JPWO2022270349A1 - - Google Patents

Info

Publication number
JPWO2022270349A1
JPWO2022270349A1 JP2023530334A JP2023530334A JPWO2022270349A1 JP WO2022270349 A1 JPWO2022270349 A1 JP WO2022270349A1 JP 2023530334 A JP2023530334 A JP 2023530334A JP 2023530334 A JP2023530334 A JP 2023530334A JP WO2022270349 A1 JPWO2022270349 A1 JP WO2022270349A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023530334A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022270349A1 publication Critical patent/JPWO2022270349A1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12Polymers provided for in subclasses C08C or C08F
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
JP2023530334A 2021-06-25 2022-06-14 Pending JPWO2022270349A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021105548 2021-06-25
PCT/JP2022/023753 WO2022270349A1 (ja) 2021-06-25 2022-06-14 感光性赤色樹脂組成物、硬化物、カラーフィルタ、表示装置

Publications (1)

Publication Number Publication Date
JPWO2022270349A1 true JPWO2022270349A1 (ja) 2022-12-29

Family

ID=84543917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023530334A Pending JPWO2022270349A1 (ja) 2021-06-25 2022-06-14

Country Status (4)

Country Link
JP (1) JPWO2022270349A1 (ja)
CN (1) CN117460974A (ja)
TW (1) TW202307045A (ja)
WO (1) WO2022270349A1 (ja)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010224308A (ja) * 2009-03-24 2010-10-07 Fujifilm Corp カラーフィルタ及びその製造方法
WO2018124087A1 (ja) * 2016-12-28 2018-07-05 株式会社Dnpファインケミカル カラーフィルタ用色材分散液、カラーフィルタ用着色樹脂組成物、カラーフィルタ、及び表示装置
CN111094461B (zh) * 2017-09-28 2022-05-17 Dnp精细化工股份有限公司 着色树脂组合物、固化物、滤色器及显示装置
JP7119387B2 (ja) * 2018-01-26 2022-08-17 東洋インキScホールディングス株式会社 カラーフィルタ用感光性着色組成物及びカラーフィルタ
JP7255331B2 (ja) * 2019-04-15 2023-04-11 東洋インキScホールディングス株式会社 カラーフィルタ用着色組成物、フィルタセグメント、およびカラーフィルタ
JP7185058B2 (ja) * 2019-08-27 2022-12-06 富士フイルム株式会社 硬化性組成物、硬化物、カラーフィルタ、固体撮像素子及び画像表示装置

Also Published As

Publication number Publication date
TW202307045A (zh) 2023-02-16
CN117460974A (zh) 2024-01-26
WO2022270349A1 (ja) 2022-12-29

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