JPWO2022181419A1 - - Google Patents
Info
- Publication number
- JPWO2022181419A1 JPWO2022181419A1 JP2022510944A JP2022510944A JPWO2022181419A1 JP WO2022181419 A1 JPWO2022181419 A1 JP WO2022181419A1 JP 2022510944 A JP2022510944 A JP 2022510944A JP 2022510944 A JP2022510944 A JP 2022510944A JP WO2022181419 A1 JPWO2022181419 A1 JP WO2022181419A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Electroluminescent Light Sources (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021029607 | 2021-02-26 | ||
| PCT/JP2022/006162 WO2022181419A1 (ja) | 2021-02-26 | 2022-02-16 | 感光性樹脂組成物、硬化物、表示装置、有機ｅｌ表示装置および半導体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022181419A1 true JPWO2022181419A1 (zh) | 2022-09-01 |
Family
ID=83049291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022510944A Pending JPWO2022181419A1 (zh) | 2021-02-26 | 2022-02-16 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2022181419A1 (zh) |
| TW (1) | TW202244611A (zh) |
| WO (1) | WO2022181419A1 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202412021A (zh) * | 2022-09-02 | 2024-03-16 | 日商Ｊｓｒ股份有限公司 | 導電膜的製造方法、分散液、感放射線性樹脂組成物、發光元件 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5061703B2 (ja) * | 2007-04-25 | 2012-10-31 | 東レ株式会社 | 感光性樹脂組成物 |
| JP2009020246A (ja) * | 2007-07-11 | 2009-01-29 | Toray Ind Inc | 感光性樹脂組成物、これを用いた絶縁性樹脂パターンの製造方法および有機電界発光素子 |
| US8530119B2 (en) * | 2009-05-20 | 2013-09-10 | Sumitomo Bakelite Co., Ltd. | Positive photosensitive resin composition, cured film, protective film, interlayer insulating film, and semiconductor device and display element using the same |
| CN103250099B (zh) * | 2010-09-28 | 2015-07-22 | 普罗米鲁斯有限责任公司 | 降冰片烷-基pac ballast和包含该pac的正色调光敏树脂组合物 |
| JP2016158863A (ja) * | 2015-03-02 | 2016-09-05 | 株式会社日立製作所 | 医用画像撮像装置及び撮像断面調整方法 |
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2022
- 2022-02-16 JP JP2022510944A patent/JPWO2022181419A1/ja active Pending
- 2022-02-16 WO PCT/JP2022/006162 patent/WO2022181419A1/ja active Application Filing
- 2022-02-22 TW TW111106307A patent/TW202244611A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202244611A (zh) | 2022-11-16 |
| WO2022181419A1 (ja) | 2022-09-01 |