JPWO2023038141A1 - - Google Patents

Info

Publication number
JPWO2023038141A1
JPWO2023038141A1 JP2023547023A JP2023547023A JPWO2023038141A1 JP WO2023038141 A1 JPWO2023038141 A1 JP WO2023038141A1 JP 2023547023 A JP2023547023 A JP 2023547023A JP 2023547023 A JP2023547023 A JP 2023547023A JP WO2023038141 A1 JPWO2023038141 A1 JP WO2023038141A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023547023A
Other versions
JPWO2023038141A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023038141A1 publication Critical patent/JPWO2023038141A1/ja
Publication of JPWO2023038141A5 publication Critical patent/JPWO2023038141A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2023547023A 2021-09-13 2022-09-12 Pending JPWO2023038141A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021148631 2021-09-13
PCT/JP2022/034110 WO2023038141A1 (ja) 2021-09-13 2022-09-12 ペリクル枠、ペリクル、ペリクルの製造方法、及びペリクル枠の評価方法

Publications (2)

Publication Number Publication Date
JPWO2023038141A1 true JPWO2023038141A1 (ja) 2023-03-16
JPWO2023038141A5 JPWO2023038141A5 (ja) 2024-06-04

Family

ID=85506499

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023547023A Pending JPWO2023038141A1 (ja) 2021-09-13 2022-09-12

Country Status (5)

Country Link
JP (1) JPWO2023038141A1 (ja)
KR (1) KR20240038817A (ja)
CN (1) CN117916663A (ja)
TW (1) TW202328809A (ja)
WO (1) WO2023038141A1 (ja)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008256925A (ja) 2007-04-04 2008-10-23 Shin Etsu Chem Co Ltd ペリクル
JP2009025559A (ja) * 2007-07-19 2009-02-05 Shin Etsu Chem Co Ltd ペリクルフレーム
JP4931717B2 (ja) 2007-07-19 2012-05-16 信越化学工業株式会社 リソグラフィー用ペリクルの製造方法
JP2011076042A (ja) * 2009-10-02 2011-04-14 Shin-Etsu Chemical Co Ltd ペリクル
JP4974389B2 (ja) * 2009-10-30 2012-07-11 信越化学工業株式会社 リソグラフィ用ペリクルフレーム及びリソグラフィ用ペリクル
JP5999843B2 (ja) * 2013-06-18 2016-09-28 信越化学工業株式会社 リソグラフィ用ペリクルとその製造方法及び管理方法
JP6304884B2 (ja) * 2014-09-22 2018-04-04 信越化学工業株式会社 ペリクルの貼り付け方法

Also Published As

Publication number Publication date
CN117916663A (zh) 2024-04-19
KR20240038817A (ko) 2024-03-25
WO2023038141A1 (ja) 2023-03-16
TW202328809A (zh) 2023-07-16

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Legal Events

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Effective date: 20240313

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