en) | Direct liquid injector device | |
KR960701235A (ko) | 화학적 증착(cvd) 반응기에 반응제를 증기 형태로 공급하는 방법 및 장치(apparatus and method for delivering reagents in vapor form to a cvd reactor) | |
JP2001131754A (ja) | バブラー | |
TW201002429A (en) | Organic vapor jet printing system | |
CN101586235B (zh) | 用于供应源的设备和具有所述设备的用于沉积薄膜的设备 | |
JP2012219377A (ja) | 大容量薄膜形成用蒸着装置 | |
JP4021721B2 (ja) | 液体供給構造 | |
KR100345223B1 (ko) | 액체재료기화장치 | |
CN111996501B (zh) | 原料气化装置和镀膜设备及其气化方法 | |
CN210458362U (zh) | 用于化学气相沉积反应的供气系统 | |
CN220143060U (zh) | 微液滴生成装置及应用设备 | |
KR20130024295A (ko) | 원료 공급 장치 및 이를 구비하는 박막 증착 장치 | |
CN116585918A (zh) | 微液滴生成方法、微液滴生成装置及应用设备 | |
CN115928046A (zh) | 前体输送系统及其方法 | |
KR101214451B1 (ko) | 유기 박막 증착 장치 | |
US6572707B1 (en) | Vaporizer for sensitive precursors | |
WO2021054216A1 (ja) | 原料ガス供給システム及び原料ガス供給方法 | |
KR101773038B1 (ko) | 기화기를 갖는 증착장치 및 증착방법 | |
KR19980071597A (ko) | 액체 이송 장치 | |
US6257286B1 (en) | Spray valve for food product and dispensing apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19980205 |
|
PG1501 | Laying open of application | ||
A201 | Request for examination | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20000502 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 19980205 Comment text: Patent Application |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20020128 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20020524 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20020706 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20020708 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
LAPS | Lapse due to unpaid annual fee | ||
PC1903 | Unpaid annual fee |