KR0142791B1 - Reticle structure - Google Patents
Reticle structureInfo
- Publication number
- KR0142791B1 KR0142791B1 KR1019940009724A KR19940009724A KR0142791B1 KR 0142791 B1 KR0142791 B1 KR 0142791B1 KR 1019940009724 A KR1019940009724 A KR 1019940009724A KR 19940009724 A KR19940009724 A KR 19940009724A KR 0142791 B1 KR0142791 B1 KR 0142791B1
- Authority
- KR
- South Korea
- Prior art keywords
- quartz substrate
- reticle structure
- quartz
- reticle
- present
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Abstract
본 발명은 레티클구조에 관한 것으로, 취급이 용이하고 외부요인에 의해 오염되는 일이 없는 레티클구조에 관한 것이다.The present invention relates to a reticle structure, which relates to a reticle structure that is easy to handle and is not contaminated by external factors.
본 발명은 석영기판과, 상기 석영기판상에 형성된 크롬패턴층, 및 상기 석영기판 상부에 상기 석영기판과 동일한 크기를 가지며 상기 석영기판의 외곽에 장착된 접착패드에 의해 상기 석영기판과 일정간격을 두고 부착된 상부 석영판을 구비하여 구성된 레티클구조를 제공한다.The present invention has a predetermined distance from the quartz substrate by a quartz substrate, a chromium pattern layer formed on the quartz substrate, and an adhesive pad mounted on the outside of the quartz substrate, having the same size as the quartz substrate on the quartz substrate. Provided is a reticle structure having an upper quartz plate attached thereto.
Description
제1도는 종래의 레티클 구조 및 제조방법을 도시한 단면도1 is a cross-sectional view showing a conventional reticle structure and manufacturing method
제2도는 종래의 레티클구조의 평면도2 is a plan view of a conventional reticle structure
제3도는 본 발명의 레티클 구조 및 제조방법을 도시한 단면도3 is a cross-sectional view showing the reticle structure and manufacturing method of the present invention
제4도는 본 발명의 레티클 구조의 평면도4 is a plan view of the reticle structure of the present invention.
*도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
11:석영기판 12:크롬층11: Quartz substrate 12: Chrome layer
13:포토레지스트 14:접착패드13: Photoresist 14: Adhesive Pad
15:상부 석영판15: upper quartz plate
본 발명은 레티클(Reticle)구조에 관한 것으로, 특히 취급이 용이하고 외부여인에 의한 오염에 강한 포토리소그래피(Photolithography)용 레티클구조에 관한 것이다.The present invention relates to a reticle structure, and more particularly, to a reticle structure for photolithography that is easy to handle and resistant to contamination by an external woman.
종래 포토리소그래피용 레티클은 제1도(a)에 도시된 바와 같이 석영기판(Quartz)(1)상에 크롬(2)과 포토레스트(3)가 도포된 레티클 원판을 전자빔(E-beam)장비를 이용하여 특정패턴을 만들고 제1도(b)와 같이 상기 포토레지스트를 제거한 다음 만들어진 크롬(2)이 외부입자등에 의해 오염되지 않도록 높은 광투과성을 갖는 박막(4)이 붙여진 펠리클(Pellicle)(5)을 부착함으로써 형성된다. 제2도는 이와 같이 형성된 종래의 레티클구조의 평면도이다.Conventional reticle for photolithography is equipped with an electron beam (E-beam) device using a reticle disc coated with chromium (2) and photorest (3) on a quartz substrate (Quartz) 1, as shown in FIG. A pellicle attached with a thin film 4 having a high light transmittance so that the chromium 2 produced after removing the photoresist as shown in FIG. 1 (b) is not contaminated by external particles, etc. It is formed by attaching 5). 2 is a plan view of a conventional reticle structure formed as described above.
상기와 같이 형성되는 레티클에 있어서는 크롬면에 부착된 오염방지를 위한 펠리클이 충격에 민감하여 쉽게 찢어지고 이 찢어진 박막이 크롬면에 붙게 되면 쉽게 제거되지 않아 박막이 파손될시에는 레티클의 재사용이 불가능하게 되며, 마스크상에 펠리클을 씌워야 하므로 펠리클이 씌워진 곳과 씌워지지 않은 곳의 경계면이 생겨 크기가 크고 연속적인 패턴구성이 불가능하게 되어 패턴구성시의 제약이 따르는 문제가 있다.In the reticle formed as described above, the pellicle for preventing contamination attached to the chromium surface is easily torn by being sensitive to impact, and when the torn thin film adheres to the chromium surface, the reticle cannot be reused when the thin film is damaged. Since the pellicle must be covered on the mask, a boundary surface between the pellicle and the pellicle is formed, thereby making it impossible to form a large and continuous pattern, which leads to a problem in forming a pattern.
또한 펠리클을 씌우기 위해 필요한 패턴을 마스크상에 만들어야 하며 이를 이용해 정화하게 펠리클을 씌워야 하므로 작업이 어려운 문제점도 따른다.In addition, the pattern needed to cover the pellicle must be made on the mask, and the pellicle must be covered to purify using the pellicle.
본 발명은 상술한 문제를 해결하기 위한 것으로, 취급이 용이하고 외부요인에 의해 오염되는 일이 없는 레티클구조를 제공하는 데 그 목적이 있다.SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object thereof is to provide a reticle structure which is easy to handle and which is not contaminated by external factors.
상기 목적을 달성하기 위한 본 발명의 레티클구조는 석영기판과, 상기 석영기판상에 형성된 크롬패턴층, 및 상기 석영기판 상부에 상기 석영기판과 동일한 크기를 가지며 상기 석영기판의 외곽에 장착된 접착패드에 의해 상기 석영기판과 일정간격을 두고 부착된 상부 석영판을 구비하여 구성된다.The reticle structure of the present invention for achieving the above object is a quartz substrate, a chromium pattern layer formed on the quartz substrate, and an adhesive pad mounted on the outside of the quartz substrate having the same size as the quartz substrate on the quartz substrate; And an upper quartz plate attached to the quartz substrate at a predetermined interval.
이하, 첨부된 도면을 참조하여 본 발며을 상세히 설명한다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.
제3도는 본 발명에 의한 레티클구조의 단면도 및 이의 제조방법을 나타내었다. 본 발명의 레티클구조는 제3도(a)와 같이 석영기판(11)상에 크롬층(12)을 형성하고 이위에 포토레지스트(13)를 도포한 후, 전자빔리소그래피에 의해 상기 크롬층(12)을 패터닝하여 소정의 패턴을 형성한 다음, 제3도(b)와 같이 상기 포토레지스트를 제거하고 상기 형성된 크롬층(12)을 보호하기 위해 크롬이 없는 고 투과성의 상부 석영판(15)을 상기 석영기판(11)과 4-5mm의 간격을 두고 부착함으로써 형성한다. 이때, 석영기판(11)과 상부 석영판(15)사이의 간격을 유지하기 위해 두께 4-5mm의 접착패드(14)를 레티클 외곽에 장착한다. 이와 같이 형성된 본 발명의 레티클구조를 제4도에 평면도로 나타내었다.3 shows a cross-sectional view of the reticle structure according to the present invention and a manufacturing method thereof. In the reticle structure of the present invention, as shown in FIG. 3 (a), the chromium layer 12 is formed on the quartz substrate 11 and the photoresist 13 is applied thereon, followed by electron beam lithography. ) To form a predetermined pattern, and then to remove the photoresist and protect the formed chromium layer 12 as shown in FIG. It is formed by attaching the quartz substrate 11 at intervals of 4-5 mm. At this time, in order to maintain the gap between the quartz substrate 11 and the upper quartz plate 15, an adhesive pad 14 having a thickness of 4-5 mm is mounted outside the reticle. The reticle structure of the present invention thus formed is shown in plan view in FIG.
상기와 같이 본 발명은 크롬패턴이 석영기판과 상부 석영판 사이에 있으므로 외부 입자에 의한 오염의 염려가 없고 펠리클을 사용하지 않으므로 취급 및 보관이 용이하며, 석영표면의 오염시 세척이 용이해 재사용이 가능하게 된다.As described above, in the present invention, since the chromium pattern is located between the quartz substrate and the upper quartz plate, there is no fear of contamination by external particles, and no pellicle is used, so it is easy to handle and store, and easy to clean and reuse when the quartz surface is contaminated. It becomes possible.
또한 종래의 레티클에 비해 이중의 석영판을 사용하므로 강도가 커져 잘 깨어지지 않게 되며, 마스크상의 어느 곳이든지 연속패턴을 만들어 쓸 수 있으므로 패턴구성에 제약이 없으며, 상부 석영판과 석영기판으로 크기가 같은 석영을 사용하므로 펠리클과 같이 미스얼라인이 발생하지 않게 된다.In addition, since the use of a double quartz plate compared to the conventional reticle, the strength is increased, so it does not break easily, and since the continuous pattern can be made anywhere on the mask, there is no restriction in the pattern configuration, and the size of the upper quartz plate and the quartz substrate Since the same quartz is used, no misalignment occurs like a pellicle.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019940009724A KR0142791B1 (en) | 1994-05-03 | 1994-05-03 | Reticle structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019940009724A KR0142791B1 (en) | 1994-05-03 | 1994-05-03 | Reticle structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR950034513A KR950034513A (en) | 1995-12-28 |
| KR0142791B1 true KR0142791B1 (en) | 1998-08-17 |
Family
ID=19382431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019940009724A KR0142791B1 (en) | 1994-05-03 | 1994-05-03 | Reticle structure |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR0142791B1 (en) |
-
1994
- 1994-05-03 KR KR1019940009724A patent/KR0142791B1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR950034513A (en) | 1995-12-28 |
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