JPWO2023176263A5 - - Google Patents

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JPWO2023176263A5
JPWO2023176263A5 JP2024507603A JP2024507603A JPWO2023176263A5 JP WO2023176263 A5 JPWO2023176263 A5 JP WO2023176263A5 JP 2024507603 A JP2024507603 A JP 2024507603A JP 2024507603 A JP2024507603 A JP 2024507603A JP WO2023176263 A5 JPWO2023176263 A5 JP WO2023176263A5
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ceramic layer
thickness direction
ceramic
green
discharge electrode
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JP2024507603A
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JPWO2023176263A1 (en
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Priority claimed from PCT/JP2023/005222 external-priority patent/WO2023176263A1/en
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Claims (17)

厚み方向に積層された複数のセラミック層を含む絶縁基板と、
前記絶縁基板に設けられた放電電極と、
前記厚み方向において前記放電電極と対向する位置に、前記放電電極と空間を隔てて設けられた集電電極と、を備え、
複数の前記セラミック層は、第1セラミック層と、前記第1セラミック層と前記厚み方向に隣り合う第2セラミック層と、を少なくとも含み、
前記絶縁基板には、少なくとも前記第1セラミック層及び前記第2セラミック層を前記厚み方向に貫通する複数の第1貫通孔が設けられ、
前記放電電極は、前記厚み方向において前記第1セラミック層と前記第2セラミック層との間に設けられ、かつ、複数の前記第1貫通孔の内壁面から露出している、ことを特徴とするイオン発生器。
an insulating substrate including a plurality of ceramic layers laminated in a thickness direction;
A discharge electrode provided on the insulating substrate;
a current collecting electrode provided at a position facing the discharge electrode in the thickness direction and separated from the discharge electrode by a space,
The plurality of ceramic layers include at least a first ceramic layer and a second ceramic layer adjacent to the first ceramic layer in the thickness direction,
the insulating substrate is provided with a plurality of first through holes penetrating at least the first ceramic layer and the second ceramic layer in the thickness direction;
the discharge electrode is provided between the first ceramic layer and the second ceramic layer in the thickness direction and is exposed from inner wall surfaces of the first through holes.
前記放電電極は、前記厚み方向に直交する方向に沿う平板状である、請求項1に記載のイオン発生器。 The ion generator according to claim 1, wherein the discharge electrode is flat and extends in a direction perpendicular to the thickness direction. 前記放電電極は、少なくとも1つの前記第1貫通孔の内壁面の全周にわたって露出している、請求項1又は2に記載のイオン発生器。 The ion generator according to claim 1 or 2, wherein the discharge electrode is exposed around the entire inner wall surface of at least one of the first through holes. 前記集電電極は、前記厚み方向における前記放電電極側の下半分の領域において、前記空間に露出した近接露出部を有し、
前記集電電極の前記近接露出部における最小曲率半径の2倍は、前記放電電極の前記厚み方向における寸法よりも大きい、請求項1又は2に記載のイオン発生器。
the current collecting electrode has a proximal exposed portion exposed to the space in a lower half region on the discharge electrode side in the thickness direction,
3 . The ion generator according to claim 1 , wherein twice the minimum radius of curvature of the adjacent exposed portion of the current collecting electrode is greater than a dimension of the discharge electrode in the thickness direction.
前記集電電極の前記厚み方向における寸法は、前記放電電極の前記厚み方向における寸法よりも大きい、請求項4に記載のイオン発生器。 The ion generator according to claim 4, wherein the dimension of the collecting electrode in the thickness direction is greater than the dimension of the discharge electrode in the thickness direction. 前記絶縁基板の一方主面は、前記第2セラミック層における前記放電電極と反対側の主面に加えて、前記第2セラミック層の前記主面よりも前記厚み方向において高い位置に存在するセラミック層の主面を含む、請求項1又は2に記載のイオン発生器。 3. The ion generator according to claim 1, wherein the one main surface of the insulating substrate includes, in addition to a main surface of the second ceramic layer opposite the discharge electrode, a main surface of a ceramic layer that is located higher in the thickness direction than the main surface of the second ceramic layer. 複数の前記セラミック層は、前記厚み方向において前記第2セラミック層に対して前記放電電極と反対側に設けられた第3セラミック層を更に含み、
前記集電電極は、前記第3セラミック層に設けられ、かつ、一部が前記第3セラミック層から露出している、請求項1又は2に記載のイオン発生器。
the plurality of ceramic layers further include a third ceramic layer provided on an opposite side of the second ceramic layer from the discharge electrode in the thickness direction,
The ion generator according to claim 1 , wherein the current collecting electrode is provided on the third ceramic layer and is partly exposed from the third ceramic layer.
前記絶縁基板には、少なくとも前記第3セラミック層を前記厚み方向に貫通する複数の第2貫通孔が設けられている、請求項7に記載のイオン発生器。 The ion generator according to claim 7, wherein the insulating substrate is provided with a plurality of second through holes penetrating at least the third ceramic layer in the thickness direction. 前記集電電極は、複数の前記第2貫通孔の内壁面から露出している、請求項8に記載のイオン発生器。 The ion generator according to claim 8, wherein the collecting electrode is exposed from the inner wall surfaces of the second through holes. 前記集電電極は、少なくとも1つの前記第2貫通孔の内壁面の全周にわたって露出している、請求項9に記載のイオン発生器。 The ion generator according to claim 9, wherein the collecting electrode is exposed around the entire inner wall surface of at least one of the second through holes. 複数の前記第1貫通孔と複数の前記第2貫通孔とは、少なくとも1つ同士が前記厚み方向から見たときに重なっている、請求項8に記載のイオン発生器。 The ion generator according to claim 8 , wherein at least one of the plurality of first through holes and at least one of the plurality of second through holes overlaps with each other when viewed from the thickness direction. 前記放電電極の露出部に最も近い前記集電電極の最近接露出部は、前記第3セラミック層と、前記厚み方向において前記第3セラミック層の前記放電電極側に隣り合うセラミック層との界面の位置に設けられている、請求項7に記載のイオン発生器。 8. The ion generator according to claim 7, wherein a closest exposed portion of the current collecting electrode that is closest to the exposed portion of the discharge electrode is provided at a position of an interface between the third ceramic layer and an adjacent ceramic layer on a side of the third ceramic layer facing the discharge electrode in the thickness direction. 前記セラミック層の構成材料は、低温焼結セラミック材料である、請求項1又は2に記載のイオン発生器。 3. The ion generator according to claim 1 , wherein the ceramic layer is made of a low-temperature co-fired ceramic material. 厚み方向に積層された複数のセラミック層を含む絶縁基板と、
前記絶縁基板に設けられた放電電極と、を備え、
複数の前記セラミック層は、第1セラミック層と、前記第1セラミック層と前記厚み方向に隣り合う第2セラミック層と、を少なくとも含み、
前記絶縁基板には、少なくとも前記第1セラミック層及び前記第2セラミック層を前記厚み方向に貫通する複数の第1貫通孔が設けられ、
前記放電電極は、前記厚み方向において前記第1セラミック層と前記第2セラミック層との間に設けられ、かつ、複数の前記第1貫通孔の内壁面から露出している、ことを特徴とするイオン発生器用の放電ユニット。
an insulating substrate including a plurality of ceramic layers laminated in a thickness direction;
A discharge electrode is provided on the insulating substrate,
The plurality of ceramic layers include at least a first ceramic layer and a second ceramic layer adjacent to the first ceramic layer in the thickness direction,
the insulating substrate is provided with a plurality of first through holes penetrating at least the first ceramic layer and the second ceramic layer in the thickness direction;
the discharge electrode is provided between the first ceramic layer and the second ceramic layer in the thickness direction and is exposed from inner wall surfaces of the first through holes.
厚み方向に積層された複数のセラミック層を含む絶縁基板と、前記絶縁基板に設けられた放電電極と、前記厚み方向において前記放電電極と対向する位置に、前記放電電極と空間を隔てて設けられた集電電極と、を備えるイオン発生器の製造方法であって、
複数の前記セラミック層となるべき複数の未焼結セラミック層に含まれる第1未焼結セラミック層を準備する工程と、
前記第1未焼結セラミック層の一方主面上に、前記放電電極となるべき未焼結放電電極層を形成する工程と、
前記第1未焼結セラミック層に、前記厚み方向に貫通する複数の貫通孔を形成する工程と、
前記第1未焼結セラミック層に形成された複数の貫通孔の各々の内部に、前記未焼結セラミック層が焼結する温度では焼結しない第1未焼結セラミック拘束部を形成する工程と、
複数の前記未焼結セラミック層に含まれる第2未焼結セラミック層を準備する工程と、
前記第2未焼結セラミック層に、前記厚み方向に貫通する複数の貫通孔を形成する工程と、
前記第2未焼結セラミック層に形成された複数の貫通孔の各々の内部に、前記未焼結セラミック層が焼結する温度では焼結しない第2未焼結セラミック拘束部を形成する工程と、
前記第1未焼結セラミック拘束部と前記第2未焼結セラミック拘束部とが前記厚み方向に重なるように、前記第1未焼結セラミック層と前記第2未焼結セラミック層とを、前記未焼結放電電極層を間に挟んで前記厚み方向に積層することにより、前記第1未焼結セラミック拘束部が形成された複数の貫通孔と前記第2未焼結セラミック拘束部が形成された複数の貫通孔とが各々前記厚み方向に連通して形成される複数の複合貫通孔の内壁面に前記未焼結放電電極層が達するように設けられた複合積層体を作製する工程と、
前記未焼結セラミック層が焼結する温度で前記複合積層体を焼成する工程と、を備える、ことを特徴とするイオン発生器の製造方法。
A method for manufacturing an ion generator including an insulating substrate including a plurality of ceramic layers stacked in a thickness direction, a discharge electrode provided on the insulating substrate, and a current collecting electrode provided at a position facing the discharge electrode in the thickness direction and separated from the discharge electrode by a space, comprising:
providing a first green ceramic layer of a plurality of green ceramic layers to become the plurality of ceramic layers;
forming a green discharge electrode layer to become the discharge electrode on one main surface of the first green ceramic layer;
forming a plurality of through holes penetrating the first green ceramic layer in the thickness direction;
forming a first green ceramic constraint portion, which is not sintered at a temperature at which the green ceramic layer is sintered, inside each of a plurality of through holes formed in the first green ceramic layer;
providing a second green ceramic layer of the plurality of green ceramic layers;
forming a plurality of through holes penetrating the second green ceramic layer in the thickness direction;
forming a second green ceramic constraint portion, which is not sintered at a temperature at which the green ceramic layer is sintered, inside each of the plurality of through holes formed in the second green ceramic layer;
a step of stacking the first and second green ceramic layers in the thickness direction with the green discharge electrode layer sandwiched therebetween so that the first and second green ceramic constraint portions overlap in the thickness direction, thereby producing a composite laminate in which the green discharge electrode layer reaches the inner wall surfaces of a plurality of composite through holes formed by connecting a plurality of through holes in which the first and second green ceramic constraint portions are formed with a plurality of through holes in which the second green ceramic constraint portions are formed in the thickness direction;
and firing the composite laminate at a temperature at which the unsintered ceramic layer is sintered.
複数の前記未焼結セラミック層に含まれる第3未焼結セラミック層を準備する工程と、
前記第3未焼結セラミック層に、一部が前記第3未焼結セラミック層から露出するように、前記集電電極となるべき未焼結集電電極層を形成する工程と、を更に備え、
前記複合積層体を作製する工程では、前記未焼結集電電極層が、前記厚み方向において前記未焼結放電電極層と対向する位置に、前記未焼結放電電極層と、前記第1未焼結セラミック拘束部及び前記第2未焼結セラミック拘束部を含む未焼結セラミック拘束部を隔てて設けられるように、前記第1未焼結セラミック層及び前記第2未焼結セラミック層の積層体に前記第3未焼結セラミック層を積層する、請求項15に記載のイオン発生器の製造方法。
providing a third green ceramic layer in the plurality of green ceramic layers;
forming a green collecting electrode layer to be the collecting electrode on the third green ceramic layer such that a portion of the green collecting electrode layer is exposed from the third green ceramic layer;
16. The method for manufacturing an ion generator according to claim 15, wherein in the step of preparing the composite laminate, the third unsintered ceramic layer is laminated on the laminate of the first unsintered ceramic layer and the second unsintered ceramic layer so that the unsintered collector electrode layer is provided at a position facing the unsintered discharge electrode layer in the thickness direction, separated from the unsintered discharge electrode layer by a unsintered ceramic constraint portion including the first unsintered ceramic constraint portion and the second unsintered ceramic constraint portion.
前記第3未焼結セラミック層に、前記厚み方向に貫通する複数の貫通孔を形成する工程と、
前記第3未焼結セラミック層に形成された複数の貫通孔の各々の内部に、前記未焼結セラミック層が焼結する温度では焼結しない第3未焼結セラミック拘束部を形成する工程と、を更に備え、
前記複合積層体を作製する工程では、前記第3未焼結セラミック拘束部が形成された複数の貫通孔の内壁面に前記未焼結集電電極層が達するように設けられた前記複合積層体を作製する、請求項16に記載のイオン発生器の製造方法。
forming a plurality of through holes penetrating the third unsintered ceramic layer in the thickness direction;
forming a third green ceramic constraint portion, which is not sintered at a temperature at which the green ceramic layer is sintered, inside each of the plurality of through holes formed in the third green ceramic layer;
17. The method for manufacturing an ion generator according to claim 16, wherein in the step of manufacturing the composite laminate, the composite laminate is manufactured so that the unsintered collecting electrode layer reaches inner wall surfaces of a plurality of through holes in which the third unsintered ceramic restraint portion is formed.
JP2024507603A 2022-03-16 2023-02-15 Pending JPWO2023176263A1 (en)

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JP2022041383 2022-03-16
PCT/JP2023/005222 WO2023176263A1 (en) 2022-03-16 2023-02-15 Ion generator, discharge unit for ion generator, and method for manufacturing ion generator

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JPWO2023176263A1 JPWO2023176263A1 (en) 2023-09-21
JPWO2023176263A5 true JPWO2023176263A5 (en) 2024-06-07

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Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08137212A (en) * 1994-11-08 1996-05-31 Olympus Optical Co Ltd Production of ion generator
JP4132041B2 (en) * 2003-05-26 2008-08-13 京セラ株式会社 Discharge element
WO2004107394A2 (en) * 2003-05-27 2004-12-09 Matsushita Electric Works, Ltd. Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method
JP5081689B2 (en) * 2008-03-28 2012-11-28 日本碍子株式会社 Microplasma jet reactor and microplasma jet generator
WO2013031800A1 (en) * 2011-08-29 2013-03-07 京セラ株式会社 Plasma generating body and plasma generating apparatus

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