JPWO2023032582A1 - - Google Patents

Info

Publication number
JPWO2023032582A1
JPWO2023032582A1 JP2023545180A JP2023545180A JPWO2023032582A1 JP WO2023032582 A1 JPWO2023032582 A1 JP WO2023032582A1 JP 2023545180 A JP2023545180 A JP 2023545180A JP 2023545180 A JP2023545180 A JP 2023545180A JP WO2023032582 A1 JPWO2023032582 A1 JP WO2023032582A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023545180A
Other versions
JPWO2023032582A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023032582A1 publication Critical patent/JPWO2023032582A1/ja
Publication of JPWO2023032582A5 publication Critical patent/JPWO2023032582A5/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
JP2023545180A 2021-08-31 2022-08-03 Pending JPWO2023032582A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021141975 2021-08-31
PCT/JP2022/029847 WO2023032582A1 (ja) 2021-08-31 2022-08-03 被覆工具および切削工具

Publications (2)

Publication Number Publication Date
JPWO2023032582A1 true JPWO2023032582A1 (ja) 2023-03-09
JPWO2023032582A5 JPWO2023032582A5 (ja) 2024-05-10

Family

ID=85410971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023545180A Pending JPWO2023032582A1 (ja) 2021-08-31 2022-08-03

Country Status (4)

Country Link
JP (1) JPWO2023032582A1 (ja)
CN (1) CN117813172A (ja)
DE (1) DE112022004256T5 (ja)
WO (1) WO2023032582A1 (ja)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4025267B2 (ja) * 2002-08-09 2007-12-19 株式会社神戸製鋼所 α型結晶構造主体のアルミナ皮膜の製造方法
JP4462408B2 (ja) * 2004-01-28 2010-05-12 独立行政法人産業技術総合研究所 加工物品の製造方法
JP2009167503A (ja) * 2008-01-21 2009-07-30 Hitachi Tool Engineering Ltd 微粒超硬合金
WO2010050542A1 (ja) * 2008-10-29 2010-05-06 Ntn株式会社 硬質多層膜成形体およびその製造方法
JP5938321B2 (ja) * 2011-09-22 2016-06-22 Ntn株式会社 硬質膜およびその成膜方法、硬質膜形成体およびその製造方法

Also Published As

Publication number Publication date
WO2023032582A1 (ja) 2023-03-09
DE112022004256T5 (de) 2024-06-20
CN117813172A (zh) 2024-04-02

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Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240214

A621 Written request for application examination

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Effective date: 20240214