JPWO2022202080A1 - - Google Patents
Info
- Publication number
- JPWO2022202080A1 JPWO2022202080A1 JP2022542044A JP2022542044A JPWO2022202080A1 JP WO2022202080 A1 JPWO2022202080 A1 JP WO2022202080A1 JP 2022542044 A JP2022542044 A JP 2022542044A JP 2022542044 A JP2022542044 A JP 2022542044A JP WO2022202080 A1 JPWO2022202080 A1 JP WO2022202080A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/34—Applying different liquids or other fluent materials simultaneously
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
Landscapes
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021050881 | 2021-03-25 | ||
JP2021050882 | 2021-03-25 | ||
JP2021050882 | 2021-03-25 | ||
JP2021050881 | 2021-03-25 | ||
PCT/JP2022/007678 WO2022202080A1 (en) | 2021-03-25 | 2022-02-24 | Method for manufacturing flexible printed circuit board |
Publications (3)
Publication Number | Publication Date |
---|---|
JPWO2022202080A1 true JPWO2022202080A1 (en) | 2022-09-29 |
JP7153167B1 JP7153167B1 (en) | 2022-10-13 |
JPWO2022202080A5 JPWO2022202080A5 (en) | 2023-02-21 |
Family
ID=83397044
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022542044A Active JP7153167B1 (en) | 2021-03-25 | 2022-02-24 | Manufacturing method of flexible printed circuit board |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7153167B1 (en) |
KR (1) | KR102516437B1 (en) |
CN (1) | CN115918275B (en) |
WO (1) | WO2022202080A1 (en) |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1065348A (en) * | 1996-08-21 | 1998-03-06 | Ibiden Co Ltd | Manufacture of multi-layer printed wiring board |
JP2000156556A (en) * | 1998-11-20 | 2000-06-06 | Kansai Paint Co Ltd | Method for forming resist layer on substrate having through hole part and production of printed wiring board |
EP1009206A3 (en) * | 1998-12-02 | 2003-01-15 | Ajinomoto Co., Inc. | Method of vacuum-laminating adhesive film |
JP2002306998A (en) * | 2001-04-16 | 2002-10-22 | Sumitomo Chem Co Ltd | Method for manufacturing plate like coated material and coating apparatus therefor |
JP2004071825A (en) * | 2002-08-06 | 2004-03-04 | Taiyo Ink Mfg Ltd | Method for manufacturing multilayer printed wiring board |
CN100342983C (en) * | 2005-03-18 | 2007-10-17 | 叶步章 | Drum apparatus capable of limiting printing ink cloak bound (PCB) |
TWI507479B (en) * | 2010-12-14 | 2015-11-11 | Kaneka Corp | Novel photosensitive resin composition and use thereof |
TW201524288A (en) | 2013-12-11 | 2015-06-16 | Microcosm Technology Co Ltd | Coating device and coating method |
JP6345947B2 (en) | 2014-02-27 | 2018-06-20 | 株式会社タムラ製作所 | Photosensitive resin composition |
US11402754B2 (en) | 2016-11-18 | 2022-08-02 | Arisawa Mfg. Co., Ltd. | Photosensitive resin composition, solder resist film using said photosensitive resin composition, flexible printed wiring board, and image display device |
JPWO2019160126A1 (en) * | 2018-02-19 | 2021-02-25 | 株式会社カネカ | Photosensitive resin composition, cured film, printed wiring board and its manufacturing method, and photosensitive resin composition manufacturing kit |
JP2020148971A (en) | 2019-03-14 | 2020-09-17 | 株式会社タムラ製作所 | Photosensitive resin composition |
-
2022
- 2022-02-24 JP JP2022542044A patent/JP7153167B1/en active Active
- 2022-02-24 KR KR1020227044408A patent/KR102516437B1/en active IP Right Grant
- 2022-02-24 WO PCT/JP2022/007678 patent/WO2022202080A1/en active Application Filing
- 2022-02-24 CN CN202280005219.3A patent/CN115918275B/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR20230005409A (en) | 2023-01-09 |
KR102516437B1 (en) | 2023-03-31 |
WO2022202080A1 (en) | 2022-09-29 |
CN115918275A (en) | 2023-04-04 |
CN115918275B (en) | 2023-10-27 |
JP7153167B1 (en) | 2022-10-13 |
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