JPWO2024232252A1 - - Google Patents
Info
- Publication number
- JPWO2024232252A1 JPWO2024232252A1 JP2025519372A JP2025519372A JPWO2024232252A1 JP WO2024232252 A1 JPWO2024232252 A1 JP WO2024232252A1 JP 2025519372 A JP2025519372 A JP 2025519372A JP 2025519372 A JP2025519372 A JP 2025519372A JP WO2024232252 A1 JPWO2024232252 A1 JP WO2024232252A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023078635 | 2023-05-11 | ||
| PCT/JP2024/015727 WO2024232252A1 (ja) | 2023-05-11 | 2024-04-22 | 炭化珪素エピタキシャル基板および炭化珪素半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024232252A1 true JPWO2024232252A1 (https=) | 2024-11-14 |
| JPWO2024232252A5 JPWO2024232252A5 (https=) | 2026-02-09 |
Family
ID=93430085
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025519372A Pending JPWO2024232252A1 (https=) | 2023-05-11 | 2024-04-22 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2024232252A1 (https=) |
| WO (1) | WO2024232252A1 (https=) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6584253B2 (ja) * | 2015-09-16 | 2019-10-02 | ローム株式会社 | SiCエピタキシャルウェハ、SiCエピタキシャルウェハの製造装置、SiCエピタキシャルウェハの製造方法、および半導体装置 |
| JP6648627B2 (ja) * | 2016-04-27 | 2020-02-14 | 三菱電機株式会社 | 炭化珪素エピタキシャルウエハの製造方法、炭化珪素半導体装置の製造方法及び炭化珪素エピタキシャルウエハの製造装置 |
| US12516443B2 (en) * | 2021-02-15 | 2026-01-06 | Sumitomo Electric Industries, Ltd. | Silicon carbide epitaxial substrate |
-
2024
- 2024-04-22 WO PCT/JP2024/015727 patent/WO2024232252A1/ja not_active Ceased
- 2024-04-22 JP JP2025519372A patent/JPWO2024232252A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024232252A1 (ja) | 2024-11-14 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250828 |