JPWO2025134288A1 - - Google Patents

Info

Publication number
JPWO2025134288A1
JPWO2025134288A1 JP2024531405A JP2024531405A JPWO2025134288A1 JP WO2025134288 A1 JPWO2025134288 A1 JP WO2025134288A1 JP 2024531405 A JP2024531405 A JP 2024531405A JP 2024531405 A JP2024531405 A JP 2024531405A JP WO2025134288 A1 JPWO2025134288 A1 JP WO2025134288A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2024531405A
Other languages
Japanese (ja)
Other versions
JP7764607B1 (ja
JPWO2025134288A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2025134288A1 publication Critical patent/JPWO2025134288A1/ja
Priority to JP2025178752A priority Critical patent/JP2026012854A/ja
Application granted granted Critical
Publication of JP7764607B1 publication Critical patent/JP7764607B1/ja
Publication of JPWO2025134288A5 publication Critical patent/JPWO2025134288A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722Details of electrostatic chucks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0402Apparatus for fluid treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0431Apparatus for thermal treatment
    • H10P72/0432Apparatus for thermal treatment mainly by conduction
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0431Apparatus for thermal treatment
    • H10P72/0434Apparatus for thermal treatment mainly by convection
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7614Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7616Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating, a hardness or a material
JP2024531405A 2023-12-20 2023-12-20 半導体製造装置用部材 Active JP7764607B1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025178752A JP2026012854A (ja) 2023-12-20 2025-10-23 半導体製造装置用部材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/045783 WO2025134288A1 (ja) 2023-12-20 2023-12-20 半導体製造装置用部材

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025178752A Division JP2026012854A (ja) 2023-12-20 2025-10-23 半導体製造装置用部材

Publications (3)

Publication Number Publication Date
JPWO2025134288A1 true JPWO2025134288A1 (https=) 2025-06-26
JP7764607B1 JP7764607B1 (ja) 2025-11-05
JPWO2025134288A5 JPWO2025134288A5 (https=) 2025-11-19

Family

ID=96096428

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2024531405A Active JP7764607B1 (ja) 2023-12-20 2023-12-20 半導体製造装置用部材
JP2025178752A Pending JP2026012854A (ja) 2023-12-20 2025-10-23 半導体製造装置用部材

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025178752A Pending JP2026012854A (ja) 2023-12-20 2025-10-23 半導体製造装置用部材

Country Status (4)

Country Link
US (1) US20250210394A1 (https=)
JP (2) JP7764607B1 (https=)
TW (1) TW202527196A (https=)
WO (1) WO2025134288A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10770270B2 (en) * 2016-06-07 2020-09-08 Applied Materials, Inc. High power electrostatic chuck with aperture-reducing plug in a gas hole
JP7441404B2 (ja) * 2019-03-05 2024-03-01 Toto株式会社 静電チャック、および処理装置
JP2023035856A (ja) * 2021-08-31 2023-03-13 Toto株式会社 静電チャック、および処理装置
JP7620578B2 (ja) * 2022-01-07 2025-01-23 日本碍子株式会社 半導体製造装置用部材
JP7569343B2 (ja) * 2022-01-21 2024-10-17 日本碍子株式会社 半導体製造装置用部材
JP7483121B2 (ja) * 2022-02-09 2024-05-14 日本碍子株式会社 半導体製造装置用部材

Also Published As

Publication number Publication date
WO2025134288A1 (ja) 2025-06-26
US20250210394A1 (en) 2025-06-26
TW202527196A (zh) 2025-07-01
JP7764607B1 (ja) 2025-11-05
JP2026012854A (ja) 2026-01-27

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