JPWO2024024544A5 - - Google Patents

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Publication number
JPWO2024024544A5
JPWO2024024544A5 JP2024537607A JP2024537607A JPWO2024024544A5 JP WO2024024544 A5 JPWO2024024544 A5 JP WO2024024544A5 JP 2024537607 A JP2024537607 A JP 2024537607A JP 2024537607 A JP2024537607 A JP 2024537607A JP WO2024024544 A5 JPWO2024024544 A5 JP WO2024024544A5
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JP
Japan
Prior art keywords
side wall
gas supply
inert gas
supply pipe
half line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024537607A
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English (en)
Japanese (ja)
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JPWO2024024544A1 (https=
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Publication date
Application filed filed Critical
Priority claimed from PCT/JP2023/026053 external-priority patent/WO2024024544A1/ja
Publication of JPWO2024024544A1 publication Critical patent/JPWO2024024544A1/ja
Publication of JPWO2024024544A5 publication Critical patent/JPWO2024024544A5/ja
Pending legal-status Critical Current

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JP2024537607A 2022-07-28 2023-07-14 Pending JPWO2024024544A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022120776 2022-07-28
PCT/JP2023/026053 WO2024024544A1 (ja) 2022-07-28 2023-07-14 基板処理装置及び基板処理方法

Publications (2)

Publication Number Publication Date
JPWO2024024544A1 JPWO2024024544A1 (https=) 2024-02-01
JPWO2024024544A5 true JPWO2024024544A5 (https=) 2025-04-08

Family

ID=89706255

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024537607A Pending JPWO2024024544A1 (https=) 2022-07-28 2023-07-14

Country Status (6)

Country Link
US (1) US20250167009A1 (https=)
JP (1) JPWO2024024544A1 (https=)
KR (1) KR20250044880A (https=)
CN (1) CN119585857A (https=)
TW (1) TW202426694A (https=)
WO (1) WO2024024544A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0693434B2 (ja) * 1987-08-18 1994-11-16 日本電気株式会社 気相成長装置
US20070010072A1 (en) * 2005-07-09 2007-01-11 Aviza Technology, Inc. Uniform batch film deposition process and films so produced
JP4560575B2 (ja) 2008-01-31 2010-10-13 株式会社日立国際電気 基板処理装置及び半導体装置の製造方法
JP2019186335A (ja) * 2018-04-06 2019-10-24 東京エレクトロン株式会社 基板処理装置と基板処理方法
JP7074790B2 (ja) * 2020-03-17 2022-05-24 株式会社Kokusai Electric 基板処理装置、及び半導体装置の製造方法

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