KR960012656U - Photoresist feeder - Google Patents

Photoresist feeder

Info

Publication number
KR960012656U
KR960012656U KR2019940023374U KR19940023374U KR960012656U KR 960012656 U KR960012656 U KR 960012656U KR 2019940023374 U KR2019940023374 U KR 2019940023374U KR 19940023374 U KR19940023374 U KR 19940023374U KR 960012656 U KR960012656 U KR 960012656U
Authority
KR
South Korea
Prior art keywords
photoresist feeder
photoresist
feeder
Prior art date
Application number
KR2019940023374U
Other languages
Korean (ko)
Other versions
KR0115588Y1 (en
Inventor
황선진
채명주
이승호
Original Assignee
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업 주식회사 filed Critical 현대전자산업 주식회사
Priority to KR2019940023374U priority Critical patent/KR0115588Y1/en
Publication of KR960012656U publication Critical patent/KR960012656U/en
Application granted granted Critical
Publication of KR0115588Y1 publication Critical patent/KR0115588Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Closures For Containers (AREA)
KR2019940023374U 1994-09-09 1994-09-09 Poto-resist supply machine KR0115588Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940023374U KR0115588Y1 (en) 1994-09-09 1994-09-09 Poto-resist supply machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940023374U KR0115588Y1 (en) 1994-09-09 1994-09-09 Poto-resist supply machine

Publications (2)

Publication Number Publication Date
KR960012656U true KR960012656U (en) 1996-04-17
KR0115588Y1 KR0115588Y1 (en) 1998-04-21

Family

ID=19392861

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940023374U KR0115588Y1 (en) 1994-09-09 1994-09-09 Poto-resist supply machine

Country Status (1)

Country Link
KR (1) KR0115588Y1 (en)

Also Published As

Publication number Publication date
KR0115588Y1 (en) 1998-04-21

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Legal Events

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Year of fee payment: 12

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