JPWO2023135896A1 - - Google Patents
Info
- Publication number
- JPWO2023135896A1 JPWO2023135896A1 JP2023573852A JP2023573852A JPWO2023135896A1 JP WO2023135896 A1 JPWO2023135896 A1 JP WO2023135896A1 JP 2023573852 A JP2023573852 A JP 2023573852A JP 2023573852 A JP2023573852 A JP 2023573852A JP WO2023135896 A1 JPWO2023135896 A1 JP WO2023135896A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/111—Field plates
- H10D64/117—Recessed field plates, e.g. trench field plates or buried field plates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
- H10D30/668—Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
- H10D62/126—Top-view geometrical layouts of the regions or the junctions
- H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/252—Source or drain electrodes for field-effect devices for vertical or pseudo-vertical devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/252—Source or drain electrodes for field-effect devices for vertical or pseudo-vertical devices
- H10D64/2527—Source or drain electrodes for field-effect devices for vertical or pseudo-vertical devices for vertical devices wherein the source or drain electrodes are recessed in semiconductor bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
- H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
- H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
- H10D64/518—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their lengths or sectional shapes
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022002323 | 2022-01-11 | ||
| PCT/JP2022/040078 WO2023135896A1 (ja) | 2022-01-11 | 2022-10-27 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023135896A1 true JPWO2023135896A1 (https=) | 2023-07-20 |
| JPWO2023135896A5 JPWO2023135896A5 (https=) | 2024-09-20 |
Family
ID=87278767
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023573852A Pending JPWO2023135896A1 (https=) | 2022-01-11 | 2022-10-27 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240355889A1 (https=) |
| JP (1) | JPWO2023135896A1 (https=) |
| CN (1) | CN118541809A (https=) |
| DE (1) | DE112022005871T5 (https=) |
| WO (1) | WO2023135896A1 (https=) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6967352B2 (ja) | 2017-02-07 | 2021-11-17 | ローム株式会社 | 半導体装置および半導体装置の製造方法、ならびに、半導体ウエハ構造物 |
| US10950699B2 (en) * | 2019-08-05 | 2021-03-16 | Vishay-Siliconix, LLC | Termination for vertical trench shielded devices |
| JP7461218B2 (ja) * | 2020-05-22 | 2024-04-03 | ローム株式会社 | 半導体装置 |
-
2022
- 2022-10-27 WO PCT/JP2022/040078 patent/WO2023135896A1/ja not_active Ceased
- 2022-10-27 CN CN202280087437.6A patent/CN118541809A/zh active Pending
- 2022-10-27 DE DE112022005871.4T patent/DE112022005871T5/de active Pending
- 2022-10-27 JP JP2023573852A patent/JPWO2023135896A1/ja active Pending
-
2024
- 2024-07-02 US US18/761,637 patent/US20240355889A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US20240355889A1 (en) | 2024-10-24 |
| DE112022005871T5 (de) | 2024-10-02 |
| CN118541809A (zh) | 2024-08-23 |
| WO2023135896A1 (ja) | 2023-07-20 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240522 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20251020 |