JPWO2024116797A1 - - Google Patents
Info
- Publication number
- JPWO2024116797A1 JPWO2024116797A1 JP2024561311A JP2024561311A JPWO2024116797A1 JP WO2024116797 A1 JPWO2024116797 A1 JP WO2024116797A1 JP 2024561311 A JP2024561311 A JP 2024561311A JP 2024561311 A JP2024561311 A JP 2024561311A JP WO2024116797 A1 JPWO2024116797 A1 JP WO2024116797A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022192071 | 2022-11-30 | ||
| PCT/JP2023/040638 WO2024116797A1 (ja) | 2022-11-30 | 2023-11-10 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、及び電子デバイスの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024116797A1 true JPWO2024116797A1 (https=) | 2024-06-06 |
Family
ID=91323482
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024561311A Pending JPWO2024116797A1 (https=) | 2022-11-30 | 2023-11-10 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2024116797A1 (https=) |
| TW (1) | TW202432638A (https=) |
| WO (1) | WO2024116797A1 (https=) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH087441B2 (ja) * | 1986-12-29 | 1996-01-29 | 凸版印刷株式会社 | ポジ型高感度放射線感応性レジスト |
| JP3542106B2 (ja) * | 1999-05-11 | 2004-07-14 | 日本電信電話株式会社 | パターン形成方法およびポジ型レジスト組成物 |
| JP2001201853A (ja) * | 2000-01-17 | 2001-07-27 | Toray Ind Inc | ポジ型感放射線性組成物およびこれを用いたレジストパターンの製造方法 |
| JP2001330954A (ja) * | 2000-05-24 | 2001-11-30 | Fuji Photo Film Co Ltd | ポジ型画像形成材料 |
| JP2004093768A (ja) * | 2002-08-30 | 2004-03-25 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| JP4480141B2 (ja) * | 2004-06-28 | 2010-06-16 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
| US10831102B2 (en) * | 2018-03-05 | 2020-11-10 | International Business Machines Corporation | Photoactive polymer brush materials and EUV patterning using the same |
-
2023
- 2023-11-10 WO PCT/JP2023/040638 patent/WO2024116797A1/ja not_active Ceased
- 2023-11-10 JP JP2024561311A patent/JPWO2024116797A1/ja active Pending
- 2023-11-24 TW TW112145666A patent/TW202432638A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024116797A1 (ja) | 2024-06-06 |
| TW202432638A (zh) | 2024-08-16 |