JPWO2022230694A1 - - Google Patents
Info
- Publication number
- JPWO2022230694A1 JPWO2022230694A1 JP2023517448A JP2023517448A JPWO2022230694A1 JP WO2022230694 A1 JPWO2022230694 A1 JP WO2022230694A1 JP 2023517448 A JP2023517448 A JP 2023517448A JP 2023517448 A JP2023517448 A JP 2023517448A JP WO2022230694 A1 JPWO2022230694 A1 JP WO2022230694A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021077848 | 2021-04-30 | ||
PCT/JP2022/017946 WO2022230694A1 (ja) | 2021-04-30 | 2022-04-15 | 位相シフトマスクブランクス、位相シフトマスク、露光方法、及びデバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2022230694A1 true JPWO2022230694A1 (ko) | 2022-11-03 |
JPWO2022230694A5 JPWO2022230694A5 (ko) | 2024-02-06 |
Family
ID=83848108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023517448A Pending JPWO2022230694A1 (ko) | 2021-04-30 | 2022-04-15 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2022230694A1 (ko) |
KR (1) | KR20240003435A (ko) |
CN (1) | CN116670583A (ko) |
TW (1) | TW202303260A (ko) |
WO (1) | WO2022230694A1 (ko) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08297357A (ja) * | 1995-04-25 | 1996-11-12 | Toppan Printing Co Ltd | エッジ強調型位相シフトマスクの製造方法 |
JP3037941B2 (ja) * | 1997-12-19 | 2000-05-08 | ホーヤ株式会社 | ハーフトーン型位相シフトマスク及びハーフトーン型位相シフトマスクブランク |
JP4324778B2 (ja) * | 2003-11-21 | 2009-09-02 | 信越化学工業株式会社 | 位相シフトマスクブランク、位相シフトマスク、位相シフトマスクブランクの製造方法、及びパターン転写方法 |
JP2005284216A (ja) * | 2004-03-31 | 2005-10-13 | Shin Etsu Chem Co Ltd | 成膜用ターゲット及び位相シフトマスクブランクの製造方法 |
JP5588633B2 (ja) | 2009-06-30 | 2014-09-10 | アルバック成膜株式会社 | 位相シフトマスクの製造方法、フラットパネルディスプレイの製造方法及び位相シフトマスク |
JP6891099B2 (ja) * | 2017-01-16 | 2021-06-18 | Hoya株式会社 | 位相シフトマスクブランクおよびこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法 |
JP7073246B2 (ja) * | 2018-02-27 | 2022-05-23 | Hoya株式会社 | 位相シフトマスクブランク、位相シフトマスクの製造方法、及び表示装置の製造方法 |
-
2022
- 2022-04-15 JP JP2023517448A patent/JPWO2022230694A1/ja active Pending
- 2022-04-15 WO PCT/JP2022/017946 patent/WO2022230694A1/ja active Application Filing
- 2022-04-15 KR KR1020237027182A patent/KR20240003435A/ko unknown
- 2022-04-15 CN CN202280008221.6A patent/CN116670583A/zh active Pending
- 2022-04-20 TW TW111115050A patent/TW202303260A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
TW202303260A (zh) | 2023-01-16 |
WO2022230694A1 (ja) | 2022-11-03 |
KR20240003435A (ko) | 2024-01-09 |
CN116670583A (zh) | 2023-08-29 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230829 |