KR0180227B1 - Positive photoresist composition - Google Patents

Positive photoresist composition Download PDF

Info

Publication number
KR0180227B1
KR0180227B1 KR1019900021045A KR900021045A KR0180227B1 KR 0180227 B1 KR0180227 B1 KR 0180227B1 KR 1019900021045 A KR1019900021045 A KR 1019900021045A KR 900021045 A KR900021045 A KR 900021045A KR 0180227 B1 KR0180227 B1 KR 0180227B1
Authority
KR
South Korea
Prior art keywords
photoresist composition
positive photoresist
positive
composition
photoresist
Prior art date
Application number
KR1019900021045A
Other languages
English (en)
Other versions
KR910012817A (ko
Inventor
Sangya Jain
Subhankar Chatterjee
John Dicarlo
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of KR910012817A publication Critical patent/KR910012817A/ko
Application granted granted Critical
Publication of KR0180227B1 publication Critical patent/KR0180227B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR1019900021045A 1989-12-20 1990-12-19 Positive photoresist composition KR0180227B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US45332489A 1989-12-20 1989-12-20
US453,324 1989-12-20

Publications (2)

Publication Number Publication Date
KR910012817A KR910012817A (ko) 1991-08-08
KR0180227B1 true KR0180227B1 (en) 1999-04-01

Family

ID=23800107

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900021045A KR0180227B1 (en) 1989-12-20 1990-12-19 Positive photoresist composition

Country Status (4)

Country Link
EP (1) EP0434442A3 (ko)
JP (1) JP3066068B2 (ko)
KR (1) KR0180227B1 (ko)
CA (1) CA2029464A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05239166A (ja) * 1991-08-22 1993-09-17 Hoechst Celanese Corp 高いガラス転位点と高い光感度を有するフォトレジスト用ノボラック樹脂組成物
JP4006815B2 (ja) 1997-06-11 2007-11-14 Ｊｓｒ株式会社 感放射線性樹脂組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61185741A (ja) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
EP0239423B1 (en) * 1986-03-28 1996-03-20 Japan Synthetic Rubber Co., Ltd. Positive type radiation-sensitive resin composition
JP2787943B2 (ja) * 1987-12-29 1998-08-20 三菱化学株式会社 ポジ型フォトレジスト組成物

Also Published As

Publication number Publication date
CA2029464A1 (en) 1991-06-21
JP3066068B2 (ja) 2000-07-17
KR910012817A (ko) 1991-08-08
EP0434442A2 (en) 1991-06-26
EP0434442A3 (en) 1992-02-19
JPH03230163A (ja) 1991-10-14

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
N231 Notification of change of applicant
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
LAPS Lapse due to unpaid annual fee