JPS5020713A - - Google Patents
Info
- Publication number
- JPS5020713A JPS5020713A JP7017973A JP7017973A JPS5020713A JP S5020713 A JPS5020713 A JP S5020713A JP 7017973 A JP7017973 A JP 7017973A JP 7017973 A JP7017973 A JP 7017973A JP S5020713 A JPS5020713 A JP S5020713A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7017973A JPS5531453B2 (https=) | 1973-06-21 | 1973-06-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7017973A JPS5531453B2 (https=) | 1973-06-21 | 1973-06-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5020713A true JPS5020713A (https=) | 1975-03-05 |
| JPS5531453B2 JPS5531453B2 (https=) | 1980-08-18 |
Family
ID=13424031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7017973A Expired JPS5531453B2 (https=) | 1973-06-21 | 1973-06-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5531453B2 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03278082A (ja) * | 1990-03-27 | 1991-12-09 | Agency Of Ind Science & Technol | ホログラム記録用感光材料 |
| WO2015125788A1 (ja) * | 2014-02-21 | 2015-08-27 | 東京エレクトロン株式会社 | 光増感化学増幅型レジスト材料及びこれを用いたパターン形成方法、半導体デバイス、リソグラフィ用マスク、並びにナノインプリント用テンプレート |
| JPWO2024085016A1 (https=) * | 2022-10-20 | 2024-04-25 |
-
1973
- 1973-06-21 JP JP7017973A patent/JPS5531453B2/ja not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03278082A (ja) * | 1990-03-27 | 1991-12-09 | Agency Of Ind Science & Technol | ホログラム記録用感光材料 |
| WO2015125788A1 (ja) * | 2014-02-21 | 2015-08-27 | 東京エレクトロン株式会社 | 光増感化学増幅型レジスト材料及びこれを用いたパターン形成方法、半導体デバイス、リソグラフィ用マスク、並びにナノインプリント用テンプレート |
| JPWO2024085016A1 (https=) * | 2022-10-20 | 2024-04-25 | ||
| WO2024085016A1 (ja) * | 2022-10-20 | 2024-04-25 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5531453B2 (https=) | 1980-08-18 |