JPWO2023127690A5 - - Google Patents

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Publication number
JPWO2023127690A5
JPWO2023127690A5 JP2023570935A JP2023570935A JPWO2023127690A5 JP WO2023127690 A5 JPWO2023127690 A5 JP WO2023127690A5 JP 2023570935 A JP2023570935 A JP 2023570935A JP 2023570935 A JP2023570935 A JP 2023570935A JP WO2023127690 A5 JPWO2023127690 A5 JP WO2023127690A5
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JP
Japan
Prior art keywords
crosslinking agent
group
resist composition
structural unit
composition according
Prior art date
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Pending
Application number
JP2023570935A
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English (en)
Japanese (ja)
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JPWO2023127690A1 (cg-RX-API-DMAC7.html
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Priority claimed from PCT/JP2022/047418 external-priority patent/WO2023127690A1/ja
Publication of JPWO2023127690A1 publication Critical patent/JPWO2023127690A1/ja
Publication of JPWO2023127690A5 publication Critical patent/JPWO2023127690A5/ja
Pending legal-status Critical Current

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JP2023570935A 2021-12-28 2022-12-22 Pending JPWO2023127690A1 (cg-RX-API-DMAC7.html)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021214045 2021-12-28
PCT/JP2022/047418 WO2023127690A1 (ja) 2021-12-28 2022-12-22 レジスト組成物、及び、レジストパターン形成方法

Publications (2)

Publication Number Publication Date
JPWO2023127690A1 JPWO2023127690A1 (cg-RX-API-DMAC7.html) 2023-07-06
JPWO2023127690A5 true JPWO2023127690A5 (cg-RX-API-DMAC7.html) 2024-09-11

Family

ID=86999104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023570935A Pending JPWO2023127690A1 (cg-RX-API-DMAC7.html) 2021-12-28 2022-12-22

Country Status (5)

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US (1) US20250068072A1 (cg-RX-API-DMAC7.html)
JP (1) JPWO2023127690A1 (cg-RX-API-DMAC7.html)
KR (1) KR20240127976A (cg-RX-API-DMAC7.html)
CN (1) CN118414582A (cg-RX-API-DMAC7.html)
WO (1) WO2023127690A1 (cg-RX-API-DMAC7.html)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3664549B2 (ja) * 1996-08-20 2005-06-29 富士通株式会社 レジスト組成物、パターン形成方法、および半導体装置の製造方法
JP5444813B2 (ja) * 2009-04-23 2014-03-19 Ｊｓｒ株式会社 感光性絶縁樹脂組成物および絶縁膜
JP5597616B2 (ja) * 2011-10-03 2014-10-01 富士フイルム株式会社 ネガ型化学増幅レジスト組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク
JP7539226B2 (ja) 2019-08-28 2024-08-23 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法

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