JPWO2024142681A1 - - Google Patents
Info
- Publication number
- JPWO2024142681A1 JPWO2024142681A1 JP2024567295A JP2024567295A JPWO2024142681A1 JP WO2024142681 A1 JPWO2024142681 A1 JP WO2024142681A1 JP 2024567295 A JP2024567295 A JP 2024567295A JP 2024567295 A JP2024567295 A JP 2024567295A JP WO2024142681 A1 JPWO2024142681 A1 JP WO2024142681A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022212189 | 2022-12-28 | ||
| PCT/JP2023/041890 WO2024142681A1 (ja) | 2022-12-28 | 2023-11-21 | 感放射線性組成物およびレジストパターン形成方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024142681A1 true JPWO2024142681A1 (https=) | 2024-07-04 |
Family
ID=91717087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024567295A Pending JPWO2024142681A1 (https=) | 2022-12-28 | 2023-11-21 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250321483A1 (https=) |
| JP (1) | JPWO2024142681A1 (https=) |
| KR (1) | KR20250126709A (https=) |
| TW (1) | TW202427059A (https=) |
| WO (1) | WO2024142681A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2026054063A1 (ja) * | 2024-09-09 | 2026-03-12 | 三菱瓦斯化学株式会社 | ヨウ素含有（メタ）アクリル酸エステル化合物及びヨウ素・水酸基含有重合体の製造方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5292078B2 (ja) | 2008-12-05 | 2013-09-18 | 富士フイルム株式会社 | 感活性光線または感放射線性樹脂組成物及び該組成物を用いたパターン形成方法 |
| JP6287369B2 (ja) | 2013-03-08 | 2018-03-07 | Jsr株式会社 | フォトレジスト組成物、レジストパターン形成方法、化合物及び重合体 |
| JP6450660B2 (ja) | 2014-08-25 | 2019-01-09 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7351262B2 (ja) | 2019-07-02 | 2023-09-27 | 信越化学工業株式会社 | ポジ型レジスト材料及びパターン形成方法 |
| WO2021039244A1 (ja) * | 2019-08-26 | 2021-03-04 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、レジスト膜、電子デバイスの製造方法 |
| WO2022158326A1 (ja) * | 2021-01-22 | 2022-07-28 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法 |
| EP4282886A4 (en) * | 2021-01-22 | 2024-07-31 | FUJIFILM Corporation | ACTINIC RAY OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC RAY OR RADIATION SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, COMPOUND AND RESIN |
| JPWO2023054127A1 (https=) * | 2021-09-29 | 2023-04-06 | ||
| EP4485073A4 (en) * | 2022-02-25 | 2025-08-27 | Fujifilm Corp | ACTINIC RAY OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD |
| JP7720810B2 (ja) * | 2022-04-06 | 2025-08-08 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
-
2023
- 2023-11-21 JP JP2024567295A patent/JPWO2024142681A1/ja active Pending
- 2023-11-21 KR KR1020257016325A patent/KR20250126709A/ko active Pending
- 2023-11-21 WO PCT/JP2023/041890 patent/WO2024142681A1/ja not_active Ceased
- 2023-12-08 TW TW112147942A patent/TW202427059A/zh unknown
-
2025
- 2025-06-26 US US19/250,336 patent/US20250321483A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US20250321483A1 (en) | 2025-10-16 |
| KR20250126709A (ko) | 2025-08-25 |
| WO2024142681A1 (ja) | 2024-07-04 |
| TW202427059A (zh) | 2024-07-01 |