JPWO2022195931A1 - - Google Patents
Info
- Publication number
- JPWO2022195931A1 JPWO2022195931A1 JP2023506721A JP2023506721A JPWO2022195931A1 JP WO2022195931 A1 JPWO2022195931 A1 JP WO2022195931A1 JP 2023506721 A JP2023506721 A JP 2023506721A JP 2023506721 A JP2023506721 A JP 2023506721A JP WO2022195931 A1 JPWO2022195931 A1 JP WO2022195931A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q7/00—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting
- B23Q7/04—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting by means of grippers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
- B24B27/0616—Grinders for cutting-off using a tool turning around the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/08—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving liquid or pneumatic means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/03—Glass cutting tables; Apparatus for transporting or handling sheet glass during the cutting or breaking operations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Turning (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021044356 | 2021-03-18 | ||
JP2021130829 | 2021-08-10 | ||
JP2021133294 | 2021-08-18 | ||
PCT/JP2021/035885 WO2022195931A1 (ja) | 2021-03-18 | 2021-09-29 | 加工装置、及び加工品の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2022195931A1 true JPWO2022195931A1 (ko) | 2022-09-22 |
JPWO2022195931A5 JPWO2022195931A5 (ko) | 2024-01-04 |
Family
ID=83320267
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023506721A Pending JPWO2022195931A1 (ko) | 2021-03-18 | 2021-09-29 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPWO2022195931A1 (ko) |
KR (1) | KR20230135661A (ko) |
TW (1) | TWI785840B (ko) |
WO (1) | WO2022195931A1 (ko) |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06135546A (ja) * | 1992-10-29 | 1994-05-17 | Oki Electric Ind Co Ltd | Icパッケージの飛び出し防止機構 |
JP4201564B2 (ja) * | 2001-12-03 | 2008-12-24 | 日東電工株式会社 | 半導体ウエハ搬送方法およびこれを用いた半導体ウエハ搬送装置 |
JP3527738B2 (ja) * | 2003-04-14 | 2004-05-17 | 株式会社コスメック | データム機能付きクランプ装置及びその装置を備えたクランプシステム |
WO2006022597A2 (en) * | 2004-08-23 | 2006-03-02 | Rokko Systems Pte Ltd | Supply mechanism for the chuck of an integrated circuit dicing device |
JP5248987B2 (ja) * | 2008-11-11 | 2013-07-31 | 株式会社ディスコ | 搬送機構 |
JP4466976B1 (ja) * | 2009-05-27 | 2010-05-26 | 上野精機株式会社 | 分類装置 |
JP5718379B2 (ja) * | 2013-01-15 | 2015-05-13 | 東京エレクトロン株式会社 | 基板収納処理装置及び基板収納処理方法並びに基板収納処理用記憶媒体 |
JP6211851B2 (ja) * | 2013-08-08 | 2017-10-11 | パスカルエンジニアリング株式会社 | クランプ装置 |
JP6235391B2 (ja) * | 2014-03-27 | 2017-11-22 | Towa株式会社 | 検査用治具、切断装置及び切断方法 |
JP6430170B2 (ja) | 2014-08-12 | 2018-11-28 | Towa株式会社 | 切断装置及び切断方法並びに吸着機構及びこれを用いる装置 |
JP6382039B2 (ja) * | 2014-09-04 | 2018-08-29 | Towa株式会社 | 切断装置並びに吸着機構及びこれを用いる装置 |
JP2019016700A (ja) * | 2017-07-07 | 2019-01-31 | Towa株式会社 | 保持部材、保持部材の製造方法、保持装置、搬送装置及び電子部品の製造装置 |
JP6861602B2 (ja) * | 2017-09-15 | 2021-04-21 | Towa株式会社 | 保持部材、保持部材の製造方法、保持機構及び製品の製造装置 |
JP7009306B2 (ja) * | 2018-05-21 | 2022-01-25 | 株式会社ディスコ | 切削装置 |
KR102167500B1 (ko) * | 2019-09-09 | 2020-10-19 | 제너셈(주) | 흡착 모듈 |
KR102138003B1 (ko) * | 2019-09-09 | 2020-07-27 | 제너셈(주) | 컨버전 키트 자동 교환 시스템 |
KR102146784B1 (ko) * | 2019-06-18 | 2020-08-21 | 제너셈(주) | 대상체 공급 방법 |
-
2021
- 2021-09-29 KR KR1020237029195A patent/KR20230135661A/ko unknown
- 2021-09-29 JP JP2023506721A patent/JPWO2022195931A1/ja active Pending
- 2021-09-29 WO PCT/JP2021/035885 patent/WO2022195931A1/ja active Application Filing
- 2021-10-13 TW TW110137872A patent/TWI785840B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO2022195931A1 (ja) | 2022-09-22 |
TW202238698A (zh) | 2022-10-01 |
KR20230135661A (ko) | 2023-09-25 |
TWI785840B (zh) | 2022-12-01 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231220 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231220 |