JPWO2022230694A1 - - Google Patents

Info

Publication number
JPWO2022230694A1
JPWO2022230694A1 JP2023517448A JP2023517448A JPWO2022230694A1 JP WO2022230694 A1 JPWO2022230694 A1 JP WO2022230694A1 JP 2023517448 A JP2023517448 A JP 2023517448A JP 2023517448 A JP2023517448 A JP 2023517448A JP WO2022230694 A1 JPWO2022230694 A1 JP WO2022230694A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023517448A
Other languages
Japanese (ja)
Other versions
JPWO2022230694A5 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022230694A1 publication Critical patent/JPWO2022230694A1/ja
Publication of JPWO2022230694A5 publication Critical patent/JPWO2022230694A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
JP2023517448A 2021-04-30 2022-04-15 Pending JPWO2022230694A1 (enrdf_load_stackoverflow)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021077848 2021-04-30
PCT/JP2022/017946 WO2022230694A1 (ja) 2021-04-30 2022-04-15 位相シフトマスクブランクス、位相シフトマスク、露光方法、及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
JPWO2022230694A1 true JPWO2022230694A1 (enrdf_load_stackoverflow) 2022-11-03
JPWO2022230694A5 JPWO2022230694A5 (enrdf_load_stackoverflow) 2024-02-06

Family

ID=83848108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023517448A Pending JPWO2022230694A1 (enrdf_load_stackoverflow) 2021-04-30 2022-04-15

Country Status (5)

Country Link
JP (1) JPWO2022230694A1 (enrdf_load_stackoverflow)
KR (1) KR20240003435A (enrdf_load_stackoverflow)
CN (1) CN116670583A (enrdf_load_stackoverflow)
TW (1) TW202303260A (enrdf_load_stackoverflow)
WO (1) WO2022230694A1 (enrdf_load_stackoverflow)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08297357A (ja) * 1995-04-25 1996-11-12 Toppan Printing Co Ltd エッジ強調型位相シフトマスクの製造方法
JP3037941B2 (ja) * 1997-12-19 2000-05-08 ホーヤ株式会社 ハーフトーン型位相シフトマスク及びハーフトーン型位相シフトマスクブランク
JP4324778B2 (ja) * 2003-11-21 2009-09-02 信越化学工業株式会社 位相シフトマスクブランク、位相シフトマスク、位相シフトマスクブランクの製造方法、及びパターン転写方法
JP2005284216A (ja) * 2004-03-31 2005-10-13 Shin Etsu Chem Co Ltd 成膜用ターゲット及び位相シフトマスクブランクの製造方法
JP5588633B2 (ja) 2009-06-30 2014-09-10 アルバック成膜株式会社 位相シフトマスクの製造方法、フラットパネルディスプレイの製造方法及び位相シフトマスク
JP6891099B2 (ja) * 2017-01-16 2021-06-18 Hoya株式会社 位相シフトマスクブランクおよびこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法
JP7073246B2 (ja) * 2018-02-27 2022-05-23 Hoya株式会社 位相シフトマスクブランク、位相シフトマスクの製造方法、及び表示装置の製造方法

Also Published As

Publication number Publication date
WO2022230694A1 (ja) 2022-11-03
TW202303260A (zh) 2023-01-16
KR20240003435A (ko) 2024-01-09
CN116670583A (zh) 2023-08-29

Similar Documents

Publication Publication Date Title
BR112023005462A2 (enrdf_load_stackoverflow)
BR112023012656A2 (enrdf_load_stackoverflow)
BR112021014123A2 (enrdf_load_stackoverflow)
BR112023009656A2 (enrdf_load_stackoverflow)
BR112022009896A2 (enrdf_load_stackoverflow)
BR112023008622A2 (enrdf_load_stackoverflow)
BR112022024743A2 (enrdf_load_stackoverflow)
BR112022026905A2 (enrdf_load_stackoverflow)
BR112023011738A2 (enrdf_load_stackoverflow)
BR112023004146A2 (enrdf_load_stackoverflow)
BR112023006729A2 (enrdf_load_stackoverflow)
BR102021018859A2 (enrdf_load_stackoverflow)
BR102021015500A2 (enrdf_load_stackoverflow)
BR112021017747A2 (enrdf_load_stackoverflow)
BR112023016292A2 (enrdf_load_stackoverflow)
BR112023011539A2 (enrdf_load_stackoverflow)
BR112023011610A2 (enrdf_load_stackoverflow)
BR112023008976A2 (enrdf_load_stackoverflow)
BR102021020147A2 (enrdf_load_stackoverflow)
BR102021018926A2 (enrdf_load_stackoverflow)
BR102021018167A2 (enrdf_load_stackoverflow)
BR102021017576A2 (enrdf_load_stackoverflow)
BR102021016837A2 (enrdf_load_stackoverflow)
BR102021016551A2 (enrdf_load_stackoverflow)
BR102021016375A2 (enrdf_load_stackoverflow)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230829

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20250122