JPWO2023210667A1 - - Google Patents

Info

Publication number
JPWO2023210667A1
JPWO2023210667A1 JP2023547097A JP2023547097A JPWO2023210667A1 JP WO2023210667 A1 JPWO2023210667 A1 JP WO2023210667A1 JP 2023547097 A JP2023547097 A JP 2023547097A JP 2023547097 A JP2023547097 A JP 2023547097A JP WO2023210667 A1 JPWO2023210667 A1 JP WO2023210667A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023547097A
Other versions
JP7367901B1 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2023/016365 external-priority patent/WO2023210667A1/ja
Priority to JP2023172548A priority Critical patent/JP7517570B2/ja
Application granted granted Critical
Publication of JP7367901B1 publication Critical patent/JP7367901B1/ja
Publication of JPWO2023210667A1 publication Critical patent/JPWO2023210667A1/ja
Priority to JP2024106141A priority patent/JP2024120111A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2023547097A 2022-04-28 2023-04-25 反射型マスクブランク、反射型マスクブランクの製造方法、反射型マスク、反射型マスクの製造方法 Active JP7367901B1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2023172548A JP7517570B2 (ja) 2022-04-28 2023-10-04 反射型マスクブランク
JP2024106141A JP2024120111A (ja) 2022-04-28 2024-07-01 反射型マスクブランク、反射型マスク、反射型マスクの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022074386 2022-04-28
JP2022074386 2022-04-28
PCT/JP2023/016365 WO2023210667A1 (ja) 2022-04-28 2023-04-25 反射型マスクブランク、反射型マスクブランクの製造方法、反射型マスク、反射型マスクの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023172548A Division JP7517570B2 (ja) 2022-04-28 2023-10-04 反射型マスクブランク

Publications (2)

Publication Number Publication Date
JP7367901B1 JP7367901B1 (ja) 2023-10-24
JPWO2023210667A1 true JPWO2023210667A1 (ja) 2023-11-02

Family

ID=88418449

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2023547097A Active JP7367901B1 (ja) 2022-04-28 2023-04-25 反射型マスクブランク、反射型マスクブランクの製造方法、反射型マスク、反射型マスクの製造方法
JP2023172548A Active JP7517570B2 (ja) 2022-04-28 2023-10-04 反射型マスクブランク
JP2024106141A Pending JP2024120111A (ja) 2022-04-28 2024-07-01 反射型マスクブランク、反射型マスク、反射型マスクの製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2023172548A Active JP7517570B2 (ja) 2022-04-28 2023-10-04 反射型マスクブランク
JP2024106141A Pending JP2024120111A (ja) 2022-04-28 2024-07-01 反射型マスクブランク、反射型マスク、反射型マスクの製造方法

Country Status (3)

Country Link
US (1) US12032280B2 (ja)
JP (3) JP7367901B1 (ja)
KR (2) KR20240096806A (ja)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5597000A (en) 1999-06-07 2000-12-28 Regents Of The University Of California, The Coatings on reflective mask substrates
JP6441012B2 (ja) * 2014-09-30 2018-12-19 Hoya株式会社 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法
US11550215B2 (en) 2018-05-25 2023-01-10 Hoya Corporation Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
JP6929340B2 (ja) * 2019-11-21 2021-09-01 Hoya株式会社 反射型マスクブランクおよび反射型マスク、並びに半導体装置の製造方法
JP6929983B1 (ja) * 2020-03-10 2021-09-01 Hoya株式会社 反射型マスクブランクおよび反射型マスク、並びに半導体デバイスの製造方法
KR20230058395A (ko) * 2020-09-04 2023-05-03 에이지씨 가부시키가이샤 반사형 마스크, 반사형 마스크 블랭크 및 반사형 마스크의 제조 방법

Also Published As

Publication number Publication date
JP2023168532A (ja) 2023-11-24
KR20240096806A (ko) 2024-06-26
JP7517570B2 (ja) 2024-07-17
JP7367901B1 (ja) 2023-10-24
KR20230167154A (ko) 2023-12-07
KR102674790B1 (ko) 2024-06-14
US20240160097A1 (en) 2024-05-16
JP2024120111A (ja) 2024-09-03
US12032280B2 (en) 2024-07-09

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