JPWO2024195024A1 - - Google Patents

Info

Publication number
JPWO2024195024A1
JPWO2024195024A1 JP2025507993A JP2025507993A JPWO2024195024A1 JP WO2024195024 A1 JPWO2024195024 A1 JP WO2024195024A1 JP 2025507993 A JP2025507993 A JP 2025507993A JP 2025507993 A JP2025507993 A JP 2025507993A JP WO2024195024 A1 JPWO2024195024 A1 JP WO2024195024A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025507993A
Other languages
Japanese (ja)
Other versions
JPWO2024195024A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024195024A1 publication Critical patent/JPWO2024195024A1/ja
Publication of JPWO2024195024A5 publication Critical patent/JPWO2024195024A5/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Drying Of Semiconductors (AREA)
JP2025507993A 2023-03-22 2023-03-22 Pending JPWO2024195024A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/011087 WO2024195024A1 (ja) 2023-03-22 2023-03-22 イオンミリング装置

Publications (2)

Publication Number Publication Date
JPWO2024195024A1 true JPWO2024195024A1 (https=) 2024-09-26
JPWO2024195024A5 JPWO2024195024A5 (https=) 2025-10-14

Family

ID=92841100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025507993A Pending JPWO2024195024A1 (https=) 2023-03-22 2023-03-22

Country Status (3)

Country Link
JP (1) JPWO2024195024A1 (https=)
KR (1) KR20250137690A (https=)
WO (1) WO2024195024A1 (https=)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018013133A (ja) * 2016-07-19 2018-01-25 株式会社デンソー 電磁クラッチ
JP6928943B2 (ja) 2017-03-28 2021-09-01 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置

Also Published As

Publication number Publication date
WO2024195024A1 (ja) 2024-09-26
KR20250137690A (ko) 2025-09-18

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Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250731

A621 Written request for application examination

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Effective date: 20250731