KR950034513A - Reticle Structure - Google Patents
Reticle Structure Download PDFInfo
- Publication number
- KR950034513A KR950034513A KR1019940009724A KR19940009724A KR950034513A KR 950034513 A KR950034513 A KR 950034513A KR 1019940009724 A KR1019940009724 A KR 1019940009724A KR 19940009724 A KR19940009724 A KR 19940009724A KR 950034513 A KR950034513 A KR 950034513A
- Authority
- KR
- South Korea
- Prior art keywords
- quartz substrate
- reticle structure
- quartz
- present
- relates
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
본 발명은 레티클구조에 관한 것으로, 취급이 용이하고 외부요인에 의해 오염되는 일이 없는 레티클구조에 관한 것이다.The present invention relates to a reticle structure, which relates to a reticle structure that is easy to handle and is not contaminated by external factors.
본 발명은 석영기판과, 상기 석영기판상에 형성된 크롬패턴층, 및 상기 석영기판 상부에 상기 석영기판과 동일한 크기를 가지며 상기 석영기판의 외곽에 장착된 접착패드에 의해 상기 석영기판과 일정간격을 두고 부착 된 상부 석영판을 구비하여 구성된 레티클구조를 제공한다.The present invention has a predetermined distance from the quartz substrate by a quartz substrate, a chromium pattern layer formed on the quartz substrate, and an adhesive pad mounted on the outside of the quartz substrate, having the same size as the quartz substrate on the quartz substrate. Provided is a reticle structure having an attached top quartz plate.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제3도는 본 발명의 레티클 구조 및 제조방법을 도시한 단면도, 제4도는 본 발명의 레티클 구조의 평면도.3 is a cross-sectional view showing the reticle structure and manufacturing method of the present invention, Figure 4 is a plan view of the reticle structure of the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940009724A KR0142791B1 (en) | 1994-05-03 | 1994-05-03 | Reticle structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940009724A KR0142791B1 (en) | 1994-05-03 | 1994-05-03 | Reticle structure |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950034513A true KR950034513A (en) | 1995-12-28 |
KR0142791B1 KR0142791B1 (en) | 1998-08-17 |
Family
ID=19382431
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940009724A KR0142791B1 (en) | 1994-05-03 | 1994-05-03 | Reticle structure |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0142791B1 (en) |
-
1994
- 1994-05-03 KR KR1019940009724A patent/KR0142791B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0142791B1 (en) | 1998-08-17 |
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