JPWO2022230871A1 - - Google Patents
Info
- Publication number
- JPWO2022230871A1 JPWO2022230871A1 JP2023517553A JP2023517553A JPWO2022230871A1 JP WO2022230871 A1 JPWO2022230871 A1 JP WO2022230871A1 JP 2023517553 A JP2023517553 A JP 2023517553A JP 2023517553 A JP2023517553 A JP 2023517553A JP WO2022230871 A1 JPWO2022230871 A1 JP WO2022230871A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021077326 | 2021-04-30 | ||
| PCT/JP2022/018878 WO2022230871A1 (ja) | 2021-04-30 | 2022-04-26 | 硬化性組成物及びパターン形成方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022230871A1 true JPWO2022230871A1 (https=) | 2022-11-03 |
Family
ID=83848461
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023517553A Pending JPWO2022230871A1 (https=) | 2021-04-30 | 2022-04-26 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2022230871A1 (https=) |
| WO (1) | WO2022230871A1 (https=) |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5729312A (en) * | 1994-03-18 | 1998-03-17 | Sharp Kabushiki Kaisha | LCD and method for producing the same in which a larger number of substrate gap control materials is larger in the polymer walls than in the liquid crystal regions |
| JP2006008926A (ja) * | 2004-06-29 | 2006-01-12 | Olympus Corp | 光学材料用組成物および光学材料 |
| CN101019044A (zh) * | 2005-05-13 | 2007-08-15 | 三洋电机株式会社 | 叠层光学元件 |
| WO2010071134A1 (ja) * | 2008-12-15 | 2010-06-24 | 旭硝子株式会社 | 光硬化性材料の製造方法、光硬化性材料および物品 |
| JP2014096575A (ja) * | 2012-10-09 | 2014-05-22 | Canon Inc | 光硬化性組成物及び膜の製造方法 |
| JP2014111734A (ja) * | 2012-11-01 | 2014-06-19 | Fujifilm Corp | 感光性組成物、これを用いた灰色硬化膜、灰色画素及び固体撮像素子 |
| WO2017038708A1 (ja) * | 2015-08-31 | 2017-03-09 | 富士フイルム株式会社 | 着色感光性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、および、硬化膜の製造方法 |
| JP2023551428A (ja) * | 2020-11-18 | 2023-12-08 | アプライド マテリアルズ インコーポレイテッド | 不動態化されたナノ粒子を有するインプリント組成物及び材料、並びにこれらの製造方法 |
| JP2024514459A (ja) * | 2021-03-26 | 2024-04-02 | ピーティー・エスピーイー・サブコ・エルエルシー | ナノインプリントリソグラフィ用のジルコニア配合物およびチタニア配合物、ならびにナノコンポジット |
-
2022
- 2022-04-26 WO PCT/JP2022/018878 patent/WO2022230871A1/ja not_active Ceased
- 2022-04-26 JP JP2023517553A patent/JPWO2022230871A1/ja active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5729312A (en) * | 1994-03-18 | 1998-03-17 | Sharp Kabushiki Kaisha | LCD and method for producing the same in which a larger number of substrate gap control materials is larger in the polymer walls than in the liquid crystal regions |
| JP2006008926A (ja) * | 2004-06-29 | 2006-01-12 | Olympus Corp | 光学材料用組成物および光学材料 |
| CN101019044A (zh) * | 2005-05-13 | 2007-08-15 | 三洋电机株式会社 | 叠层光学元件 |
| WO2010071134A1 (ja) * | 2008-12-15 | 2010-06-24 | 旭硝子株式会社 | 光硬化性材料の製造方法、光硬化性材料および物品 |
| JP2014096575A (ja) * | 2012-10-09 | 2014-05-22 | Canon Inc | 光硬化性組成物及び膜の製造方法 |
| JP2014111734A (ja) * | 2012-11-01 | 2014-06-19 | Fujifilm Corp | 感光性組成物、これを用いた灰色硬化膜、灰色画素及び固体撮像素子 |
| WO2017038708A1 (ja) * | 2015-08-31 | 2017-03-09 | 富士フイルム株式会社 | 着色感光性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、および、硬化膜の製造方法 |
| JP2023551428A (ja) * | 2020-11-18 | 2023-12-08 | アプライド マテリアルズ インコーポレイテッド | 不動態化されたナノ粒子を有するインプリント組成物及び材料、並びにこれらの製造方法 |
| JP2024514459A (ja) * | 2021-03-26 | 2024-04-02 | ピーティー・エスピーイー・サブコ・エルエルシー | ナノインプリントリソグラフィ用のジルコニア配合物およびチタニア配合物、ならびにナノコンポジット |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022230871A1 (ja) | 2022-11-03 |
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