JPWO2022270511A1 - - Google Patents
Info
- Publication number
- JPWO2022270511A1 JPWO2022270511A1 JP2023530486A JP2023530486A JPWO2022270511A1 JP WO2022270511 A1 JPWO2022270511 A1 JP WO2022270511A1 JP 2023530486 A JP2023530486 A JP 2023530486A JP 2023530486 A JP2023530486 A JP 2023530486A JP WO2022270511 A1 JPWO2022270511 A1 JP WO2022270511A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021104460 | 2021-06-23 | ||
| PCT/JP2022/024766 WO2022270511A1 (ja) | 2021-06-23 | 2022-06-21 | ポジ型レジスト組成物及びレジストパターン形成方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022270511A1 true JPWO2022270511A1 (zh) | 2022-12-29 |
Family
ID=84545753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023530486A Pending JPWO2022270511A1 (zh) | 2021-06-23 | 2022-06-21 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2022270511A1 (zh) |
| WO (1) | WO2022270511A1 (zh) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018154754A (ja) * | 2017-03-17 | 2018-10-04 | 日本ゼオン株式会社 | 共重合体およびポジ型レジスト組成物 |
| US11919985B2 (en) * | 2018-09-25 | 2024-03-05 | Zeon Corporation | Copolymer and positive resist composition |
| JP7196496B2 (ja) * | 2018-09-25 | 2022-12-27 | 日本ゼオン株式会社 | レジストパターン形成方法 |
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2022
- 2022-06-21 WO PCT/JP2022/024766 patent/WO2022270511A1/ja active Application Filing
- 2022-06-21 JP JP2023530486A patent/JPWO2022270511A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022270511A1 (ja) | 2022-12-29 |