JPWO2024247713A1 - - Google Patents
Info
- Publication number
- JPWO2024247713A1 JPWO2024247713A1 JP2025523439A JP2025523439A JPWO2024247713A1 JP WO2024247713 A1 JPWO2024247713 A1 JP WO2024247713A1 JP 2025523439 A JP2025523439 A JP 2025523439A JP 2025523439 A JP2025523439 A JP 2025523439A JP WO2024247713 A1 JPWO2024247713 A1 JP WO2024247713A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023090180 | 2023-05-31 | ||
| PCT/JP2024/017857 WO2024247713A1 (ja) | 2023-05-31 | 2024-05-14 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024247713A1 true JPWO2024247713A1 (https=) | 2024-12-05 |
Family
ID=93657755
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025523439A Pending JPWO2024247713A1 (https=) | 2023-05-31 | 2024-05-14 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20260036898A1 (https=) |
| JP (1) | JPWO2024247713A1 (https=) |
| KR (1) | KR20260015791A (https=) |
| TW (1) | TW202449495A (https=) |
| WO (1) | WO2024247713A1 (https=) |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5638769B2 (ja) * | 2009-02-04 | 2014-12-10 | Hoya株式会社 | 反射型マスクブランクの製造方法及び反射型マスクの製造方法 |
| US9618836B2 (en) * | 2014-04-22 | 2017-04-11 | Asahi Glass Company, Limited | Reflective mask blank for EUV lithography, substrate with funtion film for the mask blank, and methods for their production |
| WO2018159785A1 (ja) * | 2017-03-02 | 2018-09-07 | Hoya株式会社 | 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法 |
| KR102937232B1 (ko) | 2018-05-25 | 2026-03-10 | 호야 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크, 그리고, 반사형 마스크 및 반도체 장치의 제조 방법 |
| SG11202109240PA (en) * | 2019-02-28 | 2021-09-29 | Hoya Corp | Reflective mask blank, reflective mask and method of manufacturing the same, and method of manufacturing semiconductor device |
| JP6929340B2 (ja) | 2019-11-21 | 2021-09-01 | Hoya株式会社 | 反射型マスクブランクおよび反射型マスク、並びに半導体装置の製造方法 |
| KR20210155863A (ko) * | 2020-06-16 | 2021-12-24 | 삼성전자주식회사 | 극자외선 리소그래피용 위상 반전 마스크 및 이를 이용한 반도체 소자의 제조 방법 |
| US11619875B2 (en) * | 2020-06-29 | 2023-04-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | EUV photo masks and manufacturing method thereof |
| JP7318607B2 (ja) * | 2020-07-28 | 2023-08-01 | Ａｇｃ株式会社 | Ｅｕｖリソグラフィ用反射型マスクブランク、ｅｕｖリソグラフィ用反射型マスク、およびそれらの製造方法 |
| JP7722380B2 (ja) * | 2020-09-04 | 2025-08-13 | Ａｇｃ株式会社 | 反射型マスク、反射型マスクブランク、および反射型マスクの製造方法 |
| JP7616099B2 (ja) | 2021-03-03 | 2025-01-17 | 信越化学工業株式会社 | 反射型マスクブランク及びその製造方法 |
| KR20250153856A (ko) * | 2021-12-13 | 2025-10-27 | 에이지씨 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크, 반사형 마스크 블랭크의 제조 방법 및 반사형 마스크의 제조 방법 |
-
2024
- 2024-05-14 JP JP2025523439A patent/JPWO2024247713A1/ja active Pending
- 2024-05-14 WO PCT/JP2024/017857 patent/WO2024247713A1/ja not_active Ceased
- 2024-05-14 KR KR1020257035848A patent/KR20260015791A/ko active Pending
- 2024-05-15 TW TW113117914A patent/TW202449495A/zh unknown
-
2025
- 2025-10-13 US US19/356,372 patent/US20260036898A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024247713A1 (ja) | 2024-12-05 |
| US20260036898A1 (en) | 2026-02-05 |
| TW202449495A (zh) | 2024-12-16 |
| KR20260015791A (ko) | 2026-02-03 |