JPWO2024158019A5 - - Google Patents
Info
- Publication number
- JPWO2024158019A5 JPWO2024158019A5 JP2024573217A JP2024573217A JPWO2024158019A5 JP WO2024158019 A5 JPWO2024158019 A5 JP WO2024158019A5 JP 2024573217 A JP2024573217 A JP 2024573217A JP 2024573217 A JP2024573217 A JP 2024573217A JP WO2024158019 A5 JPWO2024158019 A5 JP WO2024158019A5
- Authority
- JP
- Japan
- Prior art keywords
- feature
- data
- learning model
- computer
- predicted value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023010470 | 2023-01-26 | ||
| PCT/JP2024/002108 WO2024158019A1 (ja) | 2023-01-26 | 2024-01-24 | コンピュータプログラム、情報処理方法、及び情報処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024158019A1 JPWO2024158019A1 (https=) | 2024-08-02 |
| JPWO2024158019A5 true JPWO2024158019A5 (https=) | 2025-10-09 |
Family
ID=91970682
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024573217A Pending JPWO2024158019A1 (https=) | 2023-01-26 | 2024-01-24 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250348999A1 (https=) |
| JP (1) | JPWO2024158019A1 (https=) |
| KR (1) | KR20250143092A (https=) |
| CN (1) | CN120604246A (https=) |
| TW (1) | TW202503592A (https=) |
| WO (1) | WO2024158019A1 (https=) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10365212B2 (en) * | 2016-11-14 | 2019-07-30 | Verity Instruments, Inc. | System and method for calibration of optical signals in semiconductor process systems |
| US10705514B2 (en) * | 2018-10-09 | 2020-07-07 | Applied Materials, Inc. | Adaptive chamber matching in advanced semiconductor process control |
| JP7412150B2 (ja) * | 2019-11-29 | 2024-01-12 | 東京エレクトロン株式会社 | 予測装置、予測方法及び予測プログラム |
| CN112301322B (zh) * | 2020-12-21 | 2021-04-13 | 上海陛通半导体能源科技股份有限公司 | 具有工艺参数智能调节功能的气相沉积设备及方法 |
-
2024
- 2024-01-12 TW TW113101325A patent/TW202503592A/zh unknown
- 2024-01-24 CN CN202480009371.8A patent/CN120604246A/zh active Pending
- 2024-01-24 KR KR1020257028227A patent/KR20250143092A/ko active Pending
- 2024-01-24 JP JP2024573217A patent/JPWO2024158019A1/ja active Pending
- 2024-01-24 WO PCT/JP2024/002108 patent/WO2024158019A1/ja not_active Ceased
-
2025
- 2025-07-25 US US19/280,446 patent/US20250348999A1/en active Pending
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