KR0115588Y1 - Poto-resist supply machine - Google Patents
Poto-resist supply machine Download PDFInfo
- Publication number
- KR0115588Y1 KR0115588Y1 KR2019940023374U KR19940023374U KR0115588Y1 KR 0115588 Y1 KR0115588 Y1 KR 0115588Y1 KR 2019940023374 U KR2019940023374 U KR 2019940023374U KR 19940023374 U KR19940023374 U KR 19940023374U KR 0115588 Y1 KR0115588 Y1 KR 0115588Y1
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- KR
- South Korea
- Prior art keywords
- photosensitive film
- supply pipe
- bottle
- photoresist
- feeder
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Networks & Wireless Communication (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Closures For Containers (AREA)
Abstract
본 발명은 소정 감광막(12)이 담겨있는 병(11)과, 일측 단부가 상기 병 내부에 담기어 감광막을 빨아들임으로써 외부로 감광막을 공급하는 공급관(13)을 구비하는 감광막 공급기에 있어서: 상기 병(11)에 잠기는 공급관의 일측 단부 개구에 형성되어 관의 두께를 넓혀주는 이음쇄(14): 그 내부 밑면이 상기 이음쇄(14)와 연결되며 그 종단면이 U자형을 갖고 있어 상기 병(11)과 공급관(12)이 분리되었을시 공급관(12)의 내부에서 흘러나오는 감광막이 외부로 유출되어 오염시키는 것을 일시적으로 방지하는 오염방지 용기(15)를 포함하여 이루어지는 것을 특징으로 하는 감광막 공급기에 관한 것으로, 감광막을 보관하고 있는 병을 교체할시 감광막 공급관에 잔존하는 감광막 찌꺼기의 외부로의 유출을 방지하고, 공기 유입에 의한 감광막 버블 발생을 방지하여 불순물의 발생을 최소화 하는 효과가 있다.The present invention provides a photosensitive film feeder comprising a bottle (11) containing a predetermined photosensitive film (12), and a supply pipe (13) for supplying the photosensitive film to the outside by absorbing the photosensitive film by immersing the photosensitive film in one end thereof: Joint (14) formed in the opening of one end of the supply pipe immersed in the bottle (11) to increase the thickness of the tube: the inner bottom is connected to the joint (14) and the longitudinal section of the U-shaped bottle ( 11) and the photosensitive film feeder, characterized in that it comprises a pollution prevention container 15 to temporarily prevent the photosensitive film flowing from the inside of the supply pipe 12 is leaked to the outside when the supply pipe 12 is separated To prevent the outflow of the photoresist residue remaining in the photoresist film supply pipe to the outside of the photoresist supply pipe, and to prevent the formation of photoresist bubbles due to air inflow. It has the effect of minimizing the generation of water.
Description
제1도는 종래의 감광막 공급기를 나타내는 중앙 종단면도.1 is a central longitudinal cross-sectional view showing a conventional photosensitive film feeder.
제2도는 본 고안의 일실시예에 따른 감광막 공급기 중앙 종단면도.Figure 2 is a central longitudinal cross-sectional view of the photosensitive film feeder according to an embodiment of the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
11 : 병 12 : 감광막11: bottle 12: photosensitive film
13 : 공급관 14 : 슈퍼 이음쇄13: supply pipe 14: super joint
15 : 용기15: container
본 고안은 반도체 제조 공정에 사용되는 감광막 공급기에 관한 것이다.The present invention relates to a photosensitive film feeder used in a semiconductor manufacturing process.
감광막은 반도체 제조 공정중 사진식각 공정 및 보호막 등으로 사용되는 물질로서, 점성을 가지며 병(bottle)에 보관되어 있는 감광막을 웨이퍼에 분사하여 코팅함으로써 공정에 사용하고 있다.The photoresist film is a material used in a photolithography process, a protective film, or the like during a semiconductor manufacturing process, and is used in a process by spraying a photoresist film, which is viscous and stored in a bottle, onto a wafer.
제1도는 종래의 감광막 공급기를 나타내는 중앙 종단면도로서, 감광막(12)이 담겨있는 병(11)과, 일측 단부가 상기 병 내부에 담기어 감광막을 빨아들임으로써 외부로 감광막을 공급하는 1/4인치 크기의 테프론 공급관(13)으로 형성된다.1 is a central longitudinal cross-sectional view showing a conventional photosensitive film feeder, in which the bottle 11 containing the photosensitive film 12 and one end thereof are immersed inside the bottle to suck the photosensitive film to supply the photosensitive film to the outside. It is formed of an inch size Teflon feed pipe 13.
이와같은 종래의 감광막 공급기는 감광막을 보관하고 있는 병을 교체할시 병마개를 열어서 교체하게 되는데 병을 빼내었을시 지면을 향하고 있는 공급관의 일측 단부 개구에서 공급관 내부에 잔존하고 있던 감광막이 흘러나와 장비 바닥에 떨어지게 되어 아세톤으로 그 주위를 새척해야 하는 불편함과, 공급관 속으로 공기가 유입되어 공기방을(bubble)이 발생하는 문제점이 있었다.In the conventional photosensitive film feeder, when the bottle containing the photosensitive film is replaced, the bottle cap is opened and replaced.When the bottle is taken out, the photosensitive film remaining inside the supply pipe flows from the opening at one end of the supply pipe facing the ground. There was a problem that the fall to the acetone and the inconvenience of having to carve around, air is introduced into the supply pipe (bubble) occurs.
따라서, 본 고안은 감광막을 보관하고 있는 병을 교체할시 감광막 공급관에 잔존하는 감광막 찌꺼기의 외부로의 유출을 방지하며, 공급관으로 공기유입을 방지하는 감광막 공급기를 제공함을 그 목적으로 한다.Therefore, an object of the present invention is to provide a photosensitive film feeder which prevents the outflow of the photosensitive film residue remaining in the photosensitive film supply pipe when the bottle containing the photosensitive film is replaced, and prevents the inflow of air into the supply pipe.
상기 목적을 달성하기 위하여 본 발명은 감광막이 담겨있는 병과, 일측 단부가 상기 병 내부에 담기어 감광막을 빨아들임으로써 외부로 감광막을 공급하는 공급관을 구비하는 감광막 공급기에 있어서: 상기 병에 잠기는 공급관의 일측 단부 개구에 형성되어 관의 두께를 넓혀 주는 이음쇄: 그 내부 밑면이 상기 이음쇄와 연결되며 그 종단면이 U자형을 갖고 있어 상기 병과 공급관이 분리되었을시 공급관의 내부에서 흘러나오는 감광막이 외부로 유출되어 오염시키는 것을 일시적으로 방지하는 오염방지 용기를 포함하여 이루어지는 것을 특징으로 한다.In order to achieve the above object, the present invention provides a photosensitive film feeder having a bottle containing a photosensitive film, and a supply pipe for supplying the photosensitive film to the outside by one end of the inside of the bottle to suck the photosensitive film: Joints formed in one end opening to increase the thickness of the tube: its inner bottom surface is connected to the joint chain and its longitudinal section has a U-shape so that when the bottle and the supply tube are separated, the photoresist film flowing from the inside of the supply tube is moved to the outside. It characterized in that it comprises a pollution prevention container for temporarily preventing the leakage and contamination.
이하, 첨부된 도면 제2도를 참조하여 본 발명의 일실시예를 상세히 설명한다.Hereinafter, an embodiment of the present invention will be described in detail with reference to FIG. 2.
제2도는 본 고안의 일실시예에 따른 감광막 공급기로서, 도면에서 11은 병, 12는 감광막, 13은 공급관, 14는 슈퍼 이음쇄(supper fitting), 15는 용기를 각각 나타낸다.2 is a photosensitive film feeder according to an embodiment of the present invention, 11 is a bottle, 12 is a photosensitive film, 13 is a supply pipe, 14 is a super fitting, and 15 is a container.
도면에 도시된 바와 같이 병(11)에 잠기는 공급관(13)의 일측 단부개구에는 슈퍼이음쇄(14)가 형성되는데, 이 슈퍼 이음쇄는 관 단부의 내부직경은 동일하게 유지하면서 관의 두께를 넓혀주어 관 단부를 다른 부위와의 연결이 가능하도록 하여준다.As shown in the figure, a super joint chain 14 is formed at one end opening of the supply pipe 13 immersed in the bottle 11, which maintains the same inner diameter of the tube end while maintaining the thickness of the tube. Widen it so that the end of the tube can be connected to other parts.
그리고, 윗면이 뚫린 원통 또는 그 종단면이 U자형을 갖는 용기(15)의 내부 밑면이 슈퍼이음쇄(14)의 일부와 연결되어 있어, 병을 교체하기 위하여 병과 공급관이 분리되었을시 공급관의 내부에서 흘러나오는 감광막이 외부로 유출되어 장비의 바닥이 떨어지는 것을 방지하며, 이 용기 주위에는 감광막이 항상 고여있어 공급관 내부로 공기가 유입되는 것을 방지한다.In addition, the inner bottom of the cylinder 15 having a U-shaped cylinder or the upper end thereof is connected to a part of the super joint chain 14 so that when the bottle and the supply pipe are separated to replace the bottle, It prevents the outflowing photoresist from leaking out and the bottom of the equipment to fall, and the photoresist always stays around the vessel to prevent air from entering the supply line.
물론, 이음쇄의 일부는 용기의 내부 밑면과 어느정도 공간을 가지고 떨어져 있으므로 병 내부의 감광막을 흡입할 수 있다.Of course, some of the joints are separated from the inner bottom of the container to some extent so that the photoresist film inside the bottle can be sucked.
이상, 상기 설명과 같은 본 고안은 감광막을 보관하고 있는 병을 교체할시 감광막 공급관에 잔존하는 감광막 찌꺼기의 외부로의 유출을 방지하고, 공기 유입에 의한 감광막 버블 발생을 방지하여 불순물의 발생을 최소화 하는 효과가 있다.As described above, the present invention as described above prevents the outflow of the photoresist residues remaining in the photoresist film supply pipe to the outside when replacing the bottle storing the photoresist film, and prevents the photoresist bubble generation due to air inflow to minimize the generation of impurities. It is effective.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019940023374U KR0115588Y1 (en) | 1994-09-09 | 1994-09-09 | Poto-resist supply machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019940023374U KR0115588Y1 (en) | 1994-09-09 | 1994-09-09 | Poto-resist supply machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR960012656U KR960012656U (en) | 1996-04-17 |
| KR0115588Y1 true KR0115588Y1 (en) | 1998-04-21 |
Family
ID=19392861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR2019940023374U KR0115588Y1 (en) | 1994-09-09 | 1994-09-09 | Poto-resist supply machine |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR0115588Y1 (en) |
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1994
- 1994-09-09 KR KR2019940023374U patent/KR0115588Y1/en not_active IP Right Cessation
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| Publication number | Publication date |
|---|---|
| KR960012656U (en) | 1996-04-17 |
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