JPWO2023027010A1 - - Google Patents

Info

Publication number
JPWO2023027010A1
JPWO2023027010A1 JP2023543891A JP2023543891A JPWO2023027010A1 JP WO2023027010 A1 JPWO2023027010 A1 JP WO2023027010A1 JP 2023543891 A JP2023543891 A JP 2023543891A JP 2023543891 A JP2023543891 A JP 2023543891A JP WO2023027010 A1 JPWO2023027010 A1 JP WO2023027010A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023543891A
Other versions
JPWO2023027010A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023027010A1 publication Critical patent/JPWO2023027010A1/ja
Publication of JPWO2023027010A5 publication Critical patent/JPWO2023027010A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
JP2023543891A 2021-08-23 2022-08-22 Pending JPWO2023027010A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021135644 2021-08-23
PCT/JP2022/031524 WO2023027010A1 (ja) 2021-08-23 2022-08-22 感光性樹脂組成物、硬化物、及び画像表示装置

Publications (2)

Publication Number Publication Date
JPWO2023027010A1 true JPWO2023027010A1 (ja) 2023-03-02
JPWO2023027010A5 JPWO2023027010A5 (ja) 2024-05-20

Family

ID=85322298

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023543891A Pending JPWO2023027010A1 (ja) 2021-08-23 2022-08-22

Country Status (5)

Country Link
JP (1) JPWO2023027010A1 (ja)
KR (1) KR20240032114A (ja)
CN (1) CN117795420A (ja)
TW (1) TW202319403A (ja)
WO (1) WO2023027010A1 (ja)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4821206B2 (ja) * 2005-07-29 2011-11-24 東レ株式会社 カラーフィルター用感光性着色組成物、およびカラーフィルター
KR20170045366A (ko) 2009-05-26 2017-04-26 옵토도트 코포레이션 나노다공성 세퍼레이터 상의 애노드 직접 코팅을 이용한 배터리
JP2014041310A (ja) * 2012-07-27 2014-03-06 Fujifilm Corp 着色硬化性組成物、カラーフィルタ、及び表示装置
JP6385853B2 (ja) * 2015-02-20 2018-09-05 富士フイルム株式会社 感光性組成物、硬化膜の製造方法、硬化膜、タッチパネル、タッチパネル表示装置、液晶表示装置、及び、有機ｅｌ表示装置
JP6996078B2 (ja) * 2016-10-04 2022-01-17 三菱ケミカル株式会社 着色樹脂組成物、カラーフィルタ及び画像表示装置
JP6461222B2 (ja) 2017-03-30 2019-01-30 本田技研工業株式会社 オイルストレーナ及び動力伝達装置
JPWO2019059169A1 (ja) * 2017-09-22 2020-09-03 東レ株式会社 透明感光性樹脂組成物、フォトスペーサー、液晶表示装置、フォトスペーサーの製造方法、液晶表示装置の製造方法および透明感光性樹脂組成物のレンズスキャン露光への使用
JP2020071483A (ja) 2018-10-29 2020-05-07 東レ株式会社 ネガ型感光性樹脂組成物、それを用いたフォトスペーサーおよび画像表示装置

Also Published As

Publication number Publication date
KR20240032114A (ko) 2024-03-08
CN117795420A (zh) 2024-03-29
TW202319403A (zh) 2023-05-16
WO2023027010A1 (ja) 2023-03-02

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Legal Events

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A621 Written request for application examination

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Effective date: 20240221

A521 Request for written amendment filed

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Effective date: 20240508