JPWO2023120036A1 - - Google Patents
Info
- Publication number
- JPWO2023120036A1 JPWO2023120036A1 JP2023569204A JP2023569204A JPWO2023120036A1 JP WO2023120036 A1 JPWO2023120036 A1 JP WO2023120036A1 JP 2023569204 A JP2023569204 A JP 2023569204A JP 2023569204 A JP2023569204 A JP 2023569204A JP WO2023120036 A1 JPWO2023120036 A1 JP WO2023120036A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021208145 | 2021-12-22 | ||
| PCT/JP2022/043599 WO2023120036A1 (ja) | 2021-12-22 | 2022-11-25 | 樹脂組成物、膜、光学フィルタ、固体撮像素子および画像表示装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023120036A1 true JPWO2023120036A1 (https=) | 2023-06-29 |
| JPWO2023120036A5 JPWO2023120036A5 (https=) | 2024-09-04 |
Family
ID=86902061
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023569204A Pending JPWO2023120036A1 (https=) | 2021-12-22 | 2022-11-25 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023120036A1 (https=) |
| TW (1) | TW202328354A (https=) |
| WO (1) | WO2023120036A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2025013881A1 (https=) * | 2023-07-11 | 2025-01-16 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11158163A (ja) * | 1997-11-27 | 1999-06-15 | Chemiprokasei Kaisha Ltd | ３−アミノベンゾトリアゾール系化合物、その用途およびその製造方法 |
| KR102247284B1 (ko) * | 2016-08-30 | 2021-05-03 | 후지필름 가부시키가이샤 | 감광성 조성물, 경화막, 광학 필터, 적층체, 패턴 형성 방법, 고체 촬상 소자, 화상 표시 장치 및 적외선 센서 |
| JP7167429B2 (ja) * | 2017-01-16 | 2022-11-09 | 東洋インキＳｃホールディングス株式会社 | 感光性着色組成物、カラーフィルタ用感光性着色組成物、およびカラーフィルタ |
| CN110563661B (zh) * | 2018-06-05 | 2021-08-27 | 台湾永光化学工业股份有限公司 | 具红移效应的苯并三唑紫外线吸收剂及其用途 |
| JPWO2022202204A1 (https=) * | 2021-03-22 | 2022-09-29 |
-
2022
- 2022-11-25 JP JP2023569204A patent/JPWO2023120036A1/ja active Pending
- 2022-11-25 WO PCT/JP2022/043599 patent/WO2023120036A1/ja not_active Ceased
- 2022-12-05 TW TW111146599A patent/TW202328354A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023120036A1 (ja) | 2023-06-29 |
| TW202328354A (zh) | 2023-07-16 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240611 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20251002 |