JPWO2023112573A1 - - Google Patents
Info
- Publication number
- JPWO2023112573A1 JPWO2023112573A1 JP2023567620A JP2023567620A JPWO2023112573A1 JP WO2023112573 A1 JPWO2023112573 A1 JP WO2023112573A1 JP 2023567620 A JP2023567620 A JP 2023567620A JP 2023567620 A JP2023567620 A JP 2023567620A JP WO2023112573 A1 JPWO2023112573 A1 JP WO2023112573A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021202173 | 2021-12-14 | ||
| PCT/JP2022/042180 WO2023112573A1 (ja) | 2021-12-14 | 2022-11-14 | 硬化物の製造方法、積層体の製造方法、及び、半導体デバイスの製造方法、並びに、処理液 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023112573A1 true JPWO2023112573A1 (https=) | 2023-06-22 |
| JPWO2023112573A5 JPWO2023112573A5 (https=) | 2024-08-27 |
Family
ID=86774090
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023567620A Abandoned JPWO2023112573A1 (https=) | 2021-12-14 | 2022-11-14 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023112573A1 (https=) |
| TW (1) | TW202323511A (https=) |
| WO (1) | WO2023112573A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025253920A1 (ja) * | 2024-06-07 | 2025-12-11 | 住友化学株式会社 | 感光性樹脂組成物、その硬化膜、及び該硬化膜を含む半導体パッケージ |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014157299A (ja) * | 2013-02-18 | 2014-08-28 | Shin Etsu Chem Co Ltd | パターン形成方法及びパターン反転膜材料 |
| WO2018025738A1 (ja) * | 2016-08-01 | 2018-02-08 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、積層体の製造方法および半導体デバイス |
| WO2021157643A1 (ja) * | 2020-02-04 | 2021-08-12 | 富士フイルム株式会社 | 樹脂組成物、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス |
-
2022
- 2022-11-14 WO PCT/JP2022/042180 patent/WO2023112573A1/ja not_active Ceased
- 2022-11-14 JP JP2023567620A patent/JPWO2023112573A1/ja not_active Abandoned
- 2022-11-18 TW TW111144075A patent/TW202323511A/zh unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014157299A (ja) * | 2013-02-18 | 2014-08-28 | Shin Etsu Chem Co Ltd | パターン形成方法及びパターン反転膜材料 |
| WO2018025738A1 (ja) * | 2016-08-01 | 2018-02-08 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、積層体の製造方法および半導体デバイス |
| WO2021157643A1 (ja) * | 2020-02-04 | 2021-08-12 | 富士フイルム株式会社 | 樹脂組成物、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202323511A (zh) | 2023-06-16 |
| WO2023112573A1 (ja) | 2023-06-22 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240604 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20251002 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20260217 |
|
| A762 | Written abandonment of application |
Free format text: JAPANESE INTERMEDIATE CODE: A762 Effective date: 20260402 |