JPWO2023074872A1 - - Google Patents

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Publication number
JPWO2023074872A1
JPWO2023074872A1 JP2023507803A JP2023507803A JPWO2023074872A1 JP WO2023074872 A1 JPWO2023074872 A1 JP WO2023074872A1 JP 2023507803 A JP2023507803 A JP 2023507803A JP 2023507803 A JP2023507803 A JP 2023507803A JP WO2023074872 A1 JPWO2023074872 A1 JP WO2023074872A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023507803A
Other versions
JPWO2023074872A5 (ja
JP7369323B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of JPWO2023074872A1 publication Critical patent/JPWO2023074872A1/ja
Publication of JPWO2023074872A5 publication Critical patent/JPWO2023074872A5/ja
Application granted granted Critical
Publication of JP7369323B2 publication Critical patent/JP7369323B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
JP2023507803A 2021-11-01 2022-10-28 トリクロロシランの製造方法及び多結晶シリコンロッドの製造方法 Active JP7369323B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021178607 2021-11-01
JP2021178607 2021-11-01
PCT/JP2022/040486 WO2023074872A1 (ja) 2021-11-01 2022-10-28 トリクロロシランの製造方法及び多結晶シリコンロッドの製造方法

Publications (3)

Publication Number Publication Date
JPWO2023074872A1 true JPWO2023074872A1 (ja) 2023-05-04
JPWO2023074872A5 JPWO2023074872A5 (ja) 2023-09-27
JP7369323B2 JP7369323B2 (ja) 2023-10-25

Family

ID=86159535

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023507803A Active JP7369323B2 (ja) 2021-11-01 2022-10-28 トリクロロシランの製造方法及び多結晶シリコンロッドの製造方法

Country Status (3)

Country Link
JP (1) JP7369323B2 (ja)
TW (1) TW202336024A (ja)
WO (1) WO2023074872A1 (ja)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6179246B2 (ja) * 2012-07-31 2017-08-16 三菱マテリアル株式会社 多結晶シリコン製造方法及び製造装置
KR102365987B1 (ko) 2016-10-18 2022-02-23 가부시끼가이샤 도꾸야마 잔사 폐기 방법 및 트리클로로실란의 제조 방법

Also Published As

Publication number Publication date
WO2023074872A1 (ja) 2023-05-04
TW202336024A (zh) 2023-09-16
JP7369323B2 (ja) 2023-10-25

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