JPWO2024209913A1 - - Google Patents

Info

Publication number
JPWO2024209913A1
JPWO2024209913A1 JP2025512473A JP2025512473A JPWO2024209913A1 JP WO2024209913 A1 JPWO2024209913 A1 JP WO2024209913A1 JP 2025512473 A JP2025512473 A JP 2025512473A JP 2025512473 A JP2025512473 A JP 2025512473A JP WO2024209913 A1 JPWO2024209913 A1 JP WO2024209913A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025512473A
Other languages
Japanese (ja)
Other versions
JPWO2024209913A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024209913A1 publication Critical patent/JPWO2024209913A1/ja
Publication of JPWO2024209913A5 publication Critical patent/JPWO2024209913A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/85—Packages
    • H10H20/858—Means for heat extraction or cooling
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/80—Constructional details
    • H10H29/85—Packages
    • H10H29/858—Means for heat extraction or cooling
    • H10H29/8582—Means for heat extraction or cooling characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/80—Constructional details
    • H10H29/85—Packages
    • H10H29/858—Means for heat extraction or cooling
    • H10H29/8586—Means for heat extraction or cooling comprising fluids, e.g. heat-pipes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
JP2025512473A 2023-04-05 2024-03-18 Pending JPWO2024209913A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2023/014075 WO2024209586A1 (ja) 2023-04-05 2023-04-05 光源ユニット、照明ユニット、露光装置、及び露光方法
PCT/JP2024/010439 WO2024209913A1 (ja) 2023-04-05 2024-03-18 光源ユニット、照明ユニット、露光装置、及び露光方法

Publications (2)

Publication Number Publication Date
JPWO2024209913A1 true JPWO2024209913A1 (https=) 2024-10-10
JPWO2024209913A5 JPWO2024209913A5 (https=) 2026-01-14

Family

ID=92971823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025512473A Pending JPWO2024209913A1 (https=) 2023-04-05 2024-03-18

Country Status (4)

Country Link
JP (1) JPWO2024209913A1 (https=)
KR (1) KR20250160467A (https=)
CN (1) CN120958387A (https=)
WO (2) WO2024209586A1 (https=)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006059828A1 (en) * 2004-09-10 2006-06-08 Seoul Semiconductor Co., Ltd. Light emitting diode package having multiple molding resins
JP4587170B2 (ja) 2005-01-20 2010-11-24 キヤノン株式会社 露光装置及びデバイスの製造方法
JP4678493B2 (ja) * 2005-05-23 2011-04-27 株式会社ニコン 光源ユニット、照明光学装置、露光装置、および露光方法
JP2010274256A (ja) * 2009-01-29 2010-12-09 Kyocera Corp 光照射ヘッド、露光デバイス、画像形成装置、液滴硬化装置、および液滴硬化方法
JP4914998B1 (ja) * 2010-11-17 2012-04-11 国立大学法人九州工業大学 Ｌｅｄモジュール装置及びその製造方法
WO2014031849A2 (en) * 2012-08-22 2014-02-27 Flex-N-Gate Advanced Product Development, Llc Micro-channel heat sink for led headlamp
JP6654956B2 (ja) * 2016-04-01 2020-02-26 シーシーエス株式会社 光照射装置
JP2021193429A (ja) * 2020-06-08 2021-12-23 株式会社ブイ・テクノロジー 露光用の光源装置、照明装置、露光装置、及び露光方法

Also Published As

Publication number Publication date
WO2024209913A1 (ja) 2024-10-10
KR20250160467A (ko) 2025-11-13
WO2024209586A1 (ja) 2024-10-10
TW202505310A (zh) 2025-02-01
CN120958387A (zh) 2025-11-14

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Legal Events

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Effective date: 20251022

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Effective date: 20251022