JPWO2025037642A1 - - Google Patents
Info
- Publication number
- JPWO2025037642A1 JPWO2025037642A1 JP2025540718A JP2025540718A JPWO2025037642A1 JP WO2025037642 A1 JPWO2025037642 A1 JP WO2025037642A1 JP 2025540718 A JP2025540718 A JP 2025540718A JP 2025540718 A JP2025540718 A JP 2025540718A JP WO2025037642 A1 JPWO2025037642 A1 JP WO2025037642A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023133069 | 2023-08-17 | ||
| JP2023202660 | 2023-11-30 | ||
| PCT/JP2024/029116 WO2025037642A1 (ja) | 2023-08-17 | 2024-08-15 | 金属スパッタリングターゲット、金属スパッタリングターゲット構造体及びこれらを用いた膜の製造方法、並びに金属スパッタリングターゲットの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2025037642A1 true JPWO2025037642A1 (https=) | 2025-02-20 |
| JPWO2025037642A5 JPWO2025037642A5 (https=) | 2026-02-19 |
Family
ID=94632577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025540718A Pending JPWO2025037642A1 (https=) | 2023-08-17 | 2024-08-15 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2025037642A1 (https=) |
| KR (1) | KR20260043103A (https=) |
| TW (1) | TW202509256A (https=) |
| WO (1) | WO2025037642A1 (https=) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050155677A1 (en) * | 2004-01-08 | 2005-07-21 | Wickersham Charles E.Jr. | Tantalum and other metals with (110) orientation |
| WO2009107763A1 (ja) * | 2008-02-29 | 2009-09-03 | 新日鉄マテリアルズ株式会社 | 金属系スパッタリングターゲット材 |
| WO2011052171A1 (ja) * | 2009-10-26 | 2011-05-05 | 株式会社アルバック | チタン含有スパッタリングターゲットの製造方法 |
| JP2012507626A (ja) * | 2008-11-03 | 2012-03-29 | トーソー エスエムディー，インク． | スパッターターゲットを製造する方法と当該方法によって製造されるスパッターターゲット |
| CN111286703A (zh) * | 2020-03-31 | 2020-06-16 | 贵研铂业股份有限公司 | 一种镍铂合金溅射靶材及其制备方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8197894B2 (en) | 2007-05-04 | 2012-06-12 | H.C. Starck Gmbh | Methods of forming sputtering targets |
| JP2023133069A (ja) | 2022-03-11 | 2023-09-22 | 株式会社リコー | 液体吐出装置、および液体吐出方法 |
-
2024
- 2024-08-15 KR KR1020267004277A patent/KR20260043103A/ko active Pending
- 2024-08-15 JP JP2025540718A patent/JPWO2025037642A1/ja active Pending
- 2024-08-15 WO PCT/JP2024/029116 patent/WO2025037642A1/ja active Pending
- 2024-08-15 TW TW113130751A patent/TW202509256A/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050155677A1 (en) * | 2004-01-08 | 2005-07-21 | Wickersham Charles E.Jr. | Tantalum and other metals with (110) orientation |
| WO2009107763A1 (ja) * | 2008-02-29 | 2009-09-03 | 新日鉄マテリアルズ株式会社 | 金属系スパッタリングターゲット材 |
| JP2012507626A (ja) * | 2008-11-03 | 2012-03-29 | トーソー エスエムディー，インク． | スパッターターゲットを製造する方法と当該方法によって製造されるスパッターターゲット |
| WO2011052171A1 (ja) * | 2009-10-26 | 2011-05-05 | 株式会社アルバック | チタン含有スパッタリングターゲットの製造方法 |
| CN111286703A (zh) * | 2020-03-31 | 2020-06-16 | 贵研铂业股份有限公司 | 一种镍铂合金溅射靶材及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2025037642A1 (ja) | 2025-02-20 |
| KR20260043103A (ko) | 2026-03-31 |
| TW202509256A (zh) | 2025-03-01 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20251212 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20251212 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20251212 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20260203 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20260302 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20260302 |