JPWO2022173000A1 - - Google Patents
Info
- Publication number
- JPWO2022173000A1 JPWO2022173000A1 JP2022580683A JP2022580683A JPWO2022173000A1 JP WO2022173000 A1 JPWO2022173000 A1 JP WO2022173000A1 JP 2022580683 A JP2022580683 A JP 2022580683A JP 2022580683 A JP2022580683 A JP 2022580683A JP WO2022173000 A1 JPWO2022173000 A1 JP WO2022173000A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021019889 | 2021-02-10 | ||
PCT/JP2022/005383 WO2022173000A1 (ja) | 2021-02-10 | 2022-02-10 | フレキソ印刷原版、フレキソ印刷版及びフレキソ印刷版の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022173000A1 true JPWO2022173000A1 (ja) | 2022-08-18 |
Family
ID=82838351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022580683A Pending JPWO2022173000A1 (ja) | 2021-02-10 | 2022-02-10 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20240111213A1 (ja) |
EP (1) | EP4292819A1 (ja) |
JP (1) | JPWO2022173000A1 (ja) |
CN (1) | CN116868126A (ja) |
WO (1) | WO2022173000A1 (ja) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3264103A (en) | 1962-06-27 | 1966-08-02 | Du Pont | Photopolymerizable relief printing plates developed by dry thermal transfer |
US5175072A (en) | 1990-07-26 | 1992-12-29 | Minnesota Mining And Manufacturing Company | Flexographic printing plate process |
US6171758B1 (en) | 1994-11-08 | 2001-01-09 | Dupont Operations Worldwide, Inc. | Dimensionally stable flexographic printing plates |
WO2001088615A1 (en) | 2000-05-17 | 2001-11-22 | E.I. Dupont De Nemours And Company | Process for preparing a flexographic printing plate |
CN101416110A (zh) | 2006-04-07 | 2009-04-22 | 旭化成化学株式会社 | 柔性印刷用感光性树脂组合物 |
JP5021449B2 (ja) * | 2007-02-13 | 2012-09-05 | イーストマン コダック カンパニー | 凸版印刷用原版およびその製造方法、凸版印刷版の製造方法、ならびにインク受容層形成用組成物 |
EP2461215B1 (en) | 2009-07-30 | 2017-09-06 | Toyobo Co., Ltd. | Flexographic printing original plate |
US8541162B2 (en) * | 2010-09-01 | 2013-09-24 | E I Du Pont De Nemours And Company | High resolution, solvent resistant, thin elastomeric printing plates |
US9114601B2 (en) * | 2012-03-01 | 2015-08-25 | Kyle P. Baldwin | Clean flexographic printing plate and method of making the same |
JP7028560B2 (ja) | 2017-01-26 | 2022-03-02 | 旭化成株式会社 | フレキソ印刷版 |
JP6380775B1 (ja) | 2017-04-25 | 2018-08-29 | 東洋インキScホールディングス株式会社 | 輪転印刷インキ及びその利用 |
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2022
- 2022-02-10 EP EP22752822.1A patent/EP4292819A1/en active Pending
- 2022-02-10 JP JP2022580683A patent/JPWO2022173000A1/ja active Pending
- 2022-02-10 US US18/276,362 patent/US20240111213A1/en active Pending
- 2022-02-10 CN CN202280014303.1A patent/CN116868126A/zh active Pending
- 2022-02-10 WO PCT/JP2022/005383 patent/WO2022173000A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2022173000A1 (ja) | 2022-08-18 |
CN116868126A (zh) | 2023-10-10 |
US20240111213A1 (en) | 2024-04-04 |
EP4292819A1 (en) | 2023-12-20 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230427 |