JPWO2023054602A1 - - Google Patents

Info

Publication number
JPWO2023054602A1
JPWO2023054602A1 JP2023551859A JP2023551859A JPWO2023054602A1 JP WO2023054602 A1 JPWO2023054602 A1 JP WO2023054602A1 JP 2023551859 A JP2023551859 A JP 2023551859A JP 2023551859 A JP2023551859 A JP 2023551859A JP WO2023054602 A1 JPWO2023054602 A1 JP WO2023054602A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023551859A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023054602A1 publication Critical patent/JPWO2023054602A1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B10/00Static random access memory [SRAM] devices
    • H10B10/18Peripheral circuit regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B10/00Static random access memory [SRAM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
JP2023551859A 2021-09-30 2022-09-29 Pending JPWO2023054602A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202163261847P 2021-09-30 2021-09-30
PCT/JP2022/036488 WO2023054602A1 (ja) 2021-09-30 2022-09-29 半導体装置

Publications (1)

Publication Number Publication Date
JPWO2023054602A1 true JPWO2023054602A1 (https=) 2023-04-06

Family

ID=85782921

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023551859A Pending JPWO2023054602A1 (https=) 2021-09-30 2022-09-29

Country Status (4)

Country Link
US (1) US20240224492A1 (https=)
JP (1) JPWO2023054602A1 (https=)
CN (1) CN118044349A (https=)
WO (1) WO2023054602A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121312281A (zh) * 2023-06-09 2026-01-09 株式会社索思未来 半导体装置
JPWO2024252660A1 (https=) * 2023-06-09 2024-12-12
US20250118632A1 (en) * 2023-10-10 2025-04-10 Taiwan Semiconductor Manufacturing Company, Ltd. Memory devices with switchable power delivery paths
WO2025169464A1 (ja) * 2024-02-09 2025-08-14 株式会社ソシオネクスト 半導体装置
WO2025169463A1 (ja) * 2024-02-09 2025-08-14 株式会社ソシオネクスト 半導体装置
WO2026074865A1 (ja) * 2024-10-04 2026-04-09 株式会社ソシオネクスト 半導体集積回路装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5198785B2 (ja) * 2007-03-30 2013-05-15 ルネサスエレクトロニクス株式会社 半導体装置
JP2016035966A (ja) * 2014-08-01 2016-03-17 株式会社東芝 半導体集積回路装置
JP6672626B2 (ja) * 2015-07-22 2020-03-25 富士通株式会社 半導体装置および半導体装置の制御方法
CN112753098B (zh) * 2018-09-28 2024-10-18 株式会社索思未来 半导体装置

Also Published As

Publication number Publication date
WO2023054602A1 (ja) 2023-04-06
US20240224492A1 (en) 2024-07-04
CN118044349A (zh) 2024-05-14

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20250813