JPWO2024085016A1 - - Google Patents
Info
- Publication number
- JPWO2024085016A1 JPWO2024085016A1 JP2024551686A JP2024551686A JPWO2024085016A1 JP WO2024085016 A1 JPWO2024085016 A1 JP WO2024085016A1 JP 2024551686 A JP2024551686 A JP 2024551686A JP 2024551686 A JP2024551686 A JP 2024551686A JP WO2024085016 A1 JPWO2024085016 A1 JP WO2024085016A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
- H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
- H10P76/2041—Photolithographic processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022168555 | 2022-10-20 | ||
| JP2023106451 | 2023-06-28 | ||
| PCT/JP2023/036703 WO2024085016A1 (ja) | 2022-10-20 | 2023-10-10 | 基板処理方法及び基板処理装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024085016A1 true JPWO2024085016A1 (https=) | 2024-04-25 |
Family
ID=90737431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024551686A Pending JPWO2024085016A1 (https=) | 2022-10-20 | 2023-10-10 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2024085016A1 (https=) |
| KR (1) | KR20250095642A (https=) |
| CN (1) | CN120019332A (https=) |
| TW (1) | TW202433168A (https=) |
| WO (1) | WO2024085016A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025142528A1 (ja) * | 2023-12-25 | 2025-07-03 | 東京エレクトロン株式会社 | レジストパターンを形成する方法、及び処理装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5020713A (https=) * | 1973-06-21 | 1975-03-05 | ||
| JP2016530565A (ja) * | 2013-08-22 | 2016-09-29 | インプリア・コーポレイションＩｎｐｒｉａ Ｃｏｒｐｏｒａｔｉｏｎ | 有機金属溶液に基づいた高解像度パターニング組成物 |
| WO2018123388A1 (ja) * | 2016-12-28 | 2018-07-05 | Jsr株式会社 | 感放射線性組成物、パターン形成方法並びに金属含有樹脂及びその製造方法 |
| JP2022526031A (ja) * | 2019-04-12 | 2022-05-20 | インプリア・コーポレイション | 有機金属フォトレジスト現像剤組成物及び処理方法 |
| WO2023048029A1 (ja) * | 2021-09-27 | 2023-03-30 | 東京エレクトロン株式会社 | レジストパターンを形成する方法、半導体装置を製造する方法、基板処理装置、及び記憶媒体 |
-
2023
- 2023-10-06 TW TW112138388A patent/TW202433168A/zh unknown
- 2023-10-10 WO PCT/JP2023/036703 patent/WO2024085016A1/ja not_active Ceased
- 2023-10-10 KR KR1020257015857A patent/KR20250095642A/ko active Pending
- 2023-10-10 JP JP2024551686A patent/JPWO2024085016A1/ja active Pending
- 2023-10-10 CN CN202380072042.3A patent/CN120019332A/zh active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5020713A (https=) * | 1973-06-21 | 1975-03-05 | ||
| JP2016530565A (ja) * | 2013-08-22 | 2016-09-29 | インプリア・コーポレイションＩｎｐｒｉａ Ｃｏｒｐｏｒａｔｉｏｎ | 有機金属溶液に基づいた高解像度パターニング組成物 |
| WO2018123388A1 (ja) * | 2016-12-28 | 2018-07-05 | Jsr株式会社 | 感放射線性組成物、パターン形成方法並びに金属含有樹脂及びその製造方法 |
| JP2022526031A (ja) * | 2019-04-12 | 2022-05-20 | インプリア・コーポレイション | 有機金属フォトレジスト現像剤組成物及び処理方法 |
| WO2023048029A1 (ja) * | 2021-09-27 | 2023-03-30 | 東京エレクトロン株式会社 | レジストパターンを形成する方法、半導体装置を製造する方法、基板処理装置、及び記憶媒体 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202433168A (zh) | 2024-08-16 |
| KR20250095642A (ko) | 2025-06-26 |
| CN120019332A (zh) | 2025-05-16 |
| WO2024085016A1 (ja) | 2024-04-25 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250410 |
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| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20260210 |
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| A521 | Request for written amendment filed |
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