JPWO2022173000A1 - - Google Patents

Info

Publication number
JPWO2022173000A1
JPWO2022173000A1 JP2022580683A JP2022580683A JPWO2022173000A1 JP WO2022173000 A1 JPWO2022173000 A1 JP WO2022173000A1 JP 2022580683 A JP2022580683 A JP 2022580683A JP 2022580683 A JP2022580683 A JP 2022580683A JP WO2022173000 A1 JPWO2022173000 A1 JP WO2022173000A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022580683A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022173000A1 publication Critical patent/JPWO2022173000A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2022580683A 2021-02-10 2022-02-10 Pending JPWO2022173000A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021019889 2021-02-10
PCT/JP2022/005383 WO2022173000A1 (ja) 2021-02-10 2022-02-10 フレキソ印刷原版、フレキソ印刷版及びフレキソ印刷版の製造方法

Publications (1)

Publication Number Publication Date
JPWO2022173000A1 true JPWO2022173000A1 (ja) 2022-08-18

Family

ID=82838351

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022580683A Pending JPWO2022173000A1 (ja) 2021-02-10 2022-02-10

Country Status (5)

Country Link
US (1) US20240111213A1 (ja)
EP (1) EP4292819A1 (ja)
JP (1) JPWO2022173000A1 (ja)
CN (1) CN116868126A (ja)
WO (1) WO2022173000A1 (ja)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3264103A (en) 1962-06-27 1966-08-02 Du Pont Photopolymerizable relief printing plates developed by dry thermal transfer
US5175072A (en) 1990-07-26 1992-12-29 Minnesota Mining And Manufacturing Company Flexographic printing plate process
US6171758B1 (en) 1994-11-08 2001-01-09 Dupont Operations Worldwide, Inc. Dimensionally stable flexographic printing plates
WO2001088615A1 (en) 2000-05-17 2001-11-22 E.I. Dupont De Nemours And Company Process for preparing a flexographic printing plate
CN101416110A (zh) 2006-04-07 2009-04-22 旭化成化学株式会社 柔性印刷用感光性树脂组合物
JP5021449B2 (ja) * 2007-02-13 2012-09-05 イーストマン コダック カンパニー 凸版印刷用原版およびその製造方法、凸版印刷版の製造方法、ならびにインク受容層形成用組成物
EP2461215B1 (en) 2009-07-30 2017-09-06 Toyobo Co., Ltd. Flexographic printing original plate
US8541162B2 (en) * 2010-09-01 2013-09-24 E I Du Pont De Nemours And Company High resolution, solvent resistant, thin elastomeric printing plates
US9114601B2 (en) * 2012-03-01 2015-08-25 Kyle P. Baldwin Clean flexographic printing plate and method of making the same
JP7028560B2 (ja) 2017-01-26 2022-03-02 旭化成株式会社 フレキソ印刷版
JP6380775B1 (ja) 2017-04-25 2018-08-29 東洋インキＳｃホールディングス株式会社 輪転印刷インキ及びその利用

Also Published As

Publication number Publication date
WO2022173000A1 (ja) 2022-08-18
CN116868126A (zh) 2023-10-10
US20240111213A1 (en) 2024-04-04
EP4292819A1 (en) 2023-12-20

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230427