JPWO2023189719A5 - - Google Patents

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JPWO2023189719A5
JPWO2023189719A5 JP2024511819A JP2024511819A JPWO2023189719A5 JP WO2023189719 A5 JPWO2023189719 A5 JP WO2023189719A5 JP 2024511819 A JP2024511819 A JP 2024511819A JP 2024511819 A JP2024511819 A JP 2024511819A JP WO2023189719 A5 JPWO2023189719 A5 JP WO2023189719A5
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JP
Japan
Prior art keywords
substrate
coupling agent
silane coupling
following
laminate according
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Pending
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JP2024511819A
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Japanese (ja)
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JPWO2023189719A1 (en
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Priority claimed from PCT/JP2023/010563 external-priority patent/WO2023189719A1/en
Publication of JPWO2023189719A1 publication Critical patent/JPWO2023189719A1/ja
Publication of JPWO2023189719A5 publication Critical patent/JPWO2023189719A5/ja
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Claims (8)

第1の基板と、シランカップリング剤層と、第2の基板とがこの順で積層された積層体であって、
面積2,500cm当たりの、加熱前の直径0.5mm以上の円形の浮きの個数をA1とし、200℃、1時間加熱後の直径0.5mm以上の円形の浮きの個数をB1としたとき、[B1]≧[A1]を満たし、
前記A1個の浮きの直径の平均をA2、前記B1個の浮きの直径の平均をB2としたとき、[B2]≧[A2]を満たし、
前記B1が20個以下であり、
前記B2が4.0mm以下であることを特徴とする積層体。
A laminate in which a first substrate, a silane coupling agent layer, and a second substrate are laminated in this order,
When the number of circular floats having a diameter of 0.5 mm or more per 2,500 cm2 before heating is defined as A1, and the number of circular floats having a diameter of 0.5 mm or more after heating at 200°C for 1 hour is defined as B1, [B1] ≧ [A1] is satisfied,
When the average diameter of the A1 floats is A2 and the average diameter of the B1 floats is B2, [B2] ≧ [A2] is satisfied;
The B1 is 20 or less,
A laminate characterized in that B2 is 4.0 mm or less.
前記第1の基板が耐熱高分子フィルムであり、
前記第2の基板が金属基板であることを特徴とする請求項1に記載の積層体。
the first substrate is a heat-resistant polymer film;
2. The laminate according to claim 1, wherein the second substrate is a metal substrate.
前記シランカップリング剤層を構成するシランカップリング剤がアミノ基を有することを特徴とする請求項1又は2に記載の積層体。 The laminate according to claim 1 or 2, characterized in that the silane coupling agent constituting the silane coupling agent layer has an amino group. 前記第1の基板と前記第2の基板との90°初期剥離強度が、0.1N/cm以上6N/cm以下であることを特徴とする請求項1又は2に記載の積層体。 3. The laminate according to claim 1 , wherein an initial 90° peel strength between the first substrate and the second substrate is 0.1 N/cm or more and 6 N/cm or less. 200℃で1時間加熱した後の前記第1の基板と前記第2の基板との90°剥離強度が、0.2N/cm以上10N/cm以下であることを特徴とする請求項1又は2に記載の積層体。 3. The laminate according to claim 1, wherein the 90° peel strength between the first substrate and the second substrate after heating at 200° C. for 1 hour is 0.2 N/cm or more and 10 N/cm or less. 第1の基板、及び、第2の基板を準備する工程A、
シランカップリング剤と水とを含み、且つ、アルコールの含有量がシランカップリング剤に対して1モル%以下である混合溶液を準備する工程B、
前記混合溶液を前記第1の基板上及び/又は前記第2の基板上に供給する工程C、及び、
前記混合溶液が供給された後の前記第1の基板と前記第2の基板とを貼り合わせる工程Dを含むことを特徴とする積層体の製造方法。
A step A of preparing a first substrate and a second substrate;
A process B of preparing a mixed solution containing a silane coupling agent and water and having an alcohol content of 1 mol % or less with respect to the silane coupling agent;
A step C of supplying the mixed solution onto the first substrate and/or the second substrate; and
A method for producing a laminate, comprising a step D of bonding the first substrate and the second substrate together after the mixed solution has been supplied.
前記工程Bは、シランカップリング剤と水とアルコールとを含む液からアルコールを取り除く工程を含むことを特徴とする請求項6に記載の積層体の製造方法。 The method for manufacturing a laminate according to claim 6, characterized in that step B includes a step of removing alcohol from a liquid containing a silane coupling agent, water, and alcohol. 前記混合液中のシランカップリング剤は、29Si-NMR測定にて得られるスペクトルの積分値から算出される下記T2構造及び下記T3構造を有するSiの合計比率をX、下記T0構造、下記T1構造、下記T2構造及び下記T3構造を有するSiの合計比率をYとしたとき、X/Yが81以上であることを特徴とする請求項6又は7に記載の積層体の製造方法。
ただし、下記T0構造、下記T1構造、下記T2構造及び下記T3構造において、ZはC2nで表される2価のアルキル鎖であり、WはC2m+1で表される1価のアルキル基又は水素原子である(ただし、nは、1以上10以下の整数であり、mは、1以上10以下の整数である)。
The method for producing a laminate according to claim 6 or 7, characterized in that, in the silane coupling agent in the mixed solution, when a total ratio of Si having the following T2 structure and the following T3 structure, calculated from an integral value of a spectrum obtained by 29Si-NMR measurement, is X, and a total ratio of Si having the following T0 structure, the following T1 structure, the following T2 structure, and the following T3 structure is Y, the ratio X/Y is 81 or more.
In the following TO structure, T1 structure, T2 structure, and T3 structure, Z is a divalent alkyl chain represented by C n H 2n , and W is a monovalent alkyl group represented by C m H 2m+1 or a hydrogen atom (wherein n is an integer of 1 to 10, and m is an integer of 1 to 10).
JP2024511819A 2022-03-29 2023-03-17 Pending JPWO2023189719A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022052773 2022-03-29
PCT/JP2023/010563 WO2023189719A1 (en) 2022-03-29 2023-03-17 Laminate and method for producing laminate

Publications (2)

Publication Number Publication Date
JPWO2023189719A1 JPWO2023189719A1 (en) 2023-10-05
JPWO2023189719A5 true JPWO2023189719A5 (en) 2024-06-10

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JP2024511819A Pending JPWO2023189719A1 (en) 2022-03-29 2023-03-17

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JP (1) JPWO2023189719A1 (en)
TW (1) TW202346093A (en)
WO (1) WO2023189719A1 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10151264A1 (en) * 2001-10-17 2003-04-30 Degussa Aminoalkylalkoxysiloxane-containing mixtures, their preparation and their use
JP6848496B2 (en) * 2017-02-08 2021-03-24 東洋紡株式会社 Laminate
TW202319233A (en) * 2021-07-20 2023-05-16 日商東洋紡股份有限公司 Laminate roll
TW202304706A (en) * 2021-07-20 2023-02-01 日商東洋紡股份有限公司 laminate

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