JPWO2022264426A1 - - Google Patents

Info

Publication number
JPWO2022264426A1
JPWO2022264426A1 JP2023529181A JP2023529181A JPWO2022264426A1 JP WO2022264426 A1 JPWO2022264426 A1 JP WO2022264426A1 JP 2023529181 A JP2023529181 A JP 2023529181A JP 2023529181 A JP2023529181 A JP 2023529181A JP WO2022264426 A1 JPWO2022264426 A1 JP WO2022264426A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023529181A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022264426A1 publication Critical patent/JPWO2022264426A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP2023529181A 2021-06-18 2021-06-18 Pending JPWO2022264426A1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/023264 WO2022264426A1 (ja) 2021-06-18 2021-06-18 ニオブ酸リチウム結晶薄膜の成膜方法およびニオブ酸リチウム結晶薄膜を含む積層体

Publications (1)

Publication Number Publication Date
JPWO2022264426A1 true JPWO2022264426A1 (ja) 2022-12-22

Family

ID=84526014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023529181A Pending JPWO2022264426A1 (ja) 2021-06-18 2021-06-18

Country Status (2)

Country Link
JP (1) JPWO2022264426A1 (ja)
WO (1) WO2022264426A1 (ja)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5829280B2 (ja) * 1975-12-17 1983-06-21 日本電気株式会社 Ｌｉｎｂ１−ｘｔａｘ０３ タンケツシヨウハクマクノセイゾウホウホウ
JPH04170396A (ja) * 1990-10-31 1992-06-18 Asahi Chem Ind Co Ltd ニオブ酸リチウム単結晶簿膜の製造方法
JP3374557B2 (ja) * 1994-11-29 2003-02-04 住友電気工業株式会社 ダイヤモンド基材および表面弾性波素子
JPH11135475A (ja) * 1997-10-29 1999-05-21 Sharp Corp 半導体装置の製造方法
JP3829644B2 (ja) * 2000-05-01 2006-10-04 株式会社村田製作所 表面波装置、横波トランスデューサー及び縦波トランスデューサーの製造方法
JP4179452B2 (ja) * 2002-07-25 2008-11-12 日本電信電話株式会社 ＬｉＮｂＯ３配向性薄膜形成方法
WO2005045821A1 (ja) * 2003-11-07 2005-05-19 Murata Manufacturing Co., Ltd. 誘電体メモリー素子
JP2007058194A (ja) * 2005-07-26 2007-03-08 Tohoku Univ 高反射率可視光反射部材及びそれを用いた液晶ディスプレイバックライトユニット並びに高反射率可視光反射部材の製造方法
JP2013072099A (ja) * 2011-09-27 2013-04-22 Toppan Printing Co Ltd スパッタクリーニング方法

Also Published As

Publication number Publication date
WO2022264426A1 (ja) 2022-12-22

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Legal Events

Date Code Title Description
A621 Written request for application examination

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Effective date: 20231002