KR0171103B1 - Filter of semiconductor fabricating machine - Google Patents
Filter of semiconductor fabricating machine Download PDFInfo
- Publication number
- KR0171103B1 KR0171103B1 KR1019950054390A KR19950054390A KR0171103B1 KR 0171103 B1 KR0171103 B1 KR 0171103B1 KR 1019950054390 A KR1019950054390 A KR 1019950054390A KR 19950054390 A KR19950054390 A KR 19950054390A KR 0171103 B1 KR0171103 B1 KR 0171103B1
- Authority
- KR
- South Korea
- Prior art keywords
- chemical liquid
- filter
- pipe
- pressure
- filter housing
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 19
- 239000007788 liquid Substances 0.000 claims abstract description 46
- 239000000126 substance Substances 0.000 claims abstract description 46
- 238000001914 filtration Methods 0.000 claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 claims abstract description 18
- 238000011109 contamination Methods 0.000 claims abstract description 9
- 239000007789 gas Substances 0.000 claims description 14
- 238000000746 purification Methods 0.000 claims description 8
- 238000010926 purge Methods 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 2
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 2
- 239000000356 contaminant Substances 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
- B01D35/02—Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/40—Filters located upstream of the spraying outlets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
본 발명은 약액이 통과되어 여과되는 필터가 내부에 형성된 필터하우징과, 일측에 약액이 공급되는 공급관이 형성된 펌프와, 펌프와 필터하우징 사이에 연결되어, 공급관을 통해 공급된 약액이 유입되는 유입관과, 필터하우징에 연결되어, 필터하우징 내에서 여과된 약액의 흡입을 조절하는 흡입밸브가 형성된 유출관과, 유출관의 일단에 형성되어, 약액을 분사하는 노즐을 갖는 반도체 제조장비의 여과장치에 있어서, 유입관과 유출관에 각각의 압력을 제어하는 압력제어부가 형성되어, 필터의 오염됨을 인지할 수 있는 것을 특징으로 하는 반도체 제조장비의 여과장치에 관한 것이다.The present invention is a filter housing formed inside the filter is filtered through the chemical liquid, the pump is provided with a supply pipe for supplying the chemical liquid on one side, the inlet pipe is connected between the pump and the filter housing, the chemical liquid supplied through the supply pipe is introduced And an outlet pipe having a suction valve connected to the filter housing and configured to regulate suction of the chemical liquid filtered in the filter housing, and formed at one end of the discharge tube, and having a nozzle for injecting the chemical liquid. The present invention relates to a filtration apparatus of a semiconductor manufacturing equipment, characterized in that a pressure control unit for controlling respective pressures is formed in an inlet pipe and an outlet pipe so that contamination of the filter can be recognized.
Description
제1도는 종래의 반도체 제조장비의 여과장치를 설명하기 위한 도면이고,1 is a view for explaining a filtration device of a conventional semiconductor manufacturing equipment,
제2도는 본 발명의 반도체 제조장비의 여과장치를 설명하기 위한 도면이다.2 is a view for explaining the filtering device of the semiconductor manufacturing equipment of the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
10,20 : 필터 11,21 : 필터하우징10,20: filter 11,21: filter housing
12,22 : 공급관 13,23 : 유입관12,22 supply pipe 13,23 inlet pipe
14,24 : 펌프 15,25 : 유출관14,24 pump 15,25 outlet pipe
16,26 : 흡입밸브 17,27 : 노즐16,26: suction valve 17,27: nozzle
28 : 정화가스공급관 29 : 레귤레이터28: purification gas supply pipe 29: regulator
A : 압력제어부A: Pressure control part
본 발명은 반도체 제조장비의 여과장치에 관한 것으로, 특히 필터(FILTER)이 오염으로 인하여 약액의 오염을 방지하기에 적당하도록 한 반도체 제조장비의 여과장치에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a filtration apparatus for semiconductor manufacturing equipment, and more particularly, to a filtration apparatus for semiconductor manufacturing equipment in which a filter is suitable for preventing contamination of chemical liquids due to contamination.
제1도는 종래의 반도체 제조장비의 여과장치를 설명하기 위한 도면으로, 이하 첨부된 도면을 참고로 하여 설명하면 다음과 같다.1 is a view for explaining a filtration device of a conventional semiconductor manufacturing equipment, will be described below with reference to the accompanying drawings.
종래의 반도체 제조장비의 여과장치는 제1도와 같이, 약액이 통과되어 여과되는 필터(FILTE)(10)가 내부에 형성된 필터하우징(FILTER HOUSING)(11)과, 일측에 약액이 공급되는 공급관(12)이 형성된 펌프(PUMP)(14)와, 펌프(14)와 필터하우징(11) 사이에 연결되어, 공급관(12)을 통해 공급된 약액이 유입되는 유입관(13)과, 필터하우징(11)에 연결되어, 필터하우징(11) 내에서 여과된 약액의 흡입을 조절하는 흡입밸브(SUCK BACK VALVE)(16)가 형성된 유출관(15)과, 유출관(15)의 일단에 형성되어, 약액을 분사하는 노즐(NOZZLE)(17)로 이루어진다.The filtration apparatus of the conventional semiconductor manufacturing equipment is a filter housing (11) formed inside the filter (FILTE) (10) through which the chemical liquid is filtered by passing through the supply pipe (1) 12, a pump (PUMP) 14 is formed, is connected between the pump 14 and the filter housing 11, the inlet pipe 13 through which the chemical liquid supplied through the supply pipe 12, and the filter housing ( 11 is connected to the outlet pipe 15 having a suction back valve 16 for regulating the suction of the chemical liquid filtered in the filter housing 11, and is formed at one end of the outlet pipe 15. It consists of a nozzle (NOZZLE) 17 for injecting the chemical liquid.
종래의 반도체 제조장비의 여과장치에서는 공급관(12)을 통하여 약액이 공급되며, 약액은 펌핑동작으로 유입관(13)을 통하여 필터하우징(11) 내의 필터(10)에 여과된다. 그리고 불순물을 여과시키고 남은 순수한 약액만이 유출관(15)을 통하여 노즐(17)로 웨이퍼(WAFER)상에 분사된다.In the filtering apparatus of the conventional semiconductor manufacturing equipment, the chemical liquid is supplied through the supply pipe 12, and the chemical liquid is filtered by the filter 10 in the filter housing 11 through the inlet pipe 13 in a pumping operation. Then, only the pure chemical liquid left after filtering the impurities is injected onto the wafer WAFER through the outlet pipe 15 to the nozzle 17.
이때, 유출관(15)에 흡입밸브(16)를 형성하여 유출관(15) 내의 약액을 노즐(17)로 분사하는 것을 돕도록 한다.At this time, the inlet valve (16) is formed in the outlet pipe (15) to help inject the chemical liquid in the outlet pipe (15) to the nozzle (17).
그러나 종래의 반도체 제조장비의 여과장치에서는 약액의 오염 또는 불순물로 인하여 필터가 오염되어도 이를 사전에 제어할 수 없으며, 이로 인하여 필터의 교체시기를 설정하기가 어렵고, 오염된 약액으로 인하여 웨이퍼 상에 코팅불량 등의 손상을 가져오는 문제점이 발생된다.However, in the filtration apparatus of the conventional semiconductor manufacturing equipment, even if the filter is contaminated due to the contamination or impurities of the chemical liquid, it cannot be controlled in advance, which makes it difficult to set the replacement time of the filter and is coated on the wafer due to the contaminated chemical liquid. Problems that cause damage such as defects are generated.
본 발명은 이러한 문제점을 해결하고자 안출된 것으로써, 필터의 오염 및 교체시기를 사전에 감지할 수 있는 반도체 제조장비의 여과장치를 목적으로 한다.The present invention has been made to solve this problem, it is an object of the filtration apparatus of the semiconductor manufacturing equipment that can detect the contamination and replacement time of the filter in advance.
본 발명은 약액이 통과되어 여과되는 필터가 내부에 형성된 필터하우징과, 일측에 약액이 공급되는 공급관이 형성된 펌프와, 펌프와 필터하우징 사이에 연결되어, 약액이 유입되는 유입관과, 필터하우징에 연결되어, 필터하우징 내에서 여과된 약액의 흡입을 조절하는 흡입밸브가 형성된 유출관과, 유출관의 일단에 형성되어, 약액을 분사하는 노즐을 갖는 반도체 제조장비의 여과장치에 있어서,The present invention is a filter housing formed inside the filter is filtered through the chemical liquid, the pump is provided with a supply pipe for supplying the chemical liquid on one side, connected between the pump and the filter housing, the inlet pipe through which the chemical liquid is introduced, the filter housing In the filtration apparatus of the semiconductor manufacturing equipment connected to, having an inlet pipe formed with a suction valve for controlling the suction of the chemical liquid filtered in the filter housing, and a nozzle formed at one end of the outlet tube, injecting the chemical liquid,
유입관과 유출관에 각각의 압력을 제어하는 압력제어부가 형성되어, 압력차에 의해 필터의 오염됨을 인지할 수 있는 것을 특징으로 하는 반도체 제조장비의 여과장치에 관한 것이다.It relates to a filtration device of the semiconductor manufacturing equipment, characterized in that the pressure control unit for controlling the respective pressure in the inlet pipe and the outlet pipe can be recognized that the filter is contaminated by the pressure difference.
제2도는 반도체 제조장비의 여과장치를 설명하기 위한 도면으로, 이하 첨부된 도면을 참고로 하여 설명하면 다음과 같다.2 is a view for explaining a filtration device of a semiconductor manufacturing equipment, will be described below with reference to the accompanying drawings.
본 발명의 반도체 제조장비의 여과장치는 제2도와 같이, 약액이 통과되어 여과되는 필터(20)가 내부에 형성된 필터하우징(21)과, 일측에 약액이 공급되는 공급관(22)이 형성된 펌프(24)와, 펌프(24)와 필터하우징(21) 사이에 연결되어, 공급관(22)을 통해 공급된 약액이 유입되는 유입관(23)과, 필터하우징(21)에 연결되어, 필터하우징(21) 내에서 여과된 약액의 흡입을 조절하는 흡입밸브(26)가 형성된 유출관(25)과, 유출관(25)의 일단에 형성되어, 약액을 분사하는 노즐(27)과, 유입관과 유출관 사이의 압력을 제어하는 압력제어부(A)로 이루어지며, 이때 압력제어부(A)는 유입관(23) 내의 압력을 측정하여 전기적인 신호로써 출력하는 제1압력게이지(P1)와, 유출관(25)내의 압력을 측정하여 전기적인 신호로써 출력하는 제2압력게이지(P2)와, 제1압력게이지(P1)와 제2압력게이지(P2)에서 각각 출력된 전기적인 신호가 입력되어 비교되는 비교기와, 비교기에서 출력된 신호가 입력되어, 신호에 따라 경고음을 발생시키는 콘트롤러(CONTROLLER)를 갖는다.In the filtration apparatus of the semiconductor manufacturing equipment of the present invention, as shown in FIG. 2, a pump having a filter housing 21 formed therein with a filter 20 through which the chemical liquid is filtered and a supply pipe 22 to which the chemical liquid is supplied is formed ( 24 is connected between the pump 24 and the filter housing 21, the inflow pipe 23 through which the chemical liquid supplied through the supply pipe 22 is introduced, and the filter housing 21, and the filter housing ( 21) an outlet tube 25 having a suction valve 26 for adjusting suction of the chemical liquid filtered in the inside, a nozzle 27 formed at one end of the outlet tube 25 to inject the chemical liquid, an inlet tube and It consists of a pressure control unit (A) for controlling the pressure between the outlet pipe, wherein the pressure control unit (A) is the first pressure gauge (P 1 ) for measuring the pressure in the inlet pipe 23 and output as an electrical signal, the outlet pipe a second pressure gauge for outputting as an electric signal by measuring the pressure in the (25) (P 2), a first pressure gauge (P 1) and the second pressure Gauge (P 2), each of the electrical signal is input to output compared with the comparator, a signal output from the comparator is input from, and has a controller (CONTROLLER) for generating a warning sound in accordance with the signal.
본 발명의 반도체 제조장비의 여과장치에서는 공급관(22)을 통하여 약액이 공급되며, 약액은 펌프(24)와 유입관(23)을 통하여 필터하우징(21) 내의 필터(20)에 여과된다.In the filtration apparatus of the semiconductor manufacturing equipment of the present invention, the chemical liquid is supplied through the supply pipe 22, and the chemical liquid is filtered by the filter 20 in the filter housing 21 through the pump 24 and the inlet pipe 23.
그리고 펌프(24)에 부가적으로 연결되어, 레귤레이터가 설치된 정화가스공급관(28)에서 공급되는 정화가스는 유입관(23)내의 압력이 일정하게 유지하도록 약액을 밀어주며, 이때 레귤레이터는 정화가스공급관(28)내의 정화가스 압력을 조절한다.And additionally connected to the pump 24, the purification gas supplied from the purification gas supply pipe 28, the regulator is installed to push the chemical liquid to maintain a constant pressure in the inlet pipe 23, the regulator is a purification gas supply pipe Adjust the purge gas pressure in (28).
이때, 정화가스공급관(28)으로 공급되는 정화가스로는 질소가스(N2)를 사용한다.At this time, nitrogen gas (N 2 ) is used as the purification gas supplied to the purification gas supply pipe (28).
그리고 약액은 필터하우징(21) 내에 형성된 필터(20)에 여과되고, 불순물을 여과시키고 남은 순수한 약액만이 유출관(25)을 통하여 노즐(17)로 웨이퍼 상에 분사된다.Then, the chemical liquid is filtered through the filter 20 formed in the filter housing 21, and only the pure chemical liquid remaining after filtering the impurities is injected onto the wafer through the outlet pipe 25 to the nozzle 17.
이때, 유출관(25)에 흡입밸브(26)를 형성함으로서, 유출관(25) 내의 약액이 노즐(27)로 분사하는 것을 돕도록 한다.At this time, by forming the suction valve 26 in the outflow pipe 25, the chemical liquid in the outflow pipe 25 to help the injection to the nozzle 27.
공정진행 시 일정하게 유지되는 유입관(23)과 유출관(25) 내의 압력은, 약액이 오염물 함유등의 원인으로 필터(24)가 오염될 경우, 차이가 발생하게 된다.The pressure in the inflow pipe 23 and the outflow pipe 25 maintained constant during the process progresses, when the filter 24 is contaminated due to the contamination of the chemical liquid, a difference occurs.
즉, 오염물이 함유된 약액이 유입관(23)을 통하여 필터(20)에 여과되면 오염물은 필터(20) 상에 남고 여과된 약액만이 유출관(25)으로 유출된다. 따라서 오염물이 함유된 약액이 흐르는 유입관(23) 내의 압력변화로 인해, 정상시 보다는 유입관(23) 내의 약액이 흐름이 늦어지고, 이로 인하여 유입관(23)과 유출관(25) 내의 압력값에 차이가 생긴다.That is, when the chemical liquid containing contaminants is filtered through the inlet pipe 23 through the filter 20, the contaminants remain on the filter 20 and only the filtered chemical liquid flows out into the outlet pipe 25. Therefore, due to the pressure change in the inflow pipe 23 through which the chemical liquid containing the contaminants flows, the chemical liquid in the inflow pipe 23 is slower than normal, and thus the pressure in the inflow pipe 23 and the outflow pipe 25 is reduced. There is a difference in value.
이러한 원리를 이용하여 본 발명에서는 이러한 유입관(23)과 유출관(25)의 압력을 제어하기 위하여 압력제어부(A)를 두며, 유입관(23)에 형성된 제1압력게이지(P1)와 유출관(25)에 형성된 제2압력게이지(P2)는 각각의 입력을 측정하여 전기적인 신호로써 출력하고, 이러한 전기적인 신호는 비교기에 입력된다.In the present invention using this principle, the pressure control unit (A) is provided to control the pressure of the inlet pipe (23) and the outlet pipe (25), and the first pressure gauge (P 1 ) formed in the inlet pipe (23) and The second pressure gauge P 2 formed in the outlet pipe 25 measures each input and outputs it as an electrical signal, which is input to the comparator.
그리고 비교기에서는 각각의 신호를 비교하여 콘트롤러에 신호를 보내는데, 이때 유입관(23)과 유출관(25) 내의 압력차가 기준치 이상되면 경고음을 발생하는 신호를 출력한다.The comparator compares each signal and sends a signal to the controller. At this time, when the pressure difference between the inlet pipe 23 and the outlet pipe 25 is greater than the reference value, a signal for generating a warning sound is output.
콘트롤러는 신호에 따라 경고음을 발생하여 필터(20)가 오염됨을 알린다.The controller generates a beep according to the signal to indicate that the filter 20 is contaminated.
종래의 반도체 제조장비의 여과장치에서는 어떤 오염원으로 인하여 필터가 오염되어, 오염된 약액이 노즐을 통과하여 웨이퍼 상에 분사된다 하더라도 이를 감지할 만한 별도의 장치가 없었다.In the filtering apparatus of the conventional semiconductor manufacturing equipment, the filter is contaminated by a certain pollution source, even if the contaminated chemical liquid is sprayed on the wafer through the nozzle, there is no separate device for detecting this.
따라서, 필터오염 등으로 약액에 오염물이 함유된 경우 각각의 유입관과 유출관 내의 압력에 차이가 생긴다는 점을 이용하여 본 발명의 반도체 제조장비의 여과장치에서는 유입관에는 제1압력게이지를, 유출관에는 제2압력게이지를 형성하여 각각의 압력값을 비교하여, 기준치 이상의 차이가 발생하면 콘트롤러는 경고음을 발생하여 필터가 오염됨을 알려 필터를 교체하도록 한다.Therefore, when a contaminant is contained in the chemical liquid due to filter contamination, etc., a difference occurs in the pressure in each inlet and outlet pipes. A second pressure gauge is formed in the outlet pipe to compare the respective pressure values, and when a difference exceeding the reference value occurs, the controller generates a warning sound and notifies the filter that the filter is to be replaced.
그러므로 본 발명의 반도체 제조장비의 여과장치를 통하여 필터의 오염과 그 교체시기를 알 수 있고, 또한 필터의 교체시기가 평상시 보다 단축되었을 시, 이를 통하여 약액 또는 필터나 그 밖의 장비등에 문제가 있음을 조기에 인지할 수 있어, 장비의 수명을 연장할 수 있다.Therefore, it is possible to know the contamination of the filter and the replacement time through the filtration device of the semiconductor manufacturing equipment of the present invention, and when the replacement time of the filter is shorter than usual, there is a problem with the chemical liquid or the filter or other equipment. It can be recognized early, extending the life of the equipment.
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950054390A KR0171103B1 (en) | 1995-12-22 | 1995-12-22 | Filter of semiconductor fabricating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950054390A KR0171103B1 (en) | 1995-12-22 | 1995-12-22 | Filter of semiconductor fabricating machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR970052659A KR970052659A (en) | 1997-07-29 |
| KR0171103B1 true KR0171103B1 (en) | 1999-03-30 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950054390A KR0171103B1 (en) | 1995-12-22 | 1995-12-22 | Filter of semiconductor fabricating machine |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR0171103B1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100462867B1 (en) * | 2001-05-18 | 2004-12-17 | 삼성전자주식회사 | Chemicals feeder and its mixer for semiconductor processing |
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1995
- 1995-12-22 KR KR1019950054390A patent/KR0171103B1/en not_active IP Right Cessation
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| Publication number | Publication date |
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| KR970052659A (en) | 1997-07-29 |
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