JPWO2023089653A1 - - Google Patents

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Publication number
JPWO2023089653A1
JPWO2023089653A1 JP2023561947A JP2023561947A JPWO2023089653A1 JP WO2023089653 A1 JPWO2023089653 A1 JP WO2023089653A1 JP 2023561947 A JP2023561947 A JP 2023561947A JP 2023561947 A JP2023561947 A JP 2023561947A JP WO2023089653 A1 JPWO2023089653 A1 JP WO2023089653A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023561947A
Other languages
Japanese (ja)
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JP7677448B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed filed Critical
Publication of JPWO2023089653A1 publication Critical patent/JPWO2023089653A1/ja
Application granted granted Critical
Publication of JP7677448B2 publication Critical patent/JP7677448B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/80Heterojunction BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/01Manufacture or treatment
    • H10D10/021Manufacture or treatment of heterojunction BJTs [HBT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/80Heterojunction BJTs
    • H10D10/821Vertical heterojunction BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/133Emitter regions of BJTs
    • H10D62/136Emitter regions of BJTs of heterojunction BJTs 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/137Collector regions of BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/82Heterojunctions
    • H10D62/824Heterojunctions comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • H10D62/8503Nitride Group III-V materials, e.g. AlN or GaN
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/231Emitter or collector electrodes for bipolar transistors
JP2023561947A 2021-11-16 2021-11-16 バイポーラトランジスタ Active JP7677448B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/042008 WO2023089653A1 (ja) 2021-11-16 2021-11-16 バイポーラトランジスタ

Publications (2)

Publication Number Publication Date
JPWO2023089653A1 true JPWO2023089653A1 (https=) 2023-05-25
JP7677448B2 JP7677448B2 (ja) 2025-05-15

Family

ID=86396365

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023561947A Active JP7677448B2 (ja) 2021-11-16 2021-11-16 バイポーラトランジスタ

Country Status (3)

Country Link
US (1) US20240413227A1 (https=)
JP (1) JP7677448B2 (https=)
WO (1) WO2023089653A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6242451A (ja) * 1985-08-20 1987-02-24 Fujitsu Ltd ヘテロ接合バイポ−ラ半導体装置
JP2005183936A (ja) * 2003-11-28 2005-07-07 Sharp Corp バイポーラトランジスタ
WO2020240725A1 (ja) * 2019-05-29 2020-12-03 日本電信電話株式会社 ヘテロ接合バイポーラトランジスタおよびその作製方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6242451A (ja) * 1985-08-20 1987-02-24 Fujitsu Ltd ヘテロ接合バイポ−ラ半導体装置
JP2005183936A (ja) * 2003-11-28 2005-07-07 Sharp Corp バイポーラトランジスタ
WO2020240725A1 (ja) * 2019-05-29 2020-12-03 日本電信電話株式会社 ヘテロ接合バイポーラトランジスタおよびその作製方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
隈部ほか: "エピタキシャルリフトオフ法によって作製された二次元正孔ガスを有するエミッタトップ型GaN-HBT", 第80回応用物理学会秋季学術講演会講演予稿集, JPN7025001365, 4 September 2019 (2019-09-04), JP, pages 21 - 30105, ISSN: 0005564042 *

Also Published As

Publication number Publication date
WO2023089653A1 (ja) 2023-05-25
JP7677448B2 (ja) 2025-05-15
US20240413227A1 (en) 2024-12-12

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