TW202323511A

TW202323511A - 硬化物的製造方法、積層體的製造方法、及半導體元件的製造方法以及處理液

硬化物的製造方法、積層體的製造方法、及半導體元件的製造方法以及處理液 Download PDF

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Publication number: TW202323511A
Authority: TW; Taiwan
Prior art keywords: group; film; compounds; compound; preferable
Prior art date: 2021-12-14

Application number

TW111144075A

Other languages

English (en)

Chinese (zh)

Inventor

青島俊栄

Original Assignee

日商富士軟片股份有限公司

Priority date

2021-12-14

Filing date

2022-11-18

Publication date

2023-06-16

2022-11-18 Application filed by 日商富士軟片股份有限公司 filed Critical 日商富士軟片股份有限公司

2023-06-16 Publication of TW202323511A publication Critical patent/TW202323511A/zh

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238000000746 purification Methods 0.000 description 1
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238000001228 spectrum Methods 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
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