JPWO2023074770A1 - - Google Patents
Info
- Publication number
- JPWO2023074770A1 JPWO2023074770A1 JP2023556616A JP2023556616A JPWO2023074770A1 JP WO2023074770 A1 JPWO2023074770 A1 JP WO2023074770A1 JP 2023556616 A JP2023556616 A JP 2023556616A JP 2023556616 A JP2023556616 A JP 2023556616A JP WO2023074770 A1 JPWO2023074770 A1 JP WO2023074770A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
- H10P76/405—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their composition, e.g. multilayer masks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021176757 | 2021-10-28 | ||
| PCT/JP2022/040039 WO2023074770A1 (ja) | 2021-10-28 | 2022-10-26 | 多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2023074770A1 true JPWO2023074770A1 (https=) | 2023-05-04 |
Family
ID=86158070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023556616A Pending JPWO2023074770A1 (https=) | 2021-10-28 | 2022-10-26 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240411220A1 (https=) |
| EP (1) | EP4425258A4 (https=) |
| JP (1) | JPWO2023074770A1 (https=) |
| TW (1) | TW202326279A (https=) |
| WO (1) | WO2023074770A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7612408B2 (ja) * | 2020-12-22 | 2025-01-14 | Hoya株式会社 | 反射型マスクブランク、反射型マスク、反射型マスクの製造方法、及び半導体デバイスの製造方法 |
| TW202603476A (zh) * | 2024-03-23 | 2026-01-16 | 日商Ｈｏｙａ股份有限公司 | 附導電膜基板、附多層反射膜基板、遮罩基底、反射型遮罩、及半導體裝置之製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI464529B (zh) | 2009-12-09 | 2014-12-11 | 旭硝子股份有限公司 | EUV microfilm with anti-reflective substrate, EUV microsurgical reflective mask substrate, EUV microsurgical reflective mask and manufacturing method of the reflective substrate |
| KR20130111524A (ko) | 2010-07-27 | 2013-10-10 | 아사히 가라스 가부시키가이샤 | Ｅｕｖ 리소그래피용 반사층 형성 기판, 및 ｅｕｖ 리소그래피용 반사형 마스크 블랭크 |
| JP2014127630A (ja) * | 2012-12-27 | 2014-07-07 | Asahi Glass Co Ltd | Ｅｕｖリソグラフィ用反射型マスクブランクおよびその製造方法 |
| JP6301127B2 (ja) * | 2013-12-25 | 2018-03-28 | Hoya株式会社 | 反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法 |
| KR20220022474A (ko) * | 2019-06-20 | 2022-02-25 | 호야 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크, 그리고 반사형 마스크 및 반도체 장치의 제조 방법 |
-
2022
- 2022-10-26 JP JP2023556616A patent/JPWO2023074770A1/ja active Pending
- 2022-10-26 US US18/701,869 patent/US20240411220A1/en active Pending
- 2022-10-26 WO PCT/JP2022/040039 patent/WO2023074770A1/ja not_active Ceased
- 2022-10-26 EP EP22887095.2A patent/EP4425258A4/en active Pending
- 2022-10-28 TW TW111141078A patent/TW202326279A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202326279A (zh) | 2023-07-01 |
| KR20240089139A (ko) | 2024-06-20 |
| US20240411220A1 (en) | 2024-12-12 |
| EP4425258A1 (en) | 2024-09-04 |
| EP4425258A4 (en) | 2025-11-26 |
| WO2023074770A1 (ja) | 2023-05-04 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AA64 | Notification of invalidation of claim of internal priority (with term) |
Free format text: JAPANESE INTERMEDIATE CODE: A241764 Effective date: 20240712 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240911 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250820 |